LCLS Conceptual Design Report - Stanford Synchrotron Radiation ...

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Magnet String Location Existing, New or Recycled L C L S C O N C E P T U A L D E S I G N R E P O R T No. of Power Supplies Magnets per Supply Uni- or Bipolar Magnet Type Max. Current [A] Max. Voltage [V] Est. Reg. Tolerance [%] DL1 N 1 2 U 5D7.1 450 10 0.02 BC1 N 1 4 U 5D7.1 400 20 0.02 BC2 N 1 4 U 1D15.7 ~1000 ? 0.05 DL2 N 1 4 U 4D102.36T 375 40 0.02 DL2 N 1 2 U VB ? ? 0.05 DL1/BC1 N 12 1 B 1Q5.6 12 36 0.1 L1/BC1 N 4 1 B QA 8 5 0.1 L2/L3 E 69 1 U QE 20 ? 0.1 BC1 N 3 1 U QE 25 2 0.1 L2/L3 N 6 8 U QE 25 ? 0.1 L2 N 1 5 U QE 25 ? 0.1 BC2 N 4 1 U QE 200 20 0.1 BC2 N 2 1 B QE 12 1 0.1 BSY E 1 3 U 50Q1,2,3 310 ? 0.1 BSY E 1 1 U QSM 9.8 ? 0.1 DL2 E 3 1 U 0.91Q17.7 240 ? 0.05 DL2 R 2 4 U 0.91Q17.7 250 120 0.05 DL2 R 2 2 U 0.91Q17.7 250 60 0.05 DL2 R 9 1 U 0.91Q17.7 250 30 0.05 DL2 R 1 6 U 0.91Q17.7 100 80 0.05 A list of <strong>LCLS</strong> profile monitors is given in Table 7.27. This list does not include monitors placed upstream of the end of the L0-linac. The profile monitors are wire-scanners, OTR monitors (or both in a few cases), or phosphor screens. Wire-scanners allow non-invasive, but integrated pulse measurements, while screens allow single shot measurements, which are destructive. The phosphor screens are used where the beam size is large and diffuse in BC1 and BC2. The profile monitors are used to measure transverse emittance (ε), energy spread (δ), or bunch length (σz), as indicated in the table. The rms transverse beam size listed, σx,y, is the x (≈ y) size in the case of emittance measurements, the x size in the case of energy spread, and the y size in the case of bunch length. Beam size measurement resolution of ≤10% is required with a charge level as low as 0.2 nC per bunch. 7-110 ♦ A C C E L E R A T O R
L C L S C O N C E P T U A L D E S I G N R E P O R T Table 7.26 BPM list (not including injector or L0). Estimated rms resolution is based on a minimum operable bunch charge of 0.2 nC. Just 19 new BPM strip-lines are required. Accelerator Area Location Range, S [m] Existing, New or Recycled Quantity Est. Resolution [µm] DL1/ED0 0-21 N 11 25 L1-linac 21-31 N 2 20 L1-linac 30 E 1 20 BC1 31-46 N 5 20 BC1/ED1 43 E 1 20 L2-linac 46-397 E 28 10 BC2 397-423 N 1 10 L3-linac/BSY 423-1200 E 58 10 DL2/ED2 1200-1280 R 28 5 Table 7.27 Profile monitor list with nominal rms beam sizes for γε = 1 µm (not including injector system). Accelerator Area Location, S, [m] Monitor Type Measures ε, δ or σ z Quantity Energy [GeV] Beam Size, σ x,y [µm] DL1/ED0 10-15 wire/OTR ε 3 0.15 65-130 DL1 16.5 OTR δ 1 0.15 135 BC1 32.6 Phos. δ 1 0.25 1740 BC1/ED1 39.8 Wire ε 3 0.25 40-80 L2-linac 359-397 Wire ε 4 4.1-4.5 41-72 BC2 404 Phos. δ 1 4.5 1560 L2-linac 524 OTR σ z 1 4.5-6.2 250 L3-linac 701-815 Wire ε 4 4.5-11 39-57 DL2 1218 OTR δ-slice 1 4.5-15 20 DL2 1237 OTR δ 1 4.5-15 38 DL2/ED2 1252-1270 wire/OTR ε 4 4.5-15 17 7.10.2 Installation Issues Some of the necessary rf modifications to the SLAC linac are listed in Table 7.28. Some accelerating structures must be removed in order to locate compressor chicanes and matching sections. And in one case, a new 3-meter structure can be added back to the linac (the extinct NPI gun located at 25-1c). A C C E L E R A T O R ♦ 7-111
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Linac Coherent Light Source (LCLS)
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L C L S C O N C E P T U A L D E S I
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Preface This Conceptual Design Repo
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Table of Contents 1 Executive Summa
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6. Two experiment halls L C L S C O
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2.7.1.7 Conventional Facilities L C
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3 TECHNICAL SYNOPSIS Scientific Bas
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5 TECHNICAL SYNOPSIS FEL Parameters
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and the total peak beam power L C L
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5.4.2.2 Case II - High Charge Limit
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∆P ∆I sat pl / P / I sat pk L C
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5.9 Summary L C L S C O N C E P T U
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6 Injector TECHNICAL SYNOPSIS The i
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εn,x (µm) 4 3 2 1 4-2001 8560A95
