LCLS Conceptual Design Report - Stanford Synchrotron Radiation ...

More documents

Recommendations

Info

L C L S C O N C E P T U A L D E S I G N R E P O R T To reduce errors stemming from transcription of data, the data-flow will be automated. The suggested instruments support direct connection to field computers. The fully automated data-flow will extend from field computers through data analysis to data storage. Measurements with any type of instrument will be guided by software based on rigid procedures running on field data logging computers. The data-logging software will also pre- analyze the measurements, in an attempt to determine and flag possible outliers before the measurement setup is broken down. This method combined with an automated data-flow will greatly reduce errors and improve measurement consistency and reliability. 12.3 Layout Description Reference Frame 12.3.1 Lattice Coordinate System The LCLS lattice is designed in a right-handed beam-following (s-axis) coordinate system, where the positive y-axis is perpendicular to the design plane, the z-axis is pointing in the beam direction and perpendicular to the y-axis, and the x-axis is perpendicular to both the y and z-axes. 12.3.2 Tolerance Lists The alignment system is designed based on the tolerances listed in Table 12.2. Table 12.2 LCLS positioning tolerances σx [µm] σy [µm] σr [mr] σx/z [µm/m] σy/z [µm/m] Relative alignment between undulator sections 100 50 1 n/a n/a Global straightness of undulator n/a n/a 1 300/120 50/120 Quadrupole ab initio 50 50 n/a n/a n/a Linac straightness n/a n/a n/a 150/15 150/15 Injector components 150 150 1 n/a n/a Experimental area components 1000 1000 n/a n/a n/a n/a = not applicable 12.3.3 Relationship Between Coordinate Systems The relationship between the surveying and lattice coordinate systems is given by the building design and machine layout parameters. The result is a transformation matrix (rotations and translations). 12-12 ♦ A L I G N M E N T
L C L S C O N C E P T U A L D E S I G N R E P O R T 12.4 Fiducializing LCLS Magnets The correct fiducialization of magnets is as important as their correct alignment since an error in either task will affect the particles’ trajectory and cannot be distinguished from each other. Fiducialization can be accomplished either through opto-mechanical and opto-electrical measurements or by using fixtures, which refer to a magnet’s reference features. Detailed descriptions can be found in the literature [2]. The most demanding task is the vertical positioning of the undulator to 50 µm over the total length. Since the undulator sections will be aligned relative to their adjacent downstream quadrupoles, both the undulator segments and the quadrupoles need to be fiducialized to better than 25 µm in order to leave a reasonable error budget for the alignment process. The quadrupoles are permanent magnets of fairly small size. Hence, thermal expansion can be neglected. It is planned to use the same pulsed wire/straightness interferometer technique as was used to fiducialize the VISA undulator magnets [3]. Such a pulsed wire test stand prototype has been developed and setup at SLAC, and it has been demonstrated that the axis of an undulator quadrupole prototype can be repeatably determined to better than 5 µm. While most of the magnetic measurements of the undulator segments will be carried out elsewhere, it is deemed necessary to check these measurements at SLAC to verify the magnet’s homogeneity after transportation across the country (see also Section 8.3.3). The fiducialization measurements will become an integral part of the magnetic measurements. This can be accomplished by integrating a Coordinate Measurements Machine (CMM) into the test stand setup. Components for the injector, linac, and dump line will be fiducialized using standard techniques. 