section 1 - World Intellectual Property Organization

37/2000
14 Sep/sep 2000 PCT Gazette - Section I - Gazette du PCT 13207
(51) 7 B41J 2/01, 2/21, 2/51
(11) WO 00/53420 (13) A1
(21) PCT/JP00/01414
(22) 8 Mar/mar 2000 (08.03.2000)
(25) ja (26) ja
(30) 11/62969 10 Mar/mar 1999
(10.03.1999)
(30) 2000/55480 1 Mar/mar 2000
(01.03.2000)
(30) 2000/55500 1 Mar/mar 2000
(01.03.2000)
(30) 2000/55516 1 Mar/mar 2000
(01.03.2000)
(43) 14 Sep/sep 2000 (14.09.2000)
(54) ADJUSTMENT OF DISPLACEMENT
OF DOT FORMING POSITION BY
USING INFORMATION THAT NO
DOT IS TO BE FORMED FOR EACH
PIXEL UNIT
AJUSTEMENT DU DEPLACEMENT
DE L’EMPLACEMENT D’UN POINT
AL’AIDE D’INFORMATIONS SELON
LESQUELLES AUCUN POINT NE
DOIT ETRE FORME POUR CHAQUE
UNITE DE PIXEL
(71) SEIKO EPSON CORPORATION [JP/JP];
4–1, Nishi–shinjuku 2–chome, Shinjuku–ku,
Tokyo 163–0811 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) SHIMADA, Kazumichi [JP/JP]; Seiko
Epson Corporation, 3–5, Owa 3–chome,
Suwa–shi, Nagano 392–8502 (JP). HAYA-
SHI, Toshihiro [JP/JP]; Seiko Epson
Corporation, 3–5, Owa 3–chome, Suwa–shi,
Nagano 392–8502 (JP). KANAYA, Munehide
[JP/JP]; Seiko Epson Corporation, 3–5,
Owa 3–chome, Suwa–shi, Nagano 392–8502
(JP). OTSUKI, Koichi [JP/JP]; Seiko Epson
Corporation, 3–5, Owa 3–chome, Suwa–shi,
Nagano 392–8502 (JP).
(74) IGARASHI, Takao et al. / etc.; Chuo
Fushimi Building 3F, 3–2, Nishiki 1–chome,
Naka–ku, Nagoya–shi, Aichi 460–0003 (JP).
(81) US; EP (AT BE CH CY DE DK ES FI FR
GB GR IE IT LU MC NL PT SE).
(51) 7 B41J 2/205, 2/045, 2/055
(11) WO 00/53421 (13) A1
(21) PCT/JP00/01311
(22) 3 Mar/mar 2000 (03.03.2000)
(25) ja (26) ja
(30) 11/58131 5 Mar/mar 1999
(05.03.1999)
(30) 11/58141 5 Mar/mar 1999
(05.03.1999)
(30) 11/73546 18 Mar/mar 1999
(18.03.1999)
(43) 14 Sep/sep 2000 (14.09.2000)
JP
JP
JP
JP
JP
JP
JP
(54) PRINTING USING A PLURALITY OF
KINDS OF DOTS HAVING DIFFE-
RENT FORMATION MODES WITH
EQUAL AMOUNT OF INK
IMPRESSION UTILISANT PLUSIEURS
TYPES DE POINTS A MODES DE
FORMATION DIFFERENTS AVEC
UNE MEME QUANTITE D’ENCRE
(71) SEIKO EPSON CORPORATION [JP/JP];
4–1, Nishi–shinjuku 2–chome, Shinjuku–ku,
Tokyo 163–0811 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) KATAKURA, Takahiro [JP/JP];
Seiko Epson Corporation, 3–5, Owa
3–chome, Suwa–shi, Nagano 392–8502
(JP). SAYAMA, Tomohiro [JP/JP]; Seiko
Epson Corporation, 3–5, Owa 3–chome,
Suwa–shi, Nagano 392–8502 (JP).
(74) IGARASHI, Takao et al. / etc.; Chuo
Fushimi Building 3F, 3–2, Nishiki 1–chome,
Naka–ku, Nagoya–shi, Aichi 460–0003 (JP).
(81) JP US; EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE).
