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Developments in Ceramic Materials Research

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Field Emission Display on <strong>Ceramic</strong> 243<br />

the phosphors of a pixel to create an image, as a result the panel thickness can be reduced<br />

down to several millimetres [4]. Another advantage of a FED structure over a CRT is the<br />

reduction <strong>in</strong> the number of drivers by a factor of three (one s<strong>in</strong>gle emitter sends electrons<br />

towards a sub-pixel which is successively red, green and blue).<br />

Field Emission Display Technology and Advanced <strong>Ceramic</strong>s Technology<br />

For an electron to leave a material, the electron must ga<strong>in</strong> energy to exceed the work<br />

function, which is a potential barrier at the surface of a metallic conductor that b<strong>in</strong>ds electrons<br />

to the material. This can be accomplished <strong>in</strong> a variety of ways, <strong>in</strong>clud<strong>in</strong>g thermal excitation <strong>in</strong><br />

the case of thermionic emission, electron and ionic bombardment <strong>in</strong> the case of secondary<br />

electron emission, and the absorption of photons <strong>in</strong> the case of photoelectric emission. Field<br />

emission differs from all these forms of electron emission <strong>in</strong> that the emitted electrons do not<br />

ga<strong>in</strong> an energy which exceeds the material’s work function.<br />

Field emission phenomenon results from the tunnell<strong>in</strong>g of electrons from a metal or a<br />

semiconductor <strong>in</strong>to the vacuum under an application of a strong electric field. The high<br />

electric field applied to the vic<strong>in</strong>ity of the surface of a substance to low and th<strong>in</strong> the potential<br />

barrier on the surface, so that free electrons with high potential energy <strong>in</strong>side the substance<br />

can have possibility to tunnel through the th<strong>in</strong>ned potential barrier and leave the surface.<br />

S<strong>in</strong>ce there is no heat transfer <strong>in</strong>volved <strong>in</strong> the electron emission, field emitters are called cold<br />

cathode electron source [5]. To achieve a low operat<strong>in</strong>g voltage of a cold field emitter, <strong>in</strong> the<br />

case of a micro tips based FED, the tips are manufactured <strong>in</strong>to very sharp form so that the<br />

local electric field strengths become high enough for even a moderately low voltage applied<br />

to the adjacent gate electrode [6]. Us<strong>in</strong>g a low work function material could also significantly<br />

reduce the turn on gate voltage for a field emitter. The most popular low work function<br />

material for form<strong>in</strong>g a micro tip is molybdenum [7]. The micro tip field emitter fabrication<br />

technique was <strong>in</strong>itially <strong>in</strong>vented by Dr. Charles A. “Capp” Sp<strong>in</strong>dt at the Stanford <strong>Research</strong><br />

Institute (now called SRI International) <strong>in</strong> 1968 [8]. The pr<strong>in</strong>cipal component of a Sp<strong>in</strong>dt<br />

cathode comprise a basic triode structure: a bottom cathode conduct<strong>in</strong>g layer, on which<br />

molybdenum micro tips <strong>in</strong> conical shape reside; a top gate conduct<strong>in</strong>g electrode layer, and an<br />

<strong>in</strong>sulat<strong>in</strong>g oxide layer <strong>in</strong> between [9]. In the fabrication process, molybdenum cones with tip<br />

radii less than 30 nm are deposited by electron beam evaporation <strong>in</strong>to the emitter wells. The<br />

cone form<strong>in</strong>g process is self aligned. The advantages of such a structure <strong>in</strong>clude the high<br />

electron draw<strong>in</strong>g efficiency s<strong>in</strong>ce the electron emission portion is arranged <strong>in</strong> the vic<strong>in</strong>ity of<br />

the centre of gate electrode where the electric field is most concentrated, the <strong>in</strong>-plane<br />

uniformity of drawn current is high, and the directivity of electron emission is regular,<br />

compared to the other field emission device.<br />

Sp<strong>in</strong>dt’s development stimulated the technology further <strong>in</strong>to a concept to use field emitter<br />

arrays <strong>in</strong> a matrix addressed display (FED) conceived by the SRI team of which Sp<strong>in</strong>dt was a<br />

member, and patented by M. E. Crost, K. R. Shoulders and M. H. Z<strong>in</strong>n <strong>in</strong> 1970 [10]. By<br />

1972, the SRI group had overcome more eng<strong>in</strong>eer<strong>in</strong>g problems to demonstrate to their<br />

satisfaction that it was feasible to manufacture FEDs [11]. Their new fabrication methods<br />

were patented by C. A. Sp<strong>in</strong>dt, K. R. Shoulders, and L. N. Heynick <strong>in</strong> 1973 and 1974 [12, 13,<br />

14]. However SRI was unable to obta<strong>in</strong> fund<strong>in</strong>g to develop the FED concept <strong>in</strong> the decades of<br />

the seventies and early eighties. The idea was picked up and the <strong>in</strong>itiative to develop the

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