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290 Appendix D. Site Reports—Japan Site: Tohoku University Institute for Materials Research (IMR) Katahira 2-1-1, Aoba-ku Sendai 980-77, Japan Tel: (81) 022-215 2000; Fax: (81) 022-215 2002 Date Visited: 21 July 1997 WTEC: Hosts: E. Hu, C. Koch, and D. Cox (report authors), L. Jelinski, M. Roco, R.W. Siegel, D. Shaw, C. Uyehara Prof. Kenji Suzuki, Director, Institute for Materials Research; E-mail: suzuki@snap8.imr.tohoku.ac.jp Prof. Masayoshi Esashi, Department of Mechatronics & Precision Engineering Prof. A. Inoue, Head, Nonequilibrium Materials Laboratory Prof. H. Fujimori Prof. Kenji Sumiyama Dr. Changwu Hu Dr. Elisabeth Kurtz Dr. Darren Bagnall BACKGROUND (Carl Koch) Most of the WTEC team’s visit to Tohoku University was focused on the Institute for Materials Research (IMR) which is directed by Professor Kenji Suzuki. IMR’s historical roots go back to 1916; at first it was devoted to research on iron and steel. However, under the leadership of Professor Matsumoto it became a leading research laboratory in the 1970s and 1980s in the area of nonequilibrium processing techniques for producing metastable materials, in particular metallic glasses, an area in which it was a world leader. At present IMR is a large modern materials research center containing 26 research laboratories in which approximately 160 scientists, 120 technicians, 190 graduate students, and 70 visiting scientists carry out a variety of research projects. The major part of the financial support for the IMR is provided by the Ministry of Education, Science, Sports, and Culture (Monbusho). The specific groups in the IMR concerned with nanoparticles/ nanostructured materials that the panel visited are those of Professors K. Suzuki and K. Sumiyama (metallic nanocluster assemblies), Professor Kasuya (semiconductor nanocluster assemblies), Professor H. Fujimori (magnetic nanostructured materials), Professor A. Inoue (nanostructured
Appendix D. Site Reports—Japan 291 bulk materials), and Professor T. Yao (semiconductor nanodevices). Brief descriptions of these research efforts are given below. In addition to visiting IMR, the WTEC team visited the Tohoku University laboratory of Professor Esashi in the Department of Machine Intelligence and Systems Engineering. Professor Esashi’s research on micro/nano machines is also described. RESEARCH AND DEVELOPMENT HIGHLIGHTS Prof. M. Esashi (Lynn Jelinski) Microsystems by Silicon Machining: This program at Tohoku University, under the direction of Prof. M. Esashi, is located on the “mountain” campus of Tohoku, about a 15-minute drive from the main campus. The program has five components and is staffed by 35 professionals. The components are: • active catheter and piezoelectric films • inertia measurement systems • microactuators and thermal and fluidic micro systems • ultrasensitive sensors and nanostructures • semiconductor research institute The professionals comprised postdoctoral fellows from a number of countries, resident staff, and employees of a number of companies, including Samsung, Ford, Hitachi, Asahi Optical, and Honda. Prof. Esashi has been working in the area of microelectromechanical systems (MEMS) devices for the past 25 years and over that time built up a fairly sophisticated, albeit homemade, facility for producing MEMS devices and another facility for characterizing them. A number of biomedical devices have been produced over the years, including blood gas sensors, a 1 mm diameter, navigable catheter based on shape-memory alloy material, produced with an STM tip, using a heated silicon substrate. In the past several years there have been major capital investments into the program, resulting in the building and equipping of a microfabrication facility and a separate nanofabrication facility. The microfabrication facility, also called a Venture Business Laboratory, was constructed and outfitted with government money. Companies are encouraged to make use of the facilities. The names of 27 companies, most of them large and well known, were displayed in the entryway. The microfabrication facility consisted of a 0.5 micron CMOS line for 2-inch wafers, and housed an impressive array of modern equipment, including He-Cd and Ar lasers for laser fabrication, and laser-induced CVD.
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National Science and Technology Cou
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WTEC Panel on NANOSTRUCTURE SCIENCE
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ABSTRACT This report reviews the st
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Foreword Timely information on scie
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Foreword iii collaboration and thus
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Contents Foreword Table of Contents
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List of Figures 1.1 Organization of
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List of Figures ix 5.12 Granular GM
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List of Tables ES.1 Technological I
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Executive Summary Richard W. Siegel
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Executive Summary xix past decade,
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Executive Summary xxi TABLE ES.2. C
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Executive Summary xxiii blocks, and
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Chapter 1 Introduction and Overview
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1. Introduction and Overview 3 •
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1. Introduction and Overview 5 worl
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1. Introduction and Overview 7 grow
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1. Introduction and Overview 9 lead
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1. Introduction and Overview 11 2.
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1. Introduction and Overview 13 It
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Chapter 2 Synthesis and Assembly Ev
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2. Synthesis and Assembly 17 transi
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2. Synthesis and Assembly 19 probe
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2. Synthesis and Assembly 21 by adj
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2. Synthesis and Assembly 23 blocks
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2. Synthesis and Assembly 25 Self-A
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2. Synthesis and Assembly 27 Figure
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2. Synthesis and Assembly 29 us to
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2. Synthesis and Assembly 31 Brotzm
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2. Synthesis and Assembly 33 Siegel
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Chapter 3 Dispersions and Coatings
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3. Dispersions and Coatings 37 exis
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3. Dispersions and Coatings 39 more
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3. Dispersions and Coatings 41 into
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3. Dispersions and Coatings 43 of N
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3. Dispersions and Coatings 45 oppo
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3. Dispersions and Coatings 47 Kanz
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Chapter 4 High Surface Area Materia
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4. High Surface Area Materials 51 w
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4. High Surface Area Materials 53 F
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4. High Surface Area Materials 55 T
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4. High Surface Area Materials 57 s
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4. High Surface Area Materials 59 T
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4. High Surface Area Materials 61 F
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4. High Surface Area Materials 63 m
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4. High Surface Area Materials 65 I
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Chapter 5 Functional Nanoscale Devi
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5. Functional Nanoscale Devices 69
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Chapter 6 Bulk Behavior of Nanostru
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6. Bulk Behavior of Nanostructured
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Chapter 7 Biologically Related Aspe
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Chapter 8 Research Programs on Nano
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8. Research Programs on Nanotechnol
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APPENDICES Appendix A. Biographies
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Appendix A. Biographies of Panelist
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Appendix B. Site Reports—Europe S
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Appendix B. Site Reports—Europe 1
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Page 353 and 354: Appendix F. Glossary 2DEG A/D AAAR
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Page 357 and 358: Appendix F. Glossary 331 MA MBE mCP
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Page 361 and 362: Appendix F. Glossary 335 WTEC XAS X
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