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Thixoforming : Semi-solid Metal Processing

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254j 8 Tool Technologies for Forming of <strong>Semi</strong>-<strong>solid</strong> <strong>Metal</strong>s<br />

Figure 8.13 Performance of uncoated and coated segments<br />

after 10 produced parts (1.3333): (a) TZM uncoated; (b) coated<br />

with MgAl2O4; (c) coated TiN interlayer and ZrO2 top layer;<br />

(d) location of the SEM images.<br />

offers advantages such as higher chemical and thermal resistance, higher density and<br />

higher hardness. The oxides occur in different metastable crystallographic phases,<br />

with excellent properties, depending on the deposition temperature. Especially the<br />

g-Al2O3 and tetragonal ZrO2 (t-ZrO2) phases offer, compared with other phases, high<br />

strength, toughness and high thermal stability [21, 22]. Also, there is a need to<br />

enhance the stability and support for the interlayer towards higher thermal stability<br />

and more support of the top layer. TiAlN offers, compared with TiN, higher thermal<br />

stability and high hardness by adding aluminium to the cubic TiN [23]. For further<br />

development, the TiAlN enhanced the support for the oxidic top layer.<br />

8.4.1<br />

Deposition Process Development of Crystalline PVD Al2O3<br />

Different PVD technologies are available to generate Al2O3 thin-film coatings. One<br />

technology is the r.f. sputtering of ceramic target materials [19, 24]. However, the low<br />

deposition rate (only 0.12–0.48 mmh 1 in the case of alumina) [19, 24] and the<br />

high expenditure are disadvantages of these processes and restricted industrial

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