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BSIM3v3.2.2 MOSFET Model - The University of Texas at Dallas

BSIM3v3.2.2 MOSFET Model - The University of Texas at Dallas

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Strong Inversion Current and Output Resistance (S<strong>at</strong>ur<strong>at</strong>ion Regime)2.6.2 Drain-Induced Barrier Lowering (DIBL)As discussed above, threshold voltage can be approxim<strong>at</strong>ed as a linearfunction <strong>of</strong> the drain voltage. According to Eq. (2.6.3), the Early voltagedue to the DIBL effect can be calcul<strong>at</strong>ed as:(2.6.7)VADIBLCVADIBLC( Vgsteff+ 2vt)=θ t1+P V∂ Ids∂ Vth−= Ids<strong>at</strong>( ) = 1 ( V − (11 +∂ V ∂Vθ () A V Vrou ( DIBLCB bseff )thds th L gst⎛ AbulkVds<strong>at</strong>⎞⎜1−⎟⎝ AbulkVds<strong>at</strong> + Vgsteff + 2vt⎠bulkds<strong>at</strong>During the deriv<strong>at</strong>ion <strong>of</strong> Eq. (2.6.7), the parasitic resistance is assumed tobe equal to 0. As expected, V ADIBLC is a strong function <strong>of</strong> L as shown in Eq.(2.6.7). As channel length decreases, V ADIBLC decreases very quickly. <strong>The</strong>combin<strong>at</strong>ion <strong>of</strong> the CLM and DIBL effects determines the output resistancein the third region, as was shown in Figure 2-6.Despite the formul<strong>at</strong>ion <strong>of</strong> these two effects, accur<strong>at</strong>e modeling <strong>of</strong> theoutput resistance in the s<strong>at</strong>ur<strong>at</strong>ion region requires th<strong>at</strong> the coefficientθ th (L) be replaced by θ rout (L). Both θ th (L) and θ rout (L) have the samechannel length dependencies but different coefficients. <strong>The</strong> expression forθ rout (L) is(2.6.8)( L) = P [exp( − D L / 2l ) + 2exp(− D L / l )] + Pθ rout diblc 1 rout t rout t diblc 2Parameters P diblc1 , P diblc2 , P diblcb and D rout are introduced to correct forDIBL effect in the strong inversion region. <strong>The</strong> reason why D vt0 is not2-26 <strong>BSIM3v3.2.2</strong> Manual Copyright © 1999 UC Berkeley

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