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DEPOSITING AMORPHOUS SILICON 527<br />

Bulk layer thickness d b<br />

[nm]<br />

1000<br />

100<br />

10<br />

1<br />

Rough<br />

Amorphous<br />

Microcrystalline<br />

Mixed<br />

phase<br />

0 5<br />

10 15 20 25 30 35 40<br />

H 2 /SiH 4 dilution ratio R<br />

Figure 12.13 Phase diagram for the structure of plasma-deposited silicon thin films for varying<br />

dilution ratios R of silane in hydrogen and film thickness d b ; thin films were deposited onto a<br />

single-crystal Si substrate. For lower dilutions (R

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