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ATOMIC AND ELECTRONIC STRUCTURE 519<br />

dilution of silane by hydrogen (in plasma deposition) causes a change in the optical band<br />

gap for a-Si:H films over at least the range 1.6 to 1.8 eV [51]; these changes can be<br />

ascribed to changes in the hydrogen microstructure of the films. Even larger changes can<br />

be effected by alloying with additional elements such as Ge, C, O, and N; alloying is<br />

readily accomplished by mixing the silane (SiH 4 ) source gas with gases such as GeH 4 ,<br />

CH 4 ,O 2 or NO 2 ,andNH 3 , respectively. The resulting alloys have very wide ranges of<br />

band gaps, as we illustrate for a-Si 1−x Ge x :H in Figure 12.10. For simplicity, we shall<br />

usually refer to these alloys using the abbreviated notation: a-SiGe for a-Si 1−x Ge x :H, and<br />

so on.<br />

Only some of these materials have proven useful in devices. In particular, a-SiGe<br />

alloys with optical gaps down to about 1.45 eV are employed as absorber layer in multijunction<br />

pin cells; the narrower band gap of a-SiGe compared to a-Si allows for increased<br />

absorption of photons with lower energies [52]. Figure 12.10(a) illustrates how the spectrum<br />

of the absorption coefficient α(hν) changes for a-SiGe alloys with different atomic<br />

percentages x; the different optical band gaps are indicated as labels. Two features of<br />

these data should be noted. First, the Urbach slopes remain constant (at about 50 meV)<br />

over the entire range of band gaps. Second, the plateau in the absorption coefficient at the<br />

lowest photon energies increases steadily as the band gap diminishes, which is indicative<br />

of a corresponding increase in defect density.<br />

Figure 12.10(b) is a contour plot showing how the optical band gap of a-Si 1−x Ge x :H<br />

varies with the Ge-ratio x and with atomic fraction h of hydrogen. The figure reflects<br />

experimental results for a-Si:H alloys of varying H-fraction [51] and for a-SiGe:H alloys<br />

for which both x and h were reported [53]. 5 Note that, for constant fraction h, the band<br />

0.20<br />

Absorption coefficient a<br />

[cm −1 ]<br />

10 4<br />

10 3<br />

10 2<br />

10 1<br />

10 5 1.6 eV<br />

1.25<br />

1.34<br />

1.50<br />

1.72 eV<br />

H-fraction h<br />

0.15<br />

0.10<br />

0.05<br />

1.7 1.4<br />

1.5<br />

10 0<br />

0.8 1.0 1.2 1.4 1.6 1.8 2.0<br />

Photon energy<br />

[eV]<br />

(a)<br />

0.00<br />

0.0 0.1 0.2 0.3 0.4 0.5 0.6<br />

Ge-ratio x<br />

(b)<br />

Figure 12.10 (a) Absorption coefficient spectra for a-SiGe alloys; the optical band gaps and corresponding<br />

Ge fractions x are 1.25 to 0.58, 1.34 to 0.48, 1.50 to 0.30, 1.72 to 0.0 [52]. (b) Typical<br />

optical band gaps for a-Si 1−x Ge x :H alloys for varying Ge-ratio x and atomic fraction h of hydrogen<br />

5 Figure 12.10 is based on the function E G = 1.62 + 1.3h − 0.7x obtained by fitting to experimental results<br />

reported by Hama et al. [51] and Middya et al. [53].

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