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Thixoforming : Semi-solid Metal Processing

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264j 8 Tool Technologies for Forming of <strong>Semi</strong>-<strong>solid</strong> <strong>Metal</strong>s<br />

Table 8.7 Process parameters for the coating deposition.<br />

Process parameters<br />

Etching<br />

phase<br />

Interlayer<br />

TiAlZr<br />

Top coat<br />

t-(ZrO 2)<br />

Heating power (kW) 16 16 16<br />

Process step time (s) 3600 5000 6000<br />

Total pressure (mPa) Flow controlled 500 Pressure controlled<br />

m.f. voltage (250 kHz) (V) 650 —<br />

Bias voltage (V) — 80 (DC) 25–40 (pulsed m.f.)<br />

Nitrogen flow (sccm) — 60 —<br />

Oxygen flow (sccm) — — Varied<br />

Argon flow (sccm) 150 Pressure controlled 250<br />

Target power density (Wcm 2 ) — 13.7 7.95<br />

Anode voltage (V) — 70 —<br />

are strongly dependent on the working point in the hysteresis (Figure 8.20). Different<br />

points were investigated: two deposited coatings with 650 and 600 V cathode voltages<br />

are presented here (Figure 8.20).<br />

The properties of the coated samples from the laboratory coater and the<br />

industrial coating unit are compared in Table 8.8. The two working points show<br />

Figure 8.20 ZrO 2 hysteresis and two deposited coatings.

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