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NASA Scientific and Technical Aerospace Reports

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Ionospheric plasma interaction effects on the International Space Station are discussed in the following paper. The large<br />

structure <strong>and</strong> high voltage arrays of the ISS represent a complex system interacting with LEO plasma. Discharge current<br />

measurements made by the Plasma Contactor Units <strong>and</strong> potential measurements made by the Floating Potential Probe<br />

delineate charging <strong>and</strong> magnetic induction effects on the ISS. Based on theoretical <strong>and</strong> physical underst<strong>and</strong>ing of the<br />

interaction phenomena, a model of ISS plasma interaction has been developed. The model includes magnetic induction effects,<br />

interaction of the high voltage solar arrays with ionospheric plasma, <strong>and</strong> accounts for other conductive areas on the ISS. Based<br />

on these phenomena, the Plasma Interaction Model has been developed. Limited verification of the model has been performed<br />

by comparison of Floating Potential Probe measurement data to simulations. The ISS plasma interaction model will be further<br />

tested <strong>and</strong> verified as measurements from the Floating Potential Measurement Unit become available, <strong>and</strong> construction of the<br />

ISS continues.<br />

Author<br />

International Space Station; Plasma Potentials; Measure <strong>and</strong> Integration; Ionospheres; Mathematical Models<br />

20040111049 <strong>NASA</strong> Marshall Space Flight Center, Huntsville, AL, USA<br />

Ground-Based Simulation of Low-Earth Orbit Plasma Conditions: Plasma Generation <strong>and</strong> Characterization<br />

Williams, John D.; Farnell, Casey C.; Shoemaker, Paul B.; Vaughn, Jason A.; Schneider, Todd A.; 8th Spacecraft Charging<br />

Technology Conference; March 2004; 14 pp.; In English; See also 20040111031; No Copyright; Avail: CASI; A03, Hardcopy<br />

A 16-cm diameter plasma source operated on argon is described that is capable of producing a plasma environment that<br />

closely simulates the low Earth orbit (LEO) conditions experienced by satellites in the altitude range between 300 to 500 km.<br />

The plasma source uses a transverse-field magnetic filter, <strong>and</strong> has been successful in producing low electron temperature<br />

plasmas that contain streaming ion populations. Both of these characteristics are important because the plasma in LEO is<br />

relatively cold (e.g., Te approx. 0.1 eV) <strong>and</strong> the ram energy of the ions due to the motion of the satellite relative to the LEO<br />

plasma is high (e.g., 7,800 m/s which corresponds to approx. 5 eV for O+ ions). Plasma source operational conditions of flow<br />

rate <strong>and</strong> discharge power are presented that allow the electron temperature to be adjusted over a range from 0.14 to 0.4 eV.<br />

The exp<strong>and</strong>ing plasma flow field downstream of the source contains both low-energy, charge-exchange ions <strong>and</strong> streaming<br />

ions with energies that are adjustable over a range from 4 eV to 6 eV. At low flow rates <strong>and</strong> low facility pressures, the<br />

streaming ion component of the ion population comprises over 90% of the total plasma density. In the work described herein,<br />

a large area retarding potential analyzer was used to measure both electron <strong>and</strong> ion energy distribution functions in the low<br />

density, exp<strong>and</strong>ing plasma produced downstream of the plasma source. The benefits of using this type of plasma diagnostic<br />

tool in easily perturbed, low-density plasma are identified, <strong>and</strong> techniques are also discussed that can be used to perform<br />

real-time measurements of electron temperature. Finally, recommendations are made that may enable lower electron<br />

temperatures to be produced while simultaneously decreasing the plasma source flow rate below 1 to 2 sccm.<br />

Author<br />

Low Earth Orbits; Plasma Generators; Plasmas (Physics); Simulation; Cold Plasmas; Argon Plasma; Magnetohydrodynamic<br />

Flow; Flow Distribution<br />

20040111064 Kyoto Univ., Japan<br />

Particle-In-Cell Simulations on Antenna Characteristics in Magnetized Plasma<br />

Usui, Hideyuki; Nakamura, N.; Kojima, H.; Matsumoto, H.; Omura, Y.; 8th Spacecraft Charging Technology Conference;<br />

March 2004; 6 pp.; In English; See also 20040111031<br />

Contract(s)/Grant(s): SR-12440131; No Copyright; Avail: CASI; A02, Hardcopy<br />

We for the first time applied electromagnetic PIC (Particle-In-Cell) computer simulations to analyze the antenna<br />

characteristics in magnetized plasma. In a three-dimensional simulation space, we placed a dipole antenna which is a<br />

conducting current line in a magnetized plasma. By providing a Gaussian pulse as an input power to the center of the antenna<br />

<strong>and</strong> observing the current induced at the power feeding point, we obtain the input impedance of the antenna as a function of<br />

frequency. We particularly examined the electron kinetic effects on the antenna impedance such as electron temperature <strong>and</strong><br />

electron evacuated region (ion sheath) formed around the antenna. It is confirmed that the most obvious resonance point is the<br />

local Upper Hybrid Resonance frequency. As the electron temperature increases, the resonance frequency also increases in<br />

accordance with the modification of dispersion relation for the UHR branch. We also examined the antenna impedance<br />

variation by changing the size of the electron evacuated region or ion sheath created around the antenna. We could confirm<br />

that the antenna resonance near the local UHR frequency is sharp for the small sheath while the profiles of the impedance<br />

approach to those of vacuum case as the sheath becomes large. The resonance frequency also decreases because the plasma<br />

density also decreases in the vicinity of the antenna.<br />

Author<br />

Computerized Simulation; Dipole Antennas; Plasma Density<br />

295

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