12.07.2015 Views

HVAC Control in the New Millennium.pdf - HVAC.Amickracing

HVAC Control in the New Millennium.pdf - HVAC.Amickracing

HVAC Control in the New Millennium.pdf - HVAC.Amickracing

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

PC-based <strong>Control</strong>, Software and Bus Trendswould be able to handle 100 billion operations per second.In <strong>the</strong> future, doubl<strong>in</strong>g <strong>the</strong> transistor count may require more than18 months, due to major changes <strong>in</strong> chip design or fabrication technology.Chip logic is becom<strong>in</strong>g more complex and requires longer designand validation times.Fabrication TechnologyFabrication technology must improve with each process generation,such as <strong>the</strong> change from 0.25-microns to 0.18. A critical part of <strong>the</strong>process is photolithography, where short-wavelength light sources arefocused with precision lenses through <strong>the</strong> transparent masks conta<strong>in</strong><strong>in</strong>g<strong>the</strong> circuit details. This exposes <strong>the</strong> photoresist on a wafer’s surface,which is chemically removed leav<strong>in</strong>g <strong>the</strong> details of <strong>the</strong> circuit pattern on<strong>the</strong> wafer.Light sources and optics must evolve toge<strong>the</strong>r. Intel’s 0.18-micronPentium III chips use <strong>the</strong> same 248-mm wavelength deep-UV lightsource as 0.25-micron Pentium II and Pentium III chips. The move to a0.13-micron process should be coupled with 193-nm wavelength lightfrom excimer laser sources.Beyond 0.13-microns would be a 0.09-micron process, whichwould use 157-nm wavelength excimer lasers. The next step below 0.09is major <strong>in</strong> terms of technology and manufactur<strong>in</strong>g processes. Thiswould be <strong>the</strong> 0.07-micron process for <strong>the</strong> 2011 processor.The level of photolithography will probably require extreme-UV(EUV) light sources. EUV has a wavelength of 13nm, which has <strong>the</strong>potential for etch<strong>in</strong>g much smaller transistors. The problem is that <strong>the</strong>reare no known transparent mask materials that will allow <strong>the</strong>se shortwavelengths to pass through. <strong>New</strong> reflective lithography processes andoptics would need to be implemented.As <strong>the</strong> number of transistors <strong>in</strong>creases on a chip, transistor <strong>in</strong>terconnectwires become smaller and closer toge<strong>the</strong>r. This <strong>in</strong>creases conductorresistance and capacitance which adds to any signal delays.To reduce resistance and shr<strong>in</strong>k <strong>the</strong> <strong>in</strong>terconnect l<strong>in</strong>e widths, coppercan be used to replace alum<strong>in</strong>um as <strong>the</strong> <strong>in</strong>terconnect<strong>in</strong>g metal. Copperis be<strong>in</strong>g used <strong>in</strong> IBM’s Power G3 chips and AMD’s newer ships. In<strong>the</strong> future Intel CPUs <strong>in</strong> <strong>the</strong> 0.13-micron class should use copper <strong>in</strong>terconnects.©2001 by The Fairmont Press, Inc. All rights reserved.

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!