LCLS Conceptual Design Report - Stanford Synchrotron Radiation ...

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L C L S C O N C E P T U A L D E S I G N R E P O R T 66 K.L.F. Bane, et al., “Obtaining the Bunch Shape in a Linac from Beam Spectrum Measurements”, Proceedings of the 1999 Part. Accel. Conf., New York, NY, USA, 1999. 67 C. Adolphsen, et al., “Measurement of Wake Field Suppression in a Damped and Detuned X Band Accelerator Structure”, SLAC-PUB-7519, May 1997. 4pp, Submitted to Phys. Rev. Lett. 68 O. Napoly, O. Henry, “The Resistive-Pipe Wake Potentials for Short Bunches,” Particle Accelerators, Vol. 35, pp. 235-247, 1991. 69 G. Stupakov, private communication, 2000. 70 K.L.F. Bane, M. Sands, “The Short-Range Resistive Wall Wakefields,” Contributed to Micro Bunches: A Workshop on the Production, Measurement and Applications of Short Bunches of Electrons and Positrons in Linacs and Storage Rings, Upton, New York, September 28-30, 1995. 7-116 ♦ A C C E L E R A T O R
8 Undulator TECHNICAL SYNOPSIS The <strong>LCLS</strong> Undulator is made up of 33 individual undulator segments. Each undulator segment will be a permanent-magnet planar hybrid device with a period length of 30 mm and a fixed gap of nominally 6 mm. The actual gap will be adjusted as necessary to yield an effective K of 3.71. Each undulator segment is 3.42 m long, with 226 poles per jaw. The poles will be made of vanadium permendur and the magnets of a grade of NdFeB with a high intrinsic coercivity for better resistance to radiation-induced demagnetization. The electron beam will be focused by a separated function FODO lattice, using permanent-magnet quadrupoles placed between the undulator segments. These focusing or defocusing lenses will share the drift spaces between the undulator segments with electron beam position monitors and steering magnets. The drift space after every third undulator segment will be longer to provide space for x-ray diagnostics. Although the standard short drift space will be 187 mm long and the standard long one 421 mm long, the lengths of the first three drift spaces will be modified slightly to reduce the overall saturation length. The electron beam trajectory is required to be straight to within a few microns over a distance of ~10 m to achieve adequate overlap of the electron and photon beams. It is shown that this specification, although presently beyond state-of-the-art mechanically, can be achieved with beam-based techniques. A detailed magnetic design for the undulator segments is given, and a mechanical scheme for holding the magnets and poles with the necessary rigidity is presented. Provision has been made for magnetic tuning of the undulator segments by allowing small, few-period long adjustments to the magnetic gap, and by providing for side shims. In addition, adjustment of the gap at the ends of the undulator segments will be possible on a sub-micron level in order to adjust the phasing between the undulator segments. Tolerances have been developed that will set the magnetic tuning requirements for the individual undulator segments. The smoothness requirement for the inside surface of the vacuum chamber is analyzed, and found to be achievable. Ions produced by passing electron or x-ray beams can have a deleterious effect on the electron bunch, but, at the design vacuum level, the effect of the ion production is not significant. Diagnostics for the electron beam will include beam position monitors and Cherenkov detectors after each undulator segment, optical transition radiation imaging after every 3 rd undulator segment, and wire scanners and current monitors at the ends of the undulator line.
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Linac Coherent Light Source (LCLS)
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L C L S C O N C E P T U A L D E S I
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Preface This Conceptual Design Repo
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Table of Contents 1 Executive Summa
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6. Two experiment halls L C L S C O
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2.7.1.7 Conventional Facilities L C
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3 TECHNICAL SYNOPSIS Scientific Bas
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5 TECHNICAL SYNOPSIS FEL Parameters
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and the total peak beam power L C L
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5.4.2.2 Case II - High Charge Limit
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∆P ∆I sat pl / P / I sat pk L C
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5.9 Summary L C L S C O N C E P T U
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6 Injector TECHNICAL SYNOPSIS The i
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εn,x (µm) 4 3 2 1 4-2001 8560A95
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Quantum Yield (electrons/photon) 10
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Bz (T) 0.3 0.2 0.1 1-2002 8560A92 L
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Master Clock 9.917 MHz x8 x6 x6 Df
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1-2002 8560A198 Linac Center Line L
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B z (kG) 3 2 1 4-2001 8560A91 L C L
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γε x,y (µm) 3 2 1 0 3-2001 8560A
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γεx,y (µm) yn 10 0 -10 -10 0 10
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σ γ /γ 0 (percent) ∆N/N 0.02 0
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5 0 -5 5 0 -5 5 0 -5 L C L S C O N
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Table 6.5 PARMELA Output Parameters
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gama x (micro.m) 3 2 1 0 0 L C L S
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∆E/E 0 (%) ∆N/N 0 -1 -2 0.02 0
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〈∆E/E 0 〉 /% I pk /I pk0 0.1
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β (m) 35 30 25 20 15 10 5 0 K21_1B
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β (m) 60 50 40 30 20 10 0 L C L S
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Page 252 and 253: L C L S C O N C E P T U A L D E S I
Page 256 and 257: economic reasons. L C L S C O N C E
Page 268 and 269: Phase [deg. S-band] L C L S C O N C
Page 272 and 273: New Solid-State Sub-Booster and Ele
Page 278 and 279: 7.8.2 Bunch Length Diagnostics L C
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Page 304 and 305: 8.1 Overview 8.1.1 Introduction L C
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Gasload (Torr-l/sec-cm) (x10 -12 )
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8.10.4 Conclusion L C L S C O N C E
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x θ j > 0 L C L S C O N C E P T U
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Quad ∆X/µm Quad ∆Y/µm −500
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∆X/µm ∆Y/µm L C L S C O N C E
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8.13.2 Undulator Cell Structure L C
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9.2 Layout and Optics 9.2.1 Experim
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Fast Valve L C L S C O N C E P T U
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0.01 10 -4 10 -6 10 -8 10 -10 10 -1
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Table 9.5 Mirror requirements L C L
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Refractive Focusing System L C L S
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Pulse Split/Delay L C L S C O N C E
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Figure 9.20 LCLS Ion Chamber L C L
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9.4.3.2 Pulse Length L C L S C O N
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9.4.3.6 Divergence L C L S C O N C
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10 Conventional Facilities TECHNICA
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1-2002 8560A198 Linac Center Line L
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Figure 10.6 Near hall floor plan 10
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11 Controls TECHNICAL SYNOPSIS The
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11.5.3 Motion Controls L C L S C O
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12.1 Procedural Overview L C L S C
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13 Environment, Safety and Health a
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Table 13-1 Hazard Identification an
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13.1 Ionizing Radiation The design
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Table 13-2 Minimum Training Require
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13.10 SLAC References L C L S C O N
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L C L S D E S I G N S T U D Y R E P
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15 TECHNICAL SYNOPSIS Work Breakdow
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A A.1 FEL-Physics A.1.1 Performance
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A.2 Photo-Injector A.2.1 Gun-Laser
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A.2.3.2 Electron Beam L C L S C O N
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A.2.4.7 Vacuum L C L S C O N C E P
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A.3.8 DL-2 A.3.8.1 Subsystem L C L
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A.4 Undulator A.4.1 Undulator A.4.1
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B Control Points B.1 Injector Contr
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C Glossary ACO Anneaux Collisions O
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