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Thixoforming : Semi-solid Metal Processing

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274j 8 Tool Technologies for Forming of <strong>Semi</strong>-<strong>solid</strong> <strong>Metal</strong>s<br />

Figure 8.29 Deposition rate (0.1 nm s 1 ) and normalized ion flux<br />

as a function of the precursor concentration (AlCl 3 þ O 2) [57].<br />

Figure 8.30 Evolution of the crystallographic structure of alumina<br />

films with increasing normalized ion flux values for films<br />

deposited at 600 C [57].

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