LCLS Conceptual Design Report - Stanford Synchrotron Radiation ...

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L C L S C O N C E P T U A L D E S I G N R E P O R T This method is simulated in Figure 7.69, including CSR and wakefields, and demonstrates an absolute bunch length measurement with an accuracy of a few percent. In all cases shown the beam is not accelerated in L3-linac, for a final beam energy of 4.54 GeV. The 75-µm FWHM bunch length generates FWHM energy spread values of 1.64% (at φ = –90°, left) and 0.333% (at φ = +90°, right). When this is used in Eq. (7.28), it reproduces the 75-µm FWHM bunch length to within a few percent. Statistical resolution is dependent on the profile monitor used and should be 5–10%. The horizontal FWHM beam size at the DL2 energy spread profile monitor (PR31; ηx ≈ 50 mm) associated with the three cases is shown at bottom of Figure 7.69. Relative bunch length monitors are then calibrated from this, or the rf-deflector measurements. With BC2 switched off, the bunch length after BC1 can also be measured with either of these techniques. Figure 7.69 Simulated ‘zero-phasing’ technique for bunch length measurement. Top row is energy distribution after DL2 at 4.54 GeV for −90° (left), rf-off (center), and +90° (right) in L3. Middle row is longitudinal phase space, and bottom row is horizontal beam profile. 7.8.2.3 Electo-Optical Bunch Length Diagnostic An electro-optical (EO) device will also be employed as a bunch length and bunch arrival- time diagnostic [51]. The concept, as illustrated in Figure 7.70, shows a laser pulse with a chirped waveform co-propagating with the electron beam. The active element is a thin (~100 µm) electro-optic crystal such as LiNbO3 through which the pulse propagates. The transmission of 7-98 ♦ A C C E L E R A T O R
L C L S C O N C E P T U A L D E S I G N R E P O R T portions of this laser probe is determined according to the dynamic phase retardation induced by the electric field from the electron bunch. Any transmission attributed to intrinsic (static) phase retardation (i.e., without an electron bunch) is cancelled using a pair of polarizers with a biasing optical compensator. Polarizers are positioned up- and down-stream of the electro-optic crystal and are cross-polarized relative to each other. The electric field of the electron bunch modulates the transmitted intensity of the laser pulse in the following way. The short-lived bunch field induces a birefringence that generates phase retardation in the laser pulse. Consequently a polarization component orthogonal to that of the incident pulse can be transmitted to a spectrometer during a ‘gated’ time interval. The temporal structure of the bunch-induced modulation can come from knowledge of the initial wavelength chirp on the laser waveform. A spectrometer, in this case part of a Frequency Resolved Optical Gating (FROG) device, is used to measure which part of the band has been ‘gated’ by the electron bunch. electron bunch co-propagating laser pulse ωl beam pipe initial laser chirp polarizer EO crystal analyzer spectrometer t t ωs bunch charge gated spectral signal Figure 7.70. The principal of measurement of the electron bunch length by modulation of a chirped laser pulse in an electro-optic crystal by the electric field of the bunch. In practice only the EO crystal is in vacuum. All other optical components are located outside a window. In order for the FROG to adequately record transmission of a single laser pulse from a single electron bunch a photon flux of 10 µJ is required in the gated spectral signal. This translates into a peak power requirement of ~200 MW. The chirped laser waveform is stretched to a 10-ps duration (thereby allowing up to 10 ps of relative timing jitter between laser and beam). The high peak power and proportionately wide laser bandwidth requirements can be met with a Ti:Sapphire laser oscillator seeding a regenerative amplifier. The extent of the waveform chirp is limited by the pulse bandwidth which can exceed 10 nm. At this high peak power, care is required to remain below the fluence damage threshold near the 1-J·cm −2 level in the optical materials. The co-propagating geometry is chosen since a transverse light propagation geometry would require focusing the laser light to micron level spot sizes in the EO crystal in order to preserve temporal resolution. This would exceed damage thresholds by several orders of magnitude. One constraint on the co-propagating geometry is the relative slippage between the I A C C E L E R A T O R ♦ 7-99
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Linac Coherent Light Source (LCLS)
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L C L S C O N C E P T U A L D E S I
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Preface This Conceptual Design Repo
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Table of Contents 1 Executive Summa
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6. Two experiment halls L C L S C O
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2.7.1.7 Conventional Facilities L C
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3 TECHNICAL SYNOPSIS Scientific Bas
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5 TECHNICAL SYNOPSIS FEL Parameters
