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Photonic crystals in biology

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Poster Session, Tuesday, June 15<br />

Theme A1 - B702<br />

Influence of Sp<strong>in</strong> Speed on the Structural and Morpholog ical Properties of Sol Gel Derived<br />

Nanocrystall<strong>in</strong>e Structure ZnO Films<br />

Seval Aksoy 1 *, Yasem<strong>in</strong> Caglar 1 , Saliha Ilican 1 , Mujdat Caglar 1<br />

1<br />

Department of Physics, Anadolu University, Eskisehir 26470, Turkey<br />

Abstract-The nanocrystall<strong>in</strong>e structure ZnO films were deposited onto p-Si substrates by the sol gel method us<strong>in</strong>g sp<strong>in</strong> coat<strong>in</strong>g technique. The<br />

effect of sp<strong>in</strong> speed on the structural and morphological properties of the ZnO films was <strong>in</strong>vestigated. X-ray diffraction showed that the films<br />

were polycrystall<strong>in</strong>e and had a wurtzite structure. The crystallites are preferentially oriented with (0 0 2) planes parallel to the substrate surface.<br />

The nanostructured z<strong>in</strong>c oxide (ZnO) exhibits a variety of<br />

properties such as: semiconduct<strong>in</strong>g (II–VI), photoconduct<strong>in</strong>g,<br />

piezoelectricity, acousto-optical, transparency <strong>in</strong> the visible<strong>in</strong>frared<br />

region, and opto-electrical properties. So,<br />

nanostructure ZnO has been study<strong>in</strong>g by many research<br />

groups [1-6].<br />

In this study, Z<strong>in</strong>c acetate dihydrate (ZnAc), 2-<br />

methoxyethanol and monoethanolam<strong>in</strong>e (MEA) were used as<br />

a start<strong>in</strong>g material, solvent and stabilizer, respectively. The<br />

mo lar ratios of ZnAc to MEA were ma<strong>in</strong>ta<strong>in</strong>ed at 1:1. The sol<br />

was stirred at 60 o C 2 h to yield a clear and homogeneous<br />

solution. The sp<strong>in</strong> speed was ma<strong>in</strong>ta<strong>in</strong>ed at 1000 (S1), 3000<br />

(S3), 4000 (S4), 5000 (S5) rpm for 30 s. After each coat<strong>in</strong>g,<br />

the coated film was dried at 300°C for 10 m<strong>in</strong>. The coat<strong>in</strong>g–<br />

dry<strong>in</strong>g cycles were repeated ten times. The films were f<strong>in</strong>ally<br />

annealed at 500 °C for 1 h.<br />

The crystall<strong>in</strong>e structure of the films was <strong>in</strong>vestigated by the<br />

X-ray diffraction (XRD) method with a diffracto meter us<strong>in</strong>g<br />

CuK radiation (=1.5406Å). The deposited films at high sp<strong>in</strong><br />

speed were uniform, smooth and have a good adherence to the<br />

substrates. Figure 1 shows XRD pattern of the nanostructure<br />

ZnO films. It is observed that the film deposited at 4000rpm<br />

(S4 film) has the best crystall<strong>in</strong>e structure. Texture coefficient<br />

(TC), crystall<strong>in</strong>e size and lattice constants of the films were<br />

also calculated.<br />

Surface morphology of the S4 film has been <strong>in</strong>vestigated by<br />

field emission scann<strong>in</strong>g electron microscopy (FESEM). Figure<br />

1 shows FESEM image of the nanocrystall<strong>in</strong>e structure ZnO<br />

films. It was observed that the surface morphology of the S4<br />

film is almost uniform nanoparticle size distribution. The film<br />

exhibits a nanostructure and the spherical crystall<strong>in</strong>e part icle<br />

size is approximately 50 nm.<br />

Figure 2. FESEM image of the S4 film.<br />

This work was supported by Anadolu University<br />

Commission of Scientific Research Projects under Grant No:<br />

061039 and 081029.<br />

*Correspond<strong>in</strong>g author: 2Tsevala@anadolu.edu.tr<br />

Figure 1. XRD patterns of the nanocrystall<strong>in</strong>e structure ZnO films<br />

( :p-Si substrate).<br />

[1] http://www.semiconductorslab.com<br />

[2] http://www.webjam.com/dfxue<br />

[3] http://www.nanoscience.gatech.edu/zlwang/<strong>in</strong>dex.htm<br />

[4] http://www.science24.com/paper/3870<br />

[5]Wang ZG, Wang MQ, L<strong>in</strong> ZH, Xue YH, Huang G, Yao X, 2009.<br />

Growth and <strong>in</strong>terconversion of ZnO nanostructure films on different<br />

substrates, Appl Surf Sci, 255:4705-4710.<br />

[6]Takai O., Futsuhara M., Shimizu G., Lungu C.P., Nozue J., 1998.<br />

Nanostructure of ZnO th<strong>in</strong> films prepared by reactive rf magnetron<br />

Sputter<strong>in</strong>g, Th<strong>in</strong> Solid Films, 318:117–119.<br />

6th Nanoscience and Nanotechnology Conference, zmir, 2010 405

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