10. Appendix

Chapter 1 689
ing up the glass to allow the ions to react to form the semiconductor nanocrystals.
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Pulsed Laser Deposition
This technique is similar to evaporation except it uses a uv laser producing
high power nanosecond long pulses to ablate a source into a plume. The short
duration of the pulse will not dissociate the semiconductor unlike evaporation
by an oven. Contamination by the crucible is avoided since only the source is
heated. By depositing nanometer metal catalyst particles on the substrate it is
possible to grow an array of nanowires just as the LVS technique.
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