PCT/2002/1 : PCT Gazette, Weekly Issue No. 1, 2002 - WIPO
PCT/2002/1 : PCT Gazette, Weekly Issue No. 1, 2002 - WIPO
PCT/2002/1 : PCT Gazette, Weekly Issue No. 1, 2002 - WIPO
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01/<strong>2002</strong><br />
3 Jan/jan <strong>2002</strong> <strong>PCT</strong> <strong>Gazette</strong> - Section I - <strong>Gazette</strong> du <strong>PCT</strong> 195<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
(51) 7 C23C 14/06, 28/02<br />
(11) WO 02/00958 (13) A1<br />
(21) <strong>PCT</strong>/JP01/05130<br />
(22) 15 Jun/juin 2001 (15.06.2001)<br />
(25) ja (26) ja<br />
(30) 2000-192077 27 Jun/juin 2000 JP<br />
(27.06.2000)<br />
(43) 3 Jan/jan <strong>2002</strong> (03.01.<strong>2002</strong>)<br />
(54) DECORATIVE ARTICLE HAVING<br />
WHITE FILM AND PRODUCTION<br />
METHOD THEREFOR<br />
ARTICLE DECORATIF COMPORTANT<br />
UNE PELLICULE BLANCHE ET PRO-<br />
CEDE DE PRODUCTION ASSOCIE<br />
(71) CITIZEN WATCH CO., LTD. [JP/JP];<br />
1-12, Tanashicho 6-chome, Nishitokyo-shi,<br />
Tokyo 188-8511 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) NAOI, Koichi [JP/JP]; c/o CITIZEN<br />
WATCH CO., LTD., 1-12, Tanashicho<br />
6-chome, Nishitokyo-shi, Tokyo 188-8511<br />
(JP). TAKAGI, Akiyoshi [JP/JP]; c/o CITI-<br />
ZEN WATCH CO., LTD., 1-12, Tanashicho<br />
6-chome, Nishitokyo-shi, Tokyo 188-8511<br />
(JP). MIYA, Yukio [JP/JP]; c/o CITIZEN<br />
WATCH CO., LTD., 1-12, Tanashicho<br />
6-chome, Nishitokyo-shi, Tokyo 188-8511<br />
(JP). TASE, Fumio [JP/JP]; c/o CITIZEN<br />
WATCH CO., LTD., 1-12, Tanashicho<br />
6-chome, Nishitokyo-shi, Tokyo 188-8511<br />
(JP). HAMANO, Kazumi [JP/JP]; c/o CIT-<br />
IZEN WATCH CO., LTD., 1-12, Tanashicho<br />
6-chome, Nishitokyo-shi, Tokyo 188-8511<br />
(JP).<br />
(74) SUZUKI, Shunichiro; SUZUKI & ASSO-<br />
CIATES, Gotanda Yamazaki Building 6F,<br />
13-6, Nishigotanda 7-chome, Shinagawa-ku,<br />
Tokyo 141-0031 (JP).<br />
(81) CN JP KR MX US.<br />
(84) EP (CH DE FR GB IT NL).<br />
(51) 7 C23C 14/34, C22C 1/04, H01J 7/18<br />
(11) WO 02/00959<br />
(21) <strong>PCT</strong>/IT01/00332<br />
(13) A1<br />
(22) 26 Jun/juin 2001 (26.06.2001)<br />
(25) en (26) en<br />
(30) MI2000A001453 28 Jun/juin 2000<br />
(28.06.2000)<br />
IT<br />
(43) 3 Jan/jan <strong>2002</strong> (03.01.<strong>2002</strong>)<br />
(54) CATHODES FOR CATHODIC DEPO-<br />
SITION OF GETTER ALLOYS AND A<br />
PROCESS FOR THE MANUFACTURE<br />
THEREOF<br />
CATHODES DESTINEES AU DEPOT<br />
CATHODIQUE D’ALLIAGES DE GET-<br />
TER ET PROCEDE DE FABRICATION<br />
DE CES CATHODES<br />
(71) SAES GETTERS S.P.A. [IT/IT]; Viale<br />
Italia, 77, I-<strong>2002</strong>0 Lainate (IT).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) BOFFITO, Claudio [IT/IT]; Via Papa<br />
Giovanni XXIII, 2, I-20017 Rho (IT).<br />
TOIA, Luca [IT/IT]; Via della Fontana,<br />
14/A, I-21040 Carnago (IT). GALLITOG-<br />
NOTTA, Alessandro [IT/IT]; Via Marconi,<br />
52, I-21040 Origgio (IT).<br />
(74) PIZZOLI, Antonio; Società Italiana<br />
Brevetti S.p.A., Via Carducci, 8, I-20123<br />
Milano (IT) et al. / etc.<br />
(81) AE AG AL AM AT AU AZ BA BB BG BR<br />
BY BZ CA CH CN CO CR CU CZ DE DK<br />
DM DZ EC EE ES FI GB GD GE GH GM<br />
HR HU ID IL IN IS JP KE KG KP KR KZ<br />
LC LK LR LS LT LU LV MA MD MG MK<br />
MN MW MX MZ NO NZ PL PT RO RU SD<br />
SE SG SI SK SL TJ TM TR TT TZ UA UG<br />
US UZ VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI<br />
FR GB GR IE IT LU MC NL PT SE TR); OA<br />
(BF BJ CF CG CI CM GA GN GW ML MR<br />
NE SN TD TG).<br />
Published / Publiée :(c)<br />
(51) 7 C23C 14/35<br />
(11) WO 02/00960 (13) A1<br />
(21) <strong>PCT</strong>/JP00/06489<br />
(22) 21 Sep/sep 2000 (21.09.2000)<br />