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and the total peak beam power L C L
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5.4.2.2 Case II - High Charge Limit
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∆P ∆I sat pl / P / I sat pk L C
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5.9 Summary L C L S C O N C E P T U
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6 Injector TECHNICAL SYNOPSIS The i
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εn,x (µm) 4 3 2 1 4-2001 8560A95
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Quantum Yield (electrons/photon) 10
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Bz (T) 0.3 0.2 0.1 1-2002 8560A92 L
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Master Clock 9.917 MHz x8 x6 x6 Df
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1-2002 8560A198 Linac Center Line L
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B z (kG) 3 2 1 4-2001 8560A91 L C L
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γε x,y (µm) 3 2 1 0 3-2001 8560A
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γεx,y (µm) yn 10 0 -10 -10 0 10
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σ γ /γ 0 (percent) ∆N/N 0.02 0
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5 0 -5 5 0 -5 5 0 -5 L C L S C O N
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Table 6.5 PARMELA Output Parameters
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gama x (micro.m) 3 2 1 0 0 L C L S
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∆E/E 0 (%) ∆N/N 0 -1 -2 0.02 0
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〈∆E/E 0 〉 /% I pk /I pk0 0.1
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β (m) 35 30 25 20 15 10 5 0 K21_1B
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β (m) 60 50 40 30 20 10 0 L C L S
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Page 234 and 235: L C L S C O N C E P T U A L D E S I
Page 256 and 257: economic reasons. L C L S C O N C E
Page 268 and 269: Phase [deg. S-band] L C L S C O N C
Page 272 and 273: New Solid-State Sub-Booster and Ele
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Gasload (Torr-l/sec-cm) (x10 -12 )
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8.10.4 Conclusion L C L S C O N C E
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x θ j > 0 L C L S C O N C E P T U
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Quad ∆X/µm Quad ∆Y/µm −500
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∆X/µm ∆Y/µm L C L S C O N C E
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8.13.2 Undulator Cell Structure L C
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9.2 Layout and Optics 9.2.1 Experim
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Fast Valve L C L S C O N C E P T U
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0.01 10 -4 10 -6 10 -8 10 -10 10 -1
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Table 9.5 Mirror requirements L C L
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Refractive Focusing System L C L S
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Pulse Split/Delay L C L S C O N C E
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Figure 9.20 LCLS Ion Chamber L C L
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9.4.3.2 Pulse Length L C L S C O N
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9.4.3.6 Divergence L C L S C O N C
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10 Conventional Facilities TECHNICA
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1-2002 8560A198 Linac Center Line L
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Figure 10.6 Near hall floor plan 10
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11 Controls TECHNICAL SYNOPSIS The
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11.5.3 Motion Controls L C L S C O
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12.1 Procedural Overview L C L S C
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13 Environment, Safety and Health a
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Table 13-1 Hazard Identification an
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13.1 Ionizing Radiation The design
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Table 13-2 Minimum Training Require
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13.10 SLAC References L C L S C O N
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L C L S D E S I G N S T U D Y R E P
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15 TECHNICAL SYNOPSIS Work Breakdow
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A A.1 FEL-Physics A.1.1 Performance
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A.2 Photo-Injector A.2.1 Gun-Laser
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A.2.3.2 Electron Beam L C L S C O N
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A.2.4.7 Vacuum L C L S C O N C E P
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A.3.8 DL-2 A.3.8.1 Subsystem L C L
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A.4 Undulator A.4.1 Undulator A.4.1
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B Control Points B.1 Injector Contr
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C Glossary ACO Anneaux Collisions O
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