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BSIM3v3.2.2 MOSFET Model - The University of Texas at Dallas

BSIM3v3.2.2 MOSFET Model - The University of Texas at Dallas

BSIM3v3.2.2 MOSFET Model - The University of Texas at Dallas

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Non-Uniform Doping and Small Channel Effects on Threshold Voltage2.1.3 Short Channel Effect<strong>The</strong> threshold voltage <strong>of</strong> a long channel device is independent <strong>of</strong> the channellength and the drain voltage. Its dependence on the body bias is given byEq. (2.1.4). However, as the channel length becomes shorter, the thresholdvoltage shows a gre<strong>at</strong>er dependence on the channel length and the drainvoltage. <strong>The</strong> dependence <strong>of</strong> the threshold voltage on the body bias becomesweaker as channel length becomes shorter, because the body bias has lesscontrol <strong>of</strong> the depletion region. <strong>The</strong> short-channel effect is included in theV th model as:Vth= Vth0⎛+ K ⎜1⎜⎝+ K11+( Φ −V− Φ )NlxLeffs⎞−1⎟⎟⎠bsΦss− ∆V− K Vth2bs(2.1.12)where ∆V th is the threshold voltage reduction due to the short channeleffect. Many models have been developed to calcul<strong>at</strong>e ∆V th . <strong>The</strong>y usedeither numerical solutions [4], a two-dimensional charge sharing approach[5,6], or a simplified Poisson's equ<strong>at</strong>ion in the depletion region [7-9]. Asimple, accur<strong>at</strong>e, and physical model was developed by Z. H. Liu et al.[10]. This model was derived by solving the quasi 2D Poisson equ<strong>at</strong>ionalong the channel. This quasi-2D model concluded th<strong>at</strong>:thth( L) ( ( V − Φ ) V )∆V = θ 2 +bisds(2.1.13)where V bi is the built-in voltage <strong>of</strong> the PN junction between the source andthe substr<strong>at</strong>e and is given by<strong>BSIM3v3.2.2</strong> Manual Copyright © 1999 UC Berkeley 2-7

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