12.5 Absolute Positioning of Components Common to all parts of the machine, free-stationed laser trackers, oriented to at least four neighboring points, are used for the absolute positioning measurements. The tracking capabilities of these instruments will significantly aid in facilitating the control of any alignment operation (moving components into position). 12.5.1 Undulator Absolute Positioning The absolute positioning is carried out in several steps. At first, the anchor hole positions for the component supports are marked on the floor. Next, after the supports and the magnet movers are installed, they will be aligned to within 0.5 mm of their nominal positions in order to retain as much mover range as possible. At this stage, the components can be installed. Since the components mechanically register to the support/magnet mover geometry, the installation will already place them to within 0.5 mm. Finally, the position of the components will be surveyed and adjusted using a laser tracker in reference to adjacent network points. Absolute position accuracy relative to the network points of about 150 µm can be achieved. A L I G N M E N T♦ 12-13
Page 1 and 2:
Linac Coherent Light Source (LCLS)
Page 3 and 4:
L C L S C O N C E P T U A L D E S I
Page 5 and 6:
Page 7 and 8:
Preface This Conceptual Design Repo
Page 9 and 10:
Page 11 and 12:
Table of Contents 1 Executive Summa
Page 13 and 14:
Page 15 and 16:
Page 17 and 18:
Page 19 and 20:
Page 21 and 22:
Page 23 and 24:
Page 25:
Page 28 and 29:
6. Two experiment halls L C L S C O
Page 30 and 31:
Page 32 and 33:
Page 34 and 35:
Page 36 and 37:
Page 38 and 39:
2.7.1.7 Conventional Facilities L C
Page 40 and 41:
Page 42 and 43:
Page 44 and 45:
Page 46 and 47:
Page 49 and 50:
3 TECHNICAL SYNOPSIS Scientific Bas
Page 51 and 52:
Page 53 and 54:
Page 55 and 56:
Page 57:
Page 60 and 61:
Page 62 and 63:
Page 64 and 65:
Page 66 and 67:
Page 68 and 69:
Page 70 and 71:
Page 72 and 73:
Page 74 and 75:
Page 76 and 77:
Page 78 and 79:
Page 80 and 81:
Page 82 and 83:
Page 84 and 85:
Page 86 and 87:
Page 89 and 90:
5 TECHNICAL SYNOPSIS FEL Parameters
Page 91 and 92:
Page 93 and 94:
and the total peak beam power L C L
Page 95 and 96:
Page 97 and 98:
Page 99 and 100:
Page 101 and 102:
Page 103 and 104:
Page 105 and 106:
5.4.2.2 Case II - High Charge Limit
Page 107 and 108:
Page 109 and 110:
Page 111 and 112:
Page 113 and 114:
∆P ∆I sat pl / P / I sat pk L C
Page 115 and 116:
Page 117 and 118:
5.9 Summary L C L S C O N C E P T U
Page 119 and 120:
6 Injector TECHNICAL SYNOPSIS The i
Page 121 and 122:
Page 123 and 124:
Page 125 and 126:
εn,x (µm) 4 3 2 1 4-2001 8560A95
Page 127 and 128:
Page 129 and 130:
Page 131 and 132:
Page 133 and 134:
Page 135 and 136:
Page 137 and 138:
Page 139 and 140:
Quantum Yield (electrons/photon) 10
Page 141 and 142:
Bz (T) 0.3 0.2 0.1 1-2002 8560A92 L
Page 143 and 144:
Page 145 and 146:
Page 147 and 148:
Page 149 and 150:
Page 151 and 152:
Page 153 and 154:
Master Clock 9.917 MHz x8 x6 x6 Df
Page 155 and 156:
Page 157 and 158:
Page 159 and 160:
1-2002 8560A198 Linac Center Line L
Page 161 and 162:
Page 163 and 164:
Page 165 and 166:
B z (kG) 3 2 1 4-2001 8560A91 L C L
Page 167 and 168:
Page 169 and 170:
γε x,y (µm) 3 2 1 0 3-2001 8560A
Page 171 and 172:
γεx,y (µm) yn 10 0 -10 -10 0 10
Page 173 and 174:
σ γ /γ 0 (percent) ∆N/N 0.02 0
Page 175 and 176:
5 0 -5 5 0 -5 5 0 -5 L C L S C O N
Page 177 and 178:
Table 6.5 PARMELA Output Parameters
Page 179 and 180:
gama x (micro.m) 3 2 1 0 0 L C L S
Page 181 and 182:
∆E/E 0 (%) ∆N/N 0 -1 -2 0.02 0
Page 183 and 184:
Page 185:
Page 188 and 189:
Page 190 and 191:
Page 192 and 193:
Page 194 and 195:
Page 196 and 197:
Page 198 and 199:
Page 200 and 201:
Page 202 and 203:
Page 204 and 205:
〈∆E/E 0 〉 /% I pk /I pk0 0.1
Page 206 and 207:
Page 208 and 209:
Page 210 and 211:
Page 212 and 213:
Page 214 and 215:
Page 216 and 217:
β (m) 35 30 25 20 15 10 5 0 K21_1B
Page 218 and 219:
Page 220 and 221:
β (m) 60 50 40 30 20 10 0 L C L S
Page 222 and 223:
Page 224 and 225:
Page 226 and 227:
Page 228 and 229:
Page 230 and 231:
Page 232 and 233:
Page 234 and 235:
Page 236 and 237:
Page 238 and 239:
