PCT/2000/51 - World Intellectual Property Organization
PCT/2000/51 - World Intellectual Property Organization
PCT/2000/51 - World Intellectual Property Organization
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<strong>51</strong>/<strong>2000</strong><br />
19260 <strong>PCT</strong> Gazette - Section I - Gazette du <strong>PCT</strong> 21 Dec/déc <strong>2000</strong><br />
MA MD MG MK MN MW MX NO NZ PL<br />
PT RO RU SD SE SG SI SK SL TJ TM TR<br />
TT TZ UA UG US UZ VN YU ZA ZW.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI FR<br />
GB GR IE IT LU MC NL PT SE); OA (BF BJ<br />
CF CG CI CM GA GN GW ML MR NE SN<br />
TD TG).<br />
Published / Publiée :(c)<br />
(<strong>51</strong>) 7 H01L 21/28, 21/8247, 29/788, 27/115<br />
(11) WO 00/77838<br />
(21) <strong>PCT</strong>/DE00/01898<br />
(13) A1<br />
(22) 9 Jun/juin <strong>2000</strong> (09.06.<strong>2000</strong>)<br />
(25) de (26) de<br />
(30) 199 26 500.3 10 Jun/juin 1999<br />
(10.06.1999)<br />
DE<br />
(43) 21 Dec/déc <strong>2000</strong> (21.12.<strong>2000</strong>)<br />
(54) NON-VOLATILE SEMICONDUCTOR<br />
MEMORY CELL AND METHOD FOR<br />
ITS PRODUCTION<br />
CELLULE MEMOIRE A SEMI-<br />
CONDUCTEUR NON VOLATILE ET<br />
PROCEDE DE FABRICATION ASSO-<br />
CIE<br />
(71) INFINEON TECHNOLOGIES AG<br />
[DE/DE]; St.<br />
München (DE).<br />
Martin-Strasse 53, D-81541<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) LUDWIG, Christoph [DE/DE];<br />
Bergstr. 15, D-01465 Langenbrück (DE).<br />
SCHREMS, Martin [DE/DE]; Bruhmstr. 4<br />
E, D-01465 Langenbrück (DE).<br />
(74) INFINEON TECHNOLOGIES AG;<br />
Zedlitz, Peter, Postfach 22 13 17, D-80503<br />
München (DE).<br />
(81) JP KR US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE).<br />
Published / Publiée :(c)<br />
(<strong>51</strong>) 7 H01L 21/285, 21/3205, B81B 3/00, G01P<br />
15/00, H01L 23/532<br />
(11) WO 00/77839<br />
(21) <strong>PCT</strong>/US00/16260<br />
(13) A1<br />
(22) 14 Jun/juin <strong>2000</strong> (14.06.<strong>2000</strong>)<br />
(25) en (26) en<br />
(30) 60/139,530 16 Jun/juin 1999<br />
(16.06.1999)<br />
US<br />
(30) 09/467,728 20 Dec/déc 1999<br />
(20.12.1999)<br />
US<br />
(43) 21 Dec/déc <strong>2000</strong> (21.12.<strong>2000</strong>)<br />
(54) CONTROLLED-STRESS STABLE MET-<br />
ALLIZATION FOR ELECTRONIC AND<br />
ELECTROMECHANICAL DEVICES<br />
METALLISATION STABLE A<br />
CONTRAINTE CONTROLEE POUR<br />
DISPOSITIFS ELECTRONIQUES ET<br />
ELECTROMECANIQUES<br />
(71) HONEYWELL INTERNATIONAL INC.<br />
[US/US]; 101 Columbia Road, P.O. Box<br />
2245, Morristown, NJ 07962-2245 (US).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) GOLECKI, Ilan [—/US]; 100 Vail Road<br />
#N-5, Parsippany, NJ 07054 (US).<br />
(74) CRISS, Roger, H. et al. / etc.; Honeywell<br />
International Inc. (Law Dept.), 101 Columbia<br />
Road, P.O. Box 2245, Morristown, NJ 07962-<br />
2245 (US).<br />
(81) AL AM AT AU AZ BB BG BR BY CA CH<br />
CN CZ DE DK EE ES FI GB GE HU IL IS JP<br />
KE KG KP KR KZ LK LR LS LT LU LV MD<br />
MG MK MN MW MX NO NZ PL PT RO RU<br />
SD SE SG SI SK TJ TM TR TT UA UG US<br />
UZ VN.<br />
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ<br />
UG ZW); EA (AM AZ BY KG KZ MD RU<br />
TJ TM); EP (AT BE CH CY DE DK ES FI FR<br />
GB GR IE IT LU MC NL PT SE); OA (BF BJ<br />
CF CG CI CM GA GN GW ML MR NE SN<br />
TD TG).<br />
Published / Publiée :(c)<br />
(<strong>51</strong>) 6 H01L 21/3205, 21/768<br />
(11) WO 00/77840<br />
(21) <strong>PCT</strong>/JP99/03178<br />
(13) A1<br />
(22) 15 Jun/juin 1999 (15.06.1999)<br />
(25) ja (26) ja<br />
(43) 21 Dec/déc <strong>2000</strong> (21.12.<strong>2000</strong>)<br />
(54) SEMICONDUCTOR DEVICE AND<br />
METHOD<br />
THEREOF<br />
OF MANUFACTURE<br />
DISPOSITIF A SEMI-CONDUCTEUR<br />
ET SON PROCEDE DE FABRICATION<br />