(25) ja (26) ja<br />
(30) 2000/237712 29 Jun/juin 2000 JP<br />
(29.06.2000)<br />
(43) 3 Jan/jan <strong>2002</strong> (03.01.<strong>2002</strong>)<br />
(54) MAGNETRON SPUTTERING DEVICE<br />
DISPOSITIF DE PULVERISATION MA-<br />
GNETRON<br />
(71) SANYO SINKUU KOUGYOU CO., LTD<br />
[JP/JP]; 8-27, Kusune 1-chome, Higashiosaka-shi,<br />
Osaka 577-0006 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) KITABATAKE, Akihiro [JP/JP]; Sanyo<br />
Sinkuu Kougyou Co., Ltd., 8-27, Kusune<br />
1-chome, Higashiosaka-shi, Osaka 577-0006<br />
(JP). KAWABATA, Keishi [JP/JP]; 2-9,<br />
Kunami 4-chome, Ootake-shi, Hiroshima<br />
736-0651 (JP). TANAKA, Takeshi [JP/JP];<br />
Mezon Morikawa, 7-302, Minamisaiwai<br />
machi 5-chome, Kaitacho, Aki-gun, Hiroshima<br />
736-0032 (JP). KAJIOKA, Syu<br />
[JP/JP]; Hiroshima Seibu Kougyo Gijyutu<br />
Center, 10-1, Agaminami 2-chome, Kure-shi,<br />
Hiroshima 737-0004 (JP). YAMADA, Keiji<br />
[JP/JP]; Sanyo Sinkuu Kougyou Co., Ltd.,<br />
8-27, Kusune 1-chome, Higashiosaka-shi,<br />
Osaka 577-0006 (JP). MIKAMI, Yasuo<br />
[JP/JP]; Sanyo Sinkuu Kougyou Co., Ltd.,<br />
8-27, Kusune 1-chome, Higashiosaka-shi,<br />
Osaka 577-0006 (JP).<br />
(81) JP US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE).<br />
(51) 7 C23C 16/32, 16/40, 14/08, 16/511<br />
(11) WO 02/00961 (13) A1<br />
(21) <strong>PCT</strong>/DE01/02380<br />
(22) 26 Jun/juin 2001 (26.06.2001)<br />
(25) de (26) de<br />
(30) 100 31 280.2 27 Jun/juin 2000<br />
(27.06.2000)<br />
DE<br />
(43) 3 Jan/jan <strong>2002</strong> (03.01.<strong>2002</strong>)<br />
(54) METHOD FOR PRODUCING A<br />
MULTI-FUNCTIONAL, MULTI-PLY<br />
LAYER ON A TRANSPARENT<br />
PLASTIC SUBSTRATE AND A<br />
MULTI-FUNCTIONAL MULTI-PLY<br />
LAYER PRODUCED ACCORDING TO<br />
SAID METHOD<br />
PROCEDE POUR PRODUIRE UN EN-<br />
SEMBLE MULTICOUCHE MULTI-<br />
FONCTIONNEL SUR UN SUBSTRAT<br />
EN MATIERE PLASTIQUE TRANSPA-<br />
RENT, ET ENSEMBLE MULTICOUCHE<br />
MULTIFONCTIONNEL PRODUIT SE-<br />
LON CE PROCEDE<br />
(71) ROTH & RAU OBERFLÄCHENTECH-<br />
NIK GMBH [DE/DE]; Gewerbering 10,<br />
09358 Wüstenbrand (DE).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) DITTRICH, Karl-Heinz [DE/DE]; Reichenhainer<br />
Mühlberg 70, 09125 Chemnitz<br />
(DE). ROTH, Dietmar [DE/DE]; Stollberger<br />
Strasse 5, 09353 Oberlungwitz (DE).<br />
(74) PÄTZELT, Peter; Pätzelt - Seltmann - Hofmann,<br />
Ammonstrasse 72, 01067 Dresden<br />
(DE).<br />
(81) JP US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE TR).<br />
Published / Publiée :(c)<br />
(51) 7 C23C 16/44, 16/52, 14/56, B08B 7/00,<br />
H01L 21/00<br />
(11) WO 02/00962 (13) A1<br />
(21) <strong>PCT</strong>/US01/13333<br />
(22) 25 Apr/avr 2001 (25.04.2001)<br />
(25) en (26) en<br />
(30) 09/605,452 28 Jun/juin 2000 US<br />
(28.06.2000)<br />
(43) 3 Jan/jan <strong>2002</strong> (03.01.<strong>2002</strong>)<br />
(54) SYSTEM AND METHOD FOR IN-SITU<br />
CLEANING OF PROCESS MONITOR<br />
OF SEMI-CONDUCTOR WAFER FAB-<br />
RICATOR<br />
SYSTEME ET PROCEDE DE NET-<br />
TOYAGE IN-SITU D’UN DISPOSITIF<br />
DE SURVEILLANCE DE PROCES-<br />
SUS DANS UNE INSTALLATION DE<br />
TRANSFORMATION DE TRANCHES<br />
DE SEMICONDUCTEUR<br />
(71) MKS INSTRUMENTS, INC. [US/US]; Six<br />
Shattuck Road, Andover, MA 01810 (US).<br />
(72) MAHER, Joseph, Ashurst, Jr.; 3 Virginia<br />
Place, Wenham, MA 01984 (US).<br />
(74) KUSMER, Toby, H. et al. / etc.; McDermott,<br />
Will & Emery, 28 State Street, Boston, MA<br />
02109 (US).<br />
(81) DE GB JP.<br />
Published / Publiée :(c)<br />
(51) 7 C23C 16/48<br />
(11) WO 02/00963 (13) A1<br />
(21) <strong>PCT</strong>/US01/20067<br />
(22) 22 Jun/juin 2001 (22.06.2001)<br />
(25) en (26) en