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Photonic crystals in biology

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Poster Session, Tuesday, June 15<br />

Theme A1 - B702<br />

Structural and electrical properties of spray deposited pure and Sb doped t<strong>in</strong> oxide<br />

* Güven Turgut, Demet Tatar, Serdar Aydın, Erdal Sönmez and Bahatt<strong>in</strong> Düzgün<br />

K. K. Education Faculty, Department of Physics, Ataturk University, Erzurum 25240, Turkey<br />

Abstract— Pure and 2wt. % Sb doped t<strong>in</strong> oxide (SnO 2 :Sb) th<strong>in</strong> films were prepared by spray pyrolysis onto glass substrates at 420 0 C. X-ray<br />

diffraction (XRD) analysis showed that all films are polycrystall<strong>in</strong>e and Sb dop<strong>in</strong>g <strong>in</strong>creased crystall<strong>in</strong>ity. The films are prefentially oriented<br />

along the (110) direction. Atomic force microscopy (AFM) studies showed that roughness (RMS) of 22.52 nm for undoped films has been<br />

slightly reduced to 15.56 nm on Sb dop<strong>in</strong>g films. Hall effect studies have been performed on SnO 2 (TO) and SnO 2 :Sb(ATO) films coated on glass<br />

substrates.The electrical study reveals that the films are degenerate and exhibit n-type electrical conductivityand also Sb dop<strong>in</strong>g <strong>in</strong>creased carrier<br />

concentrarion(n), decreased sheet resistance(Rs) and resistivity(ρ).<br />

Among transparent and conduct<strong>in</strong>g oxides (TCOs), t<strong>in</strong><br />

oxide (TO) is widely used <strong>in</strong> solar cells, display devices,<br />

hybrid microelectronics, stable resistors, touch-sensitive<br />

switches digital displays [1], electro-chromic displays and gas<br />

sensors [2] etc. due to theirs low electrical resistivity, high<br />

optical transmittance <strong>in</strong> visible region, high optical reflectance<br />

<strong>in</strong> <strong>in</strong>frared region, chemically <strong>in</strong>ert and mechanically hard [3].<br />

Many researchers focused on dop<strong>in</strong>g TO, because electrical,<br />

structural and optical properties of TO can be changed by<br />

dop<strong>in</strong>g with F or Sb [1-8].<br />

In this study, pure and 2 wt.% Sb doped SnO 2 th<strong>in</strong> films<br />

onto glass substrates at 420 ο C were deposited by spray<br />

pyrolysis technique. The spray pyrolysis technique is an<br />

attractive method to obta<strong>in</strong> th<strong>in</strong> films because of its simple and<br />

<strong>in</strong>expensive experimental arrangement [9], ease of add<strong>in</strong>g<br />

dop<strong>in</strong>g materials, reproducibility [3], high growth rate and<br />

mass production capability for uniform large area coat<strong>in</strong>gs [7].<br />

We <strong>in</strong>vestigated structural, morphological and electrical<br />

properties of pure and Sb doped SnO 2 th<strong>in</strong> films.<br />

The structural characterization of the films was carried out<br />

by X-ray diffraction (XRD) measurements us<strong>in</strong>g a Rigaku<br />

D/Max-IIIC diffractometer (λ=1.5418Å for CuKα radiation) at<br />

30 kV, 10 mA. Surface morphology was exam<strong>in</strong>ed by atomic<br />

force microscopy (AFM, which was produced by<br />

Nanomagnetics- Instrument). The electrical measurements<br />

were carried out by Hall measurements <strong>in</strong> van der Pauw<br />

configuration.<br />

(a)<br />

(b)<br />

Fig. 2. AFM images of (a) pure t<strong>in</strong> oxide (SnO 2 ) and (b) 2wt.% Sb<br />

doped t<strong>in</strong> oxide (SnO 2 :Sb)<br />

The AFM study reveals nanostructural growth of the film.<br />

AFM analysis showed that, Sb dop<strong>in</strong>g decreased RMS value<br />

for TO, thus Sb dop<strong>in</strong>g improved the film morphologies.<br />

The negative sign of Hall coefficient confirmed that the<br />

films are n-type. As seen from Table 1, Sb dop<strong>in</strong>g decreased<br />

sheet resistance (Rs), resistivity(ρ) and <strong>in</strong>creased carrier<br />

concentration(n) and Hall mobility(μ).<br />

Table 1. Electrical properties of SnO 2 and 2wt.% Sb doped<br />

t<strong>in</strong> oxide ( SnO 2 :Sb)<br />

Sample Rs<br />

(Ωcm -2 )<br />

ρ<br />

(x10 -4 Ωcm)<br />

n<br />

(x10 18 cm -3 )<br />

μ<br />

(cm 2 /V s)<br />

SnO 2 728,3 64,1 0,215 452<br />

SnO 2 :Sb 114,9 6,4 1,7 560<br />

In summary, undoped and Sb doped SnO 2 th<strong>in</strong> films have<br />

successfully been via a simple and cost-effective spray<br />

pyrolysis technique. Structural analyses showed that the Sb<br />

dop<strong>in</strong>g <strong>in</strong>creased crystall<strong>in</strong>ity and improved surface<br />

morphology. Electrical studies revealed that Sb dop<strong>in</strong>g<br />

decreased resistivity of t<strong>in</strong> oxide film and <strong>in</strong>creased carrier<br />

concentration.<br />

Fig. 1. XRD patterns of SnO 2 (TO) and SnO 2 :Sb (ATO)<br />

XRD images showed that the films are polycrystall<strong>in</strong>e and<br />

are prefentially oriented along (110) direction. Other peaks<br />

observed are (101), (200) and (211). Further, the crystall<strong>in</strong>ity<br />

was seen to be <strong>in</strong>creas<strong>in</strong>g, s<strong>in</strong>ce peak <strong>in</strong>tensities <strong>in</strong>creased as<br />

Sb dop<strong>in</strong>g.<br />

*Correspond<strong>in</strong>g author: guventurgut@atauni.edu.tr<br />

[1] K. Ravichandran, et al. Journal of Ovonic Research. 5, 93-69 (2009).<br />

[2] E. Elangovan et al. Journal of Crystal Growth. 276, 215-221 (2005).<br />

[3] B. Thangaraju, Th<strong>in</strong> Solid Films. 402, 71-78 (2002).<br />

[4] S. Lee, B. Park, Th<strong>in</strong> Solid Films. 510, 154-158 (2006).<br />

[5] K. Ravichandran, P. Philom<strong>in</strong>ethan, Materials Letters. 62, 2980-2983<br />

(2008).<br />

[6] E. Elangovan, K. Ramamurthi, Applied Surface Science. 249, 183-196<br />

(2005).<br />

[7] K. Ravichandran, G. Muruganantham, Physica B. 404, 4299-4302 (2009).<br />

[8] E. Elangovan, K. Ramamurthi, Cryst. Res. Technol. 38, 779-784 (2003).<br />

[9] R.R. Kasar et al. Physica B. 403, 3724-3729 (2008).<br />

6th Nanoscience and Nanotechnology Conference, zmir, 2010 370

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