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Third Day Poster Session, 17 June 2010 - NanoTR-VI

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<strong>Poster</strong> <strong>Session</strong>, Thursday, <strong>June</strong> <strong>17</strong><br />

Theme F686 - N1123<br />

Electrical and Optical Properties of Al Doped ZnO Film and Potential Applications of Gas Sensors<br />

1,2<br />

1,2<br />

1,2<br />

1,2<br />

UO. SancakogluUP<br />

P*, M. ErolP<br />

P, M. BektasP<br />

P, F. EbeoglugilP<br />

P, H. SozbilenP<br />

3P, O. Mermer 2,3P, E. Celik 1,2<br />

1<br />

PDokuz Eylul University, Department of Metallurgical and Materials Engineering, Tinaztepe Campus, 35160 Buca, Izmir-Turkey.<br />

2<br />

PDokuz Eylul University, Center for Fabrication and Application of Electronic Materials (EMUM), Tinaztepe Campus, 35160<br />

Buca, Izmir-Turkey<br />

3<br />

PEge University, Deparment of Electrical and Electronics Engineering, 35100, Bornova, Izmir-Turkey.<br />

Abstract-Undoped and Al doped semiconductor ZnO films on Si(100) and glass substrates were prepared by sol-gel technique. For this<br />

propose, transparent solutions were prepared with Zn and Al based precursors. The solutions were deposited on glass substrates using spin<br />

coating technique which decreases the film thickness up to nanoscale and gives the coating a smooth characteristic. Deposited films were dried<br />

o<br />

o<br />

at 300P PC for 10 min in order to remove hydrous and volatile content, subsequently films were heat treated at 500P PC for 5 min. to remove<br />

o<br />

organic contents and then to obtain ZnO phase structure the films were annealed at 600P PC for 1 hour in air atmosphere. Finally the surface<br />

morphologies and roughness values of the films were determined via AFM (atomic force microscopy) and profilometer, respectively. The<br />

structural and optical properties of these films have been investigated by XRD (x-ray diffractometer) and optical properties such as<br />

transmittance spectrum, optical band gap, and optical constants (refractive index, extinction coefficient, real and imaginary parts of the dielectric<br />

constant) of the films were determined.<br />

Zinc oxide (ZnO) has attracted extensive interest because<br />

of its important role in various applications, for example, gas<br />

sensor [1], varistors [2], surface acoustic wave devices [3],<br />

optical waveguides [4] as well as blue/UV light emitting<br />

devices [5]. In addition, ZnO has been considered as an<br />

excellent candidate to replace indium tin oxide (ITO) and tin<br />

oxide (SnO2) as transparent conductive electrodes in flat panel<br />

display and solar cell devices [6,7]. The advantages of zinc<br />

oxide include inexpensiveness and relative ease of<br />

lithography. However, the electrical conductivity of un-doped<br />

zinc oxide is not high enough for practical application. Further<br />

reduction of resistivity of zinc oxide can be achieved either by<br />

doping group III elements such as B, Al, In and Ga to replace<br />

zinc atoms [8] or group IV elements, F, to substitute oxygen<br />

atoms [9].<br />

The structural and morphological properties of<br />

semiconductor oxides have a substantial effect on their optical,<br />

electrical and gas sensing properties. The controlledparticle<br />

size and morphology facilitate the desired characteristics in<br />

the materials. Several simplewet chemical routes like sol–gel,<br />

co-precipitation and Pechini route have been adapted to form<br />

nanostructures [10].<br />

specific acid-alcohol medium to remove the contaminations<br />

and prepare the surface for sol-gel coating. The films were<br />

deposited by the technique detailed in Figure 1.<br />

Figure 2 shows the x-ray diffraction spectra of the pure<br />

ZnO film. It also represents the success of the coating process.<br />

Figure 2. X-ray diffraction spectra of the pure ZnO film.<br />

The structural and optical properties of the films will be<br />

shown in details. b)<br />

The authors are indebted to State Planning Foundation<br />

(DPT) and Dokuz Eylul University for financial support.<br />

*Corresponding author: orkut.sancakoglu@deu.edu.tr<br />

Figure 1. Flow chart of sol-gel processing for ZnO thin films.<br />

In the present study; pure, and Al substituted ZnOR Rthin films<br />

were deposited on glass substrates by sol-gel method and spin<br />

coating technique. Si(100) and glass substrates were<br />

mechanically cleaned by using a new designed apparatus in a<br />

[1] K.S. Weibenrieder, J. Muller, Thin Solid Films 30 (1997) 30.<br />

[2] E. Olsson, L.K.L. Falk, G.L. Dunlop, R. Osterlund, J. Mater. Sci.<br />

20 (1985) 4091.<br />

[3] C.R. Gorla, N.W. Emanetoglu, S. Liang, W.E. Mayo, Y. Lu, M.<br />

Wraback, H. Shen, J. Appl. Phys. 85 (1999) 2595.<br />

[4] M.H. Koch, P.Y. Timbrell, R.N. Lamb, Semicond. Sci. Technol.<br />

10 (1995) 1523.<br />

[5] D.C. Look, D.C. Reynolds, C.W. Litton, R.L. Jones, D.B. Easton,<br />

G. Cantwell, Appl. Phys. Lett. 81 (2002) 1830.<br />

[6] G. Hass, J. Heaney, A.R. Toft, Appl. Opt. 18 (1975) 1488.<br />

[7] R. Barber, G. Pryor, E. Reinheimer, SID Digest Tech. 28 (1997)<br />

18.<br />

[8] G. Sberveglieri, B. Benussi, G. Coccoli, S. Groppelli, P. Nelli,<br />

Thin Solid Films 186 (1990) 349.<br />

[9] C. Grivas, S. Mailis, L. Boutsikaris, D.S. Gill, N.A. Vainos, P.J.<br />

Chandler, Laser Phys. 8 (1998) 326.<br />

[10] C. S. Navale, V. Ravi, I.S. Mulla, Sensors and Actuators B 139<br />

(2009) 466–470<br />

6th Nanoscience and Nanotechnology Conference, zmir, <strong>2010</strong> 702

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