Page 240 and 241:
Page 242 and 243:
Page 244 and 245:
Page 246 and 247:
Page 248 and 249:
Page 250 and 251:
Page 252 and 253:
Page 254 and 255:
Page 256 and 257:
economic reasons. L C L S C O N C E
Page 258 and 259:
Page 260 and 261:
Page 262 and 263:
Page 264 and 265:
Page 266 and 267:
Page 268 and 269:
Phase [deg. S-band] L C L S C O N C
Page 270 and 271:
Page 272 and 273:
New Solid-State Sub-Booster and Ele
Page 274 and 275:
Page 276 and 277:
Page 278 and 279:
7.8.2 Bunch Length Diagnostics L C
Page 280 and 281:
Page 282 and 283:
Page 284 and 285:
Page 286 and 287:
Page 288 and 289:
Page 290 and 291:
Page 292 and 293:
Page 294 and 295:
Page 296 and 297:
Magnet String Location Existing, Ne
Page 298 and 299:
Page 300 and 301:
Page 302 and 303:
Page 304 and 305:
8.1 Overview 8.1.1 Introduction L C
Page 306 and 307:
Page 308 and 309:
Page 310 and 311:
Page 312 and 313:
Page 314 and 315:
Page 316 and 317:
Page 318 and 319:
Page 320 and 321:
Page 322 and 323:
Page 324 and 325:
Page 326 and 327:
Mu in the pole, for mu
Page 328 and 329:
Page 330 and 331:
Page 332 and 333:
Page 334 and 335:
Page 336 and 337:
Page 338 and 339:
Page 340 and 341:
Page 342 and 343:
Page 344 and 345:
Page 346 and 347:
Page 348 and 349:
Page 350 and 351:
Page 352 and 353:
Page 354 and 355:
Gasload (Torr-l/sec-cm) (x10 -12 )
Page 356 and 357:
Page 358 and 359:
Page 360 and 361:
Page 362 and 363:
Page 364 and 365:
Page 366 and 367:
Page 368 and 369:
8.10.4 Conclusion L C L S C O N C E
Page 370 and 371:
Page 372 and 373:
Page 374 and 375:
Page 376 and 377:
x θ j > 0 L C L S C O N C E P T U
Page 378 and 379:
Page 380 and 381:
Page 382 and 383:
Page 384 and 385:
Page 386 and 387:
Quad ∆X/µm Quad ∆Y/µm −500
Page 388 and 389:
∆X/µm ∆Y/µm L C L S C O N C E
Page 390 and 391:
Page 392 and 393:
8.13.2 Undulator Cell Structure L C
Page 394 and 395:
Page 396 and 397:
Page 398 and 399:
Page 400 and 401:
Page 402 and 403:
Page 404 and 405:
Page 406 and 407:
Page 408 and 409:
9.2 Layout and Optics 9.2.1 Experim
Page 410 and 411:
Fast Valve L C L S C O N C E P T U
Page 412 and 413:
Page 414 and 415:
0.01 10 -4 10 -6 10 -8 10 -10 10 -1
Page 416 and 417:
Page 418 and 419:
Table 9.5 Mirror requirements L C L
Page 420 and 421:
Refractive Focusing System L C L S
Page 422 and 423: L C L S C O N C E P T U A L D E S I
Page 424 and 425: Pulse Split/Delay L C L S C O N C E
Page 430 and 431: Figure 9.20 LCLS Ion Chamber L C L
Page 434 and 435: 9.4.3.2 Pulse Length L C L S C O N
Page 436 and 437: 9.4.3.6 Divergence L C L S C O N C
Page 438 and 439: 10 Conventional Facilities TECHNICA
Page 440 and 441: 1-2002 8560A198 Linac Center Line L
Page 444 and 445: Figure 10.6 Near hall floor plan 10
Page 449 and 450: 11 Controls TECHNICAL SYNOPSIS The
Page 455 and 456: 11.5.3 Motion Controls L C L S C O
Page 459: L C L S C O N C E P T U A L D E S I
Page 462 and 463: 12.1 Procedural Overview L C L S C
Page 481 and 482: 13 Environment, Safety and Health a
Page 483 and 484: Table 13-1 Hazard Identification an
Page 485 and 486: 13.1 Ionizing Radiation The design
Page 487 and 488: Table 13-2 Minimum Training Require
Page 495: 13.10 SLAC References L C L S C O N
Page 498 and 499: L C L S D E S I G N S T U D Y R E P
Page 515 and 516: 15 TECHNICAL SYNOPSIS Work Breakdow
Page 519 and 520: A A.1 FEL-Physics A.1.1 Performance
Page 521 and 522: A.2 Photo-Injector A.2.1 Gun-Laser
Page 523 and 524:
A.2.3.2 Electron Beam L C L S C O N
Page 525 and 526:
A.2.4.7 Vacuum L C L S C O N C E P
Page 527 and 528:
Page 529 and 530:
Page 531 and 532:
Page 533 and 534:
A.3.8 DL-2 A.3.8.1 Subsystem L C L
Page 535 and 536:
A.4 Undulator A.4.1 Undulator A.4.1
Page 537 and 538:
Page 539 and 540:
Page 541 and 542:
Page 543 and 544:
B Control Points B.1 Injector Contr
Page 545 and 546:
Page 547 and 548:
C Glossary ACO Anneaux Collisions O
Page 549 and 550:
Page 551 and 552:
Page 553:
show all

LCLS Conceptual Design Report - Stanford Synchrotron Radiation ...

Create successful ePaper yourself

Delete template?

Save as template?