Effect of Post Metallization Annealing for La 2 O 3 Thin Film
Effect of Post Metallization Annealing for La 2 O 3 Thin Film
Effect of Post Metallization Annealing for La 2 O 3 Thin Film
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2.62.4EOT [nm]As-depo.2.2PDA_N2PDA_O2PMA_N22PMA_O21.81.610 -1 10 0 10 1 10 2 10 3 10 4<strong>Annealing</strong> Time [Sec.]Figure 3-48: The plots <strong>of</strong> EOT dependent on annealing temperaturein the case <strong>of</strong> nitrogen and oxygen ambienceV FBShift [V]-0.3-0.35-0.4-0.45-0.5-0.55-0.6-0.65As-depo.PDA_N2PDA_O2PMA_N2PMA_O2-0.710 -1 10 0 10 1 10 2 10 3 10 4<strong>Annealing</strong> Time [Sec.]Figure 3-49: The plots <strong>of</strong> VFB shift in the case <strong>of</strong>nitrogen and oxygen ambience- 72 -