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NASA Scientific and Technical Aerospace Reports

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20040112016 <strong>NASA</strong> Glenn Research Center, Clevel<strong>and</strong>, OH, USA<br />

Excitation of Coupled Slotline Mode in Finite Ground CPW with Unequal Ground Plane Widths<br />

Ponchak, George E.; Papapolymerou, John; Tentzeris, Manos M.; [2004]; 5 pp.; In English; Copyright; Avail: CASI; A01,<br />

Hardcopy<br />

The coupling between the desired CPW mode <strong>and</strong> the unwanted coupled slotline mode is presented for finite ground<br />

coplanar waveguides with unequal ground plane widths. Measurements, quasi-static conformal mapping, <strong>and</strong> Finite-<br />

Difference Time-Domain analysis are performed to determine the dependence of the slotline mode excitation on the physical<br />

dimensions of the FGC line <strong>and</strong> on the frequency range of operation. It is shown that the ratio of the slotline mode to the CPW<br />

mode can be as high as 18 dB. The use of airbridges is shown to reduce the slotline mode by 15 dB, but that the slotline mode<br />

fully reestablishes itself after 2000 microns. Furthermore, these results are independent of frequency.<br />

Author<br />

Waveguides; Coupled Modes; Planar Structures; Frequency Ranges<br />

20040112058 <strong>NASA</strong> Glenn Research Center, Clevel<strong>and</strong>, OH, USA<br />

High Mobility SiGe/Si n-MODFET Structures <strong>and</strong> Devices on Sapphire Substrates<br />

Mueller, Carl; Alterovitz, Samuel; Croke, Edward; Ponchak, George; [2004]; 6 pp.; In English; Materials Research Society<br />

Spring 2004 Conference, 10-14 Apr. 2004, San Francisco, CA, USA<br />

Contract(s)/Grant(s): 22-090-20-C1; Copyright; Avail: CASI; A02, Hardcopy<br />

Si/Ge/Si n-type modulation doped field effect structures <strong>and</strong> transistors (n-MODFET’s) have been fabricated on r-plane<br />

sapphire substrates. Mobilities as high as 1380 cm(exp 2)/Vs were measured at room temperature. Excellent carrier<br />

confinement was shown by Shubnikov-de Haas measurements. Atomic force microscopy indicated smooth surfaces, with rm’s<br />

roughness less than 4 nm, similar to the quality of SiGe/Si n-MODFET structures made on Si substrates. Transistors with 2<br />

micron gate lengths <strong>and</strong> 200 micron gate widths were fabricated <strong>and</strong> tested.<br />

Derived from text<br />

Doped Crystals; Modfets; Sapphire; Substrates; Sos (Semiconductors)<br />

20040120860 <strong>NASA</strong> Glenn Research Center, Clevel<strong>and</strong>, OH, USA<br />

LiCoO2 <strong>and</strong> SnO2 Thin Film Electrodes for Lithium-Ion Battery Applications<br />

Maranchi, Jeffrey P.; Hepp, Aloysius F.; Kumta, Prashant N.; [2004]; 28 pp.; In English<br />

Contract(s)/Grant(s): WBS 319-20-A1; Copyright; Avail: CASI; A03, Hardcopy<br />

There is an increasing need for small dimension, ultra-lightweight, portable power supplies due to the miniaturization of<br />

consumer electronic devices. Rechargeable thin film lithium-ion batteries have the potential to fulfill the growing dem<strong>and</strong>s for<br />

micro-energy storage devices. However, rechargeable battery technology <strong>and</strong> fabrication processes have not kept paced with<br />

the advances made in device technology. Economical fabrication methods lending excellent microstructural <strong>and</strong> compositional<br />

control in the thin film battery electrodes have yet to be fully developed. In this study, spin coating has been used to<br />

demonstrate the flexibility of the approach to produce both anode (SnO2) <strong>and</strong> cathode (LiCoO2) thin films. Results on the<br />

microstructure crystal structure <strong>and</strong> electrochemical properties of the thin film electrodes are described <strong>and</strong> discussed.<br />

Author<br />

Electric Batteries; Thin Films; Microstructure<br />

20040120879 <strong>NASA</strong> Langley Research Center, Hampton, VA, USA<br />

A New Electromagnetic Instrument for Thickness Gauging of Conductive Materials<br />

Fulton, J. P.; Wincheski, B.; Nath, S.; Reilly, J.; Namkung, M.; [1994]; 8 pp.; In English; Original contains color illustrations;<br />

No Copyright; Avail: CASI; A02, Hardcopy<br />

Eddy current techniques are widely used to measure the thickness of electrically conducting materials. The approach,<br />

however, requires an extensive set of calibration st<strong>and</strong>ards <strong>and</strong> can be quite time consuming to set up <strong>and</strong> perform. Recently,<br />

an electromagnetic sensor was developed which eliminates the need for impedance measurements. The ability to monitor the<br />

magnitude of a voltage output independent of the phase enables the use of extremely simple instrumentation. Using this new<br />

sensor a portable h<strong>and</strong>-held instrument was developed. The device makes single point measurements of the thickness of<br />

nonferromagnetic conductive materials. The technique utilized by this instrument requires calibration with two samples of<br />

known thicknesses that are representative of the upper <strong>and</strong> lower thickness values to be measured. The accuracy of the<br />

instrument depends upon the calibration range, with a larger range giving a larger error. The measured thicknesses are typically<br />

within 2-3% of the calibration range (the difference between the thin <strong>and</strong> thick sample) of their actual values. In this paper<br />

104

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