(51) 7 B41J 2/447
(11) WO 00/53422 (13) A1
(21) PCT/US00/06274
(22) 10 Mar/mar 2000 (10.03.2000)
(25) en (26) en
(30) 99104942.0 12 Mar/mar 1999
(12.03.1999)
(30) 99104943.8 12 Mar/mar 1999
(12.03.1999)
(30) 09/290,828 13 Apr/avr 1999
(13.04.1999)
(30) 09/290,829 13 Apr/avr 1999
(13.04.1999)
(30) 60/136,035 26 May/mai 1999
(26.05.1999)
(30) 99112797.8 2 Jul/juil 1999
(02.07.1999)
(43) 14 Sep/sep 2000 (14.09.2000)
EP
EP
US
US
US
EP
(54) PIXEL INTENSITY CONTROL IN
ELECTRO–OPTIC MODULATORS
COMMANDE DE L’INTENSITE DES
PIXELS DANS DES MODULATEURS
ELECTRO–OPTIQUES
(71) KODAK POLYCHROME GRAPHICS
COMPANY LTD. [US/US]; 401 Merritt 7,
Norwalk, CT 06851 (US).
(72) MOULIN, Michel; Rue d’En Haut 16,
CH–1143 Apples (CH).
(74) SORELL, Louis, S.; Baker Botts LLP,
30 Rockefeller Plaza, New York, NY
10112–0228 (US).
(81) AE AL AM AT AT (Utility model / modèle
d’utilité) AUAZBABBBGBRBYCACH
CN CR CU CZ CZ (Utility model / modèle
d’utilité) DE DE (Utility model / modèle
d’utilité) DK DK (Utility model / modèle
d’utilité) DM DZ EE EE (Utility model /
modèle d’utilité) ES FI FI (Utility model /
modèle d’utilité) GBGDGEGHGMHR
HU ID IL IN IS JP KE KG KP KR KZ LC
LK LR LS LT LU LV MA MD MG MK MN
MW MX NO NZ PL PT RO RU SD SE SG
SI SK SK (Utility model / modèle d’utilité)
SL TJ TM TR TT TZ UA UG UZ VN YU
ZA ZW; AP (GH GM KE LS MW SD SL
SZ TZ UG ZW); EA (AM AZ BY KG KZ
MD RU TJ TM); EP (AT BE CH CY DE
DK ES FI FR GB GR IE IT LU MC NL PT
SE); OA (BF BJ CF CG CI CM GA GN GW
ML MR NE SN TD TG).
Published / Publiée :(c)
(51) 7 B41M 3/00, G03H 1/02
(11) WO 00/53423 (13) A1
(21) PCT/US00/06509
(22) 9 Mar/mar 2000 (09.03.2000)
(25) en (26) en
(30) 60/123,638 10 Mar/mar 1999
(10.03.1999)
(30) 09/521,580 9 Mar/mar 2000
(09.03.2000)
(43) 14 Sep/sep 2000 (14.09.2000)
US
US
(54) TECHNIQUES OF PRINTING MICRO–
STRUCTURE PATTERNS SUCH AS
HOLOGRAMS DIRECTLY ONTO
FINAL DOCUMENTS OR OTHER
SUBSTRATES IN DISCRETE AREAS
THEREOF
TECHNIQUES D’IMPRESSION DI-
RECTE DE MOTIFS DE MICRO-
STRUCTURE TELS QUE DES HOLO-
GRAMMES SUR DES DOCUMENTS
DEFINITIFS OU SUR D’AUTRES SUR-
FACES SUR DES ZONES DISCRETES
(71) AMERICAN BANK NOTE HOLOGRA-
PHICS, INC. [US/US]; 399 Executive Boulevard,
Elmsford, NY 10523–1239 (US).
(72) D’AMATO, Salvatore, F.; 18 Meadow Avenue,
Monmouth Beach, NJ 07750 (US).
(74) PARSONS, Gerald, P. et al. / etc.; Majestic,
Parsons, Siebert & Hsue P.C., Four Embarcadero
Center, Suite 1100, San Francisco,
CA 94111–4106 (US).
(81) AE AL AM AT AU AZ BA BB BG BR BY
CA CH CN CR CU CZ DE DK DM EE ES
FI GB GD GE GH GM HR HU ID IL IN
IS JP KE KG KP KR KZ LC LK LR LS LT
LU LV MA MD MG MK MN MW MX NO
NZ PL PT RO RU SD SE SG SI SK SL TJ
TM TR TT TZ UA UG UZ VN YU ZA ZW;
AP (GH GM KE LS MW SD SL SZ TZ UG
ZW); EA (AM AZ BY KG KZ MD RU TJ
TM); EP (AT BE CH CY DE DK ES FI FR
GB GR IE IT LU MC NL PT SE); OA (BF
BJ CF CG CI CM GA GN GW ML MR NE
SN TD TG).
Published / Publiée :(c)