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4.4 Phase 4 - Backgrounds<br />
Quilting the Quilt - Which CS Feature To use<br />
Phase 4 - Backgrounds<br />
An Edge-to-Edge (E2E) quilting design is a very simple form of background quilting.<br />
The pattern is stitched both across (multiple repeats) and down (multiple rows) the<br />
area. For custom quilting, background fillers are frequently used. This is dense<br />
quilting around an applique or quilted motif. The filler compresses the background<br />
allowing the applique or motif to be framed and highlighted.<br />
4.4.1 Background Fillers using Trim - Inside<br />
Applique blocks are good examples of the need to stitch the background down,<br />
allowing the applique to 'pop'. The background pattern is usually a dense filler<br />
pattern. The Trim-inside feature allows the background pattern to be positioned over<br />
the entire block boundary. On top of that, the boundary of the applique shape is<br />
defined and the boundary is trimmed away from the inside of the applique area so it<br />
won't be stitched over.<br />
Feature: Trim Pattern - Inside<br />
Assumptions: The quilt top is loaded and stabilized, machine is threaded, bobbins<br />
wound, belts engaged and patterns have been added to the project.<br />
In this example, a large area will be quilted using a background filler pattern<br />
(bubbles). The quilt has some nautical creatures that are appliqued and will not be<br />
quilted with bubbles.<br />
Steps to follow:<br />
1. Click on the Boundary icon and follow the prompts to define the<br />
boundary of the background area. If the project were to fill the background of an<br />
appliqued block, this would be the outer boundary.<br />
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