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Quantum Yield (electrons/photon) 10
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Bz (T) 0.3 0.2 0.1 1-2002 8560A92 L
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Master Clock 9.917 MHz x8 x6 x6 Df
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1-2002 8560A198 Linac Center Line L
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B z (kG) 3 2 1 4-2001 8560A91 L C L
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γε x,y (µm) 3 2 1 0 3-2001 8560A
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γεx,y (µm) yn 10 0 -10 -10 0 10
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σ γ /γ 0 (percent) ∆N/N 0.02 0
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5 0 -5 5 0 -5 5 0 -5 L C L S C O N
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Table 6.5 PARMELA Output Parameters
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gama x (micro.m) 3 2 1 0 0 L C L S
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∆E/E 0 (%) ∆N/N 0 -1 -2 0.02 0
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〈∆E/E 0 〉 /% I pk /I pk0 0.1
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β (m) 35 30 25 20 15 10 5 0 K21_1B
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β (m) 60 50 40 30 20 10 0 L C L S
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Gasload (Torr-l/sec-cm) (x10 -12 )
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8.10.4 Conclusion L C L S C O N C E
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x θ j > 0 L C L S C O N C E P T U
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Quad ∆X/µm Quad ∆Y/µm −500
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∆X/µm ∆Y/µm L C L S C O N C E
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8.13.2 Undulator Cell Structure L C
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9.2 Layout and Optics 9.2.1 Experim
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Fast Valve L C L S C O N C E P T U
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0.01 10 -4 10 -6 10 -8 10 -10 10 -1
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Table 9.5 Mirror requirements L C L
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Refractive Focusing System L C L S
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Pulse Split/Delay L C L S C O N C E
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Figure 9.20 LCLS Ion Chamber L C L
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9.4.3.2 Pulse Length L C L S C O N
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9.4.3.6 Divergence L C L S C O N C
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10 Conventional Facilities TECHNICA
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1-2002 8560A198 Linac Center Line L
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Figure 10.6 Near hall floor plan 10
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11 Controls TECHNICAL SYNOPSIS The
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11.5.3 Motion Controls L C L S C O
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12.1 Procedural Overview L C L S C
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13 Environment, Safety and Health a
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Table 13-1 Hazard Identification an
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13.1 Ionizing Radiation The design
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Table 13-2 Minimum Training Require
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13.10 SLAC References L C L S C O N
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L C L S D E S I G N S T U D Y R E P
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15 TECHNICAL SYNOPSIS Work Breakdow
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A A.1 FEL-Physics A.1.1 Performance
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A.2 Photo-Injector A.2.1 Gun-Laser
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A.2.3.2 Electron Beam L C L S C O N
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A.2.4.7 Vacuum L C L S C O N C E P
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A.3.8 DL-2 A.3.8.1 Subsystem L C L
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A.4 Undulator A.4.1 Undulator A.4.1
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B Control Points B.1 Injector Contr
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C Glossary ACO Anneaux Collisions O
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