(71) ASAHI KASEI MICROSYSTEMS CO.,<br />
LTD. [JP/JP]; 24-10, Yoyogi 1-chome,<br />
Shibuya-ku, Tokyo 1<strong>51</strong>-0053 (JP).<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) MOCHIZUKI, Hidenori [JP/JP];<br />
Reiyoso 314,, 2-4770-1, Yamatsuki-cho,<br />
Nobeoka-shi, Miyazaki 882-0037 (JP).<br />
(74) MORI, Tetsuya et al. / etc.; Nichiei Kokusai<br />
Tokkyo Jimusho, Muraki Building, 8th Floor,<br />
7, Kanda-Kajicho 3-chome, Chiyoda-ku,<br />
Tokyo 101-0045 (JP).<br />
(81) DE KR SG US.<br />
(<strong>51</strong>) 7 H01L 21/3213<br />
(11) WO 00/77841<br />
(21) <strong>PCT</strong>/DE00/01896<br />
(13) A1<br />
(22) 9 Jun/juin <strong>2000</strong> (09.06.<strong>2000</strong>)<br />
(25) de (26) de<br />
(30) 199 26 501.1 10 Jun/juin 1999<br />
(10.06.1999)<br />
DE<br />
(43) 21 Dec/déc <strong>2000</strong> (21.12.<strong>2000</strong>)<br />
(54) METHOD FOR PRODUCING A SEMI-<br />
CONDUCTOR<br />
NENT<br />
MEMORY COMPO-<br />
PROCEDE DE PRODUCTION D’UN<br />
COMPOSANT DE STOCKAGE A<br />
SEMI-CONDUCTEUR<br />
(71) INFINEON TECHNOLOGIES AG<br />
[DE/DE]; St.<br />
München (DE).<br />
Martin-Strasse 53, D-81541<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) ENGELHARDT, Manfred [DE/DE];<br />
Edelweissstr. 1a, D-83620 Feldkirchen-Westerham<br />
(DE). WEINRICH, Volker [DE/DE];<br />
Brunecker Str. 2, D-81373 München (DE).<br />
KREUPL, Franz [DE/DE]; Müllerstr.<br />
43, D-80469 München (DE). SCHIELE,<br />
Manuela [DE/DE]; Feldkirchener Str. 10,<br />
D-85625 Glonn (DE).<br />
(74) EPPING - HERMANN & FISCHER; Postfach<br />
12 10 26, 80034 München (DE).<br />
(81) CN JP KR US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE).<br />
Published / Publiée :(c)<br />
(<strong>51</strong>) 7 H01L 21/336, 29/788, 21/8247<br />
(11) WO 00/77842<br />
(21) <strong>PCT</strong>/DE00/01912<br />
(13) A1<br />
(22) 14 Jun/juin <strong>2000</strong> (14.06.<strong>2000</strong>)<br />
(25) de (26) de<br />
(30) 199 27 287.5 15 Jun/juin 1999<br />
(15.06.1999)<br />
DE<br />
(43) 21 Dec/déc <strong>2000</strong> (21.12.<strong>2000</strong>)<br />
(54) METHOD FOR PRODUCING A NON-<br />
VOLATILE SEMICONDUCTOR MEM-<br />
ORY CELL<br />
PROCEDE DE PRODUCTION<br />
D’UNE CELLULE DE MEMOIRE A<br />
SEMI-CONDUCTEURS<br />
TILE<br />
NON VOLA-<br />
(71) INFINEON TECHNOLOGIES AG<br />
[DE/DE]; St.<br />
München (DE).<br />
Martin-Strasse 53, D-81541<br />
(for all designated States except / pour tous<br />
les États désignés sauf US)<br />
(72, 75) HAMMER, Markus [DE/DE]; Frühlingstrasse<br />
3, D-93342 Saal (DE). KLEE,<br />
Veit [DE/DE]; Alfred-Schmidt-Strasse 43,<br />
D-81379 München (DE). TEMPEL, Georg<br />
[KR/DE]; Ahornstrasse 6, D-85604 Zorneding<br />
(DE). JACOB, Michael [DE/DE];<br />
Dollingerstrasse<br />
(DE).<br />
8, D-93049 Regensburg<br />
(74) INFINEON TECHNOLOGIES AG;<br />
Zedlitz, Peter, Postfach 22 13 17, D-80503<br />
München (DE).<br />
(81) JP KR US.<br />
(84) EP (AT BE CH CY DE DK ES FI FR GB GR<br />
IE IT LU MC NL PT SE).<br />
Published / Publiée :(c)<br />
(<strong>51</strong>) 7 H01L 21/60, 23/12<br />
(11) WO 00/77843<br />
(21) <strong>PCT</strong>/JP00/03804<br />
(13) A1<br />
(22) 12 Jun/juin <strong>2000</strong> (12.06.<strong>2000</strong>)<br />
(25) ja (26) ja<br />
(30) 11/166090 11 Jun/juin 1999<br />
(11.06.1999)<br />
JP<br />
(43) 21 Dec/déc <strong>2000</strong> (21.12.<strong>2000</strong>)<br />
(54) SEMICONDUCTOR PACKAGE,<br />
SEMICONDUCTOR DEVICE, ELEC-<br />
TRONIC DEVICE AND PRODUCTION<br />
METHOD<br />
PACKAGE<br />
FOR SEMICONDUCTOR<br />
BOITIER A SEMI-CONDUCTEUR,<br />
DISPOSITIF SEMI-CONDUCTEUR,<br />
DISPOSITIF ELECTRONIQUE ET PRO-<br />
CEDE DE FABRICATION DE BOITIER<br />
A SEMI-CONDUCTEUR<br />
(71) FUJIKURA LTD. [JP/JP]; 1-5-1,<br />
Koto-ku, Tokyo 135-8<strong>51</strong>2 (JP).<br />
Kiba,