Effect of Post Metallization Annealing for La 2 O 3 Thin Film
Effect of Post Metallization Annealing for La 2 O 3 Thin Film
Effect of Post Metallization Annealing for La 2 O 3 Thin Film
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V Shift [V]FB-0.4-0.5-0.6-0.7-0.8As-depo.PDAPMA-0.9-1VFB Shift_HF-last0 100 200 300 400 500<strong>Annealing</strong> temperature [ o C]Figure 3-38: The values <strong>of</strong> the VFB shift versus annealing temperature plotLeakage Current [J/cm 2 ]10 -1As-depo.10 -2Leak J_HF-lastPMA45010 -3PMA40010 -410 -510 -610 -7PMA350PMA300PDA4001.6 1.8 2 2.2 2.4 2.6Equivalent Oxide Thickness [nm]Figure 3-39: EOT versus leakage current plot- 64 -