LCLS Conceptual Design Report - Stanford Synchrotron Radiation ...

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L C L S C O N C E P T U A L D E S I G N R E P O R T 7.34 shows the temporal distribution of the bunch and the CSR-wakefield, from Eq. (7.19), within the first bend of DL1, using the temporal distribution taken from upstream tracking. Figure 7.34 Constant temporal distribution of bunch (solid: “LinearDensity”) and CSR-wakefield (dots: “DeltaGamma”) within first bend of DL1. The variable color traces represent the two functions sampled in each of ten points along the bend magnet. The variable color traces represent the two functions sampled in each of ten points along the bend magnet. The temporal distribution is nearly constant over the DL1 bend system due to the small energy spread and near-isochronicity of the beamline. The projected emittance growth due to CSR across DL1 bends is small at ~1%. 7.5.1.4 Beam Size, Aperture, and Field Quality The horizontal beam sizes in DL1 reach peak values of ~100 µm and the sagitta in the bends is 7.6 mm. A 2.5-cm full aperture in the bends is, therefore, adequate. The large dispersion in the DL1 field lens quadrupole, QB, and the strong bends set the tolerances on field quality. Table 7.18 lists dipole field sensitivities in DL1. Although the dipoles will be powered in series, their fields may differ slightly due to construction errors. These differences are correctable with trim coils or steering magnets. With the two bend magnets powered in series, the current regulation tolerance is not difficult to meet, at 0.04% rms. This tolerance is set by the path length error induced by a varying field and the need to keep this component of the final electron energy jitter (at 14.3 GeV) stable to
L C L S C O N C E P T U A L D E S I G N R E P O R T regulation are insignificant (
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Linac Coherent Light Source (LCLS)
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L C L S C O N C E P T U A L D E S I
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Preface This Conceptual Design Repo
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Table of Contents 1 Executive Summa
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6. Two experiment halls L C L S C O
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2.7.1.7 Conventional Facilities L C
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3 TECHNICAL SYNOPSIS Scientific Bas
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5 TECHNICAL SYNOPSIS FEL Parameters
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and the total peak beam power L C L
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5.4.2.2 Case II - High Charge Limit
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∆P ∆I sat pl / P / I sat pk L C
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5.9 Summary L C L S C O N C E P T U
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6 Injector TECHNICAL SYNOPSIS The i
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εn,x (µm) 4 3 2 1 4-2001 8560A95
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Quantum Yield (electrons/photon) 10
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Bz (T) 0.3 0.2 0.1 1-2002 8560A92 L
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Master Clock 9.917 MHz x8 x6 x6 Df
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1-2002 8560A198 Linac Center Line L
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B z (kG) 3 2 1 4-2001 8560A91 L C L
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γε x,y (µm) 3 2 1 0 3-2001 8560A
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γεx,y (µm) yn 10 0 -10 -10 0 10
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σ γ /γ 0 (percent) ∆N/N 0.02 0
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5 0 -5 5 0 -5 5 0 -5 L C L S C O N
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Table 6.5 PARMELA Output Parameters
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gama x (micro.m) 3 2 1 0 0 L C L S
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∆E/E 0 (%) ∆N/N 0 -1 -2 0.02 0
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Page 194 and 195: L C L S C O N C E P T U A L D E S I
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Page 216 and 217: β (m) 35 30 25 20 15 10 5 0 K21_1B
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Page 256 and 257: economic reasons. L C L S C O N C E
Page 268 and 269: Phase [deg. S-band] L C L S C O N C
Page 272 and 273: New Solid-State Sub-Booster and Ele
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Magnet String Location Existing, Ne
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8.1 Overview 8.1.1 Introduction L C
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Mu in the pole, for mu
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Gasload (Torr-l/sec-cm) (x10 -12 )
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8.10.4 Conclusion L C L S C O N C E
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x θ j > 0 L C L S C O N C E P T U
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Quad ∆X/µm Quad ∆Y/µm −500
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∆X/µm ∆Y/µm L C L S C O N C E
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8.13.2 Undulator Cell Structure L C
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9.2 Layout and Optics 9.2.1 Experim
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Fast Valve L C L S C O N C E P T U
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0.01 10 -4 10 -6 10 -8 10 -10 10 -1
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Table 9.5 Mirror requirements L C L
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Refractive Focusing System L C L S
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Pulse Split/Delay L C L S C O N C E
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Figure 9.20 LCLS Ion Chamber L C L
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9.4.3.2 Pulse Length L C L S C O N
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9.4.3.6 Divergence L C L S C O N C
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10 Conventional Facilities TECHNICA
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1-2002 8560A198 Linac Center Line L
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Figure 10.6 Near hall floor plan 10
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11 Controls TECHNICAL SYNOPSIS The
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11.5.3 Motion Controls L C L S C O
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12.1 Procedural Overview L C L S C
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13 Environment, Safety and Health a
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Table 13-1 Hazard Identification an
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13.1 Ionizing Radiation The design
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Table 13-2 Minimum Training Require
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13.10 SLAC References L C L S C O N
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L C L S D E S I G N S T U D Y R E P
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15 TECHNICAL SYNOPSIS Work Breakdow
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A A.1 FEL-Physics A.1.1 Performance
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A.2 Photo-Injector A.2.1 Gun-Laser
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A.2.3.2 Electron Beam L C L S C O N
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A.2.4.7 Vacuum L C L S C O N C E P
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A.3.8 DL-2 A.3.8.1 Subsystem L C L
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A.4 Undulator A.4.1 Undulator A.4.1
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B Control Points B.1 Injector Contr
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C Glossary ACO Anneaux Collisions O
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