Effect of Post Metallization Annealing for La 2 O 3 Thin Film
Effect of Post Metallization Annealing for La 2 O 3 Thin Film
Effect of Post Metallization Annealing for La 2 O 3 Thin Film
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
Capacitance (µF/cm 2 )21Al/<strong>La</strong> O / n-Si(100)/Al2 3 250 o C depo.HF-last & C.O.PDA 400 o C10min.N ambient2C.O.HF-last0-2 -1.5 -1 -0.5 0Voltage (V)Figure 3-10: The comparison <strong>of</strong> C-V characteristics betweenHF-last treatment and chemical oxidation treatment10 0 -1 -0.5 0 0.5 1Current Density (A/cm 2 )10 -110 -210 -310 -410 -510 -610 -7HF-lastC.O.HF-lastC.O.Al/<strong>La</strong> 2O 3/ n-Si(100)/Al250 o C depo.HF-last & C.O.PDA 400 o C 10min.N 2ambient10 -8Voltage (V)Figure 3-11: The comparison <strong>of</strong> J-V characteristics betweenHF-last treatment and chemical oxidation treatment- 40 -