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PCT/1998/43 - World Intellectual Property Organization

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<strong>43</strong>/<strong>1998</strong><br />

15018 <strong>PCT</strong> Gazette - Section I - Gazette du <strong>PCT</strong> 29 Oct/oct <strong>1998</strong><br />

(81) AL AM AT AU AZ BA BB BG BR BY CA CH<br />

CN CU CZ DE DK EE ES FI GB GE GH GM GW<br />

HU ID IL IS JP KE KG KP KR KZ LC LK LR<br />

LS LT LU LV MD MG MK MN MW MX NO NZ<br />

PL PT RO RU SD SE SG SI SK SL TJ TM TR<br />

TT UA UG US UZ VN YU ZW; AP (GH GM KE<br />

LS MW SD SZ UG ZW); EA (AM AZ BY KG<br />

KZ MD RU TJ TM); EP (AT BE CH CY DE DK<br />

ES FI FR GB GR IE IT LU MC NL PT SE); OA<br />

(BF BJ CF CG CI CM GA GN ML MR NE SN<br />

TD TG).<br />

(11) WO 98/47973 (13) A1<br />

(21) <strong>PCT</strong>/JP98/00756<br />

(22) 25 Feb/fév <strong>1998</strong> (25.02.<strong>1998</strong>)<br />

(25) ja (26) ja<br />

(31) 9/105541 (32) 23 Apr/avr 1997<br />

(23.04.1997)<br />

(<strong>43</strong>) 29 Oct/oct <strong>1998</strong> (29.10.<strong>1998</strong>)<br />

(33) JP<br />

(51) 6 C09D 11/02, B44C 1/175, B41M 1/40<br />

(54) • LIQUID PRESSURE TRANSFER INK, LI-<br />

QUID PRESSURE TRANSFER FILM, LIQUID<br />

PRESSURE TRANSFER ARTICLE AND LI-<br />

QUID PRESSURE TRANSFER METHOD<br />

•<br />

ENCRE, PELLICULE, ARTICLE ET PRO-<br />

CEDE DE TRANSFERT PAR PRESSION<br />

LIQUIDE<br />

(71) CUBIC CO., LTD. [JP/JP]; 789, Miyakami, Shimizu–shi,<br />

Shizuoka–ken 424–0911 (JP).<br />

(for all designated States except / pour tous les États<br />

désignés sauf US)<br />

(72, 75) OTAKI, Nobuyuki [JP/JP]; 180–6, Imaizumi,<br />

Shimizu–shi, Shizuoka–ken 424–0874 (JP).<br />

YAMAMOTO, Kazuhiro [JP/JP]; 10–1, Tsuzi<br />

2–chome, Shimizu–shi, Shizuoka–ken 424–0806<br />

(JP). SUGIYAMA, Misao [JP/JP]; Room 802<br />

Esperar, 10–26, Eziri–Higashi 3–chome, Shimizu–shi,<br />

Shizuoka–ken 424–0815 (JP).<br />

(74) KIKUCHI, Shinichi et al. / etc.; Room 302,<br />

Nihonbashi–Chuo Building, 12–11, Nihonbashi<br />

Hon–cho 4–chome, Chuo–ku, Tokyo 103–0023<br />

(JP).<br />

(81) CN JP KR US; EP (AT BE CH DE DK ES FI FR<br />

GB GR IE IT LU MC NL PT SE).<br />

(11) WO 98/47974 (13) A1<br />

(21) <strong>PCT</strong>/NL98/00193<br />

(22) 6 Apr/avr <strong>1998</strong> (06.04.<strong>1998</strong>)<br />

(25) en (26) en<br />

(31) 1005841 (32) 18 Apr/avr 1997<br />

(18.04.1997)<br />

(<strong>43</strong>) 29 Oct/oct <strong>1998</strong> (29.10.<strong>1998</strong>)<br />

(33) NL<br />

(51) 6 C09D 167/00<br />

(54) • CAN AND COIL COATING RESINS<br />

• RESINES D’ENDUCTION EN CONTINU DE<br />

BOITES ET DE BANDES<br />

(71) DSM N.V. [NL/NL]; Het Overloon 1, NL–6411 TE<br />

Heerlen (NL).<br />

(for all designated States except / pour tous les États<br />

désignés sauf US)<br />

(72, 75) HEYENK, Albert [NL/NL]; Weg door de plas<br />

16, NL–6971 JN Brummen (NL). BESAMUSCA,<br />

Johannes, Wilhelmus [NL/NL]; Herenweg 27,<br />

NL–8023 CW Zwolle (NL).<br />

(74) SCHMEETZ, Marcel, Max, Hubertina, Johanna;<br />

Octrooibureau DSM, P.O. Box 9, NL–6160<br />

MA Geleen (NL).<br />

(81) AL AU BA BB BG BR CA CN CU CZ EE GE<br />

HU ID IL IS JP KP KR LC LK LR LT LV MG<br />

MK MN MX NO NZ PL RO SG SI SK SL TR TT<br />

UA US UZ VN YU; AP (GH GM KE LS MW SD<br />

SZ UG ZW); EA (AM AZ BY KG KZ MD RU TJ<br />

TM); EP (AT BE CH CY DE DK ES FI FR GB<br />

GR IE IT LU MC NL PT SE); OA (BF BJ CF CG<br />

CI CM GA GN ML MR NE SN TD TG).<br />

(11) WO 98/47975 (13) A1<br />

(21) <strong>PCT</strong>/EP98/019<strong>43</strong><br />

(22) 2 Apr/avr <strong>1998</strong> (02.04.<strong>1998</strong>)<br />

(25) de (26) de<br />

(31) 197 16 020.4 (32) 17 Apr/avr 1997 (33) DE<br />

(17.04.1997)<br />

(<strong>43</strong>) 29 Oct/oct <strong>1998</strong> (29.10.<strong>1998</strong>)<br />

(51) 6 C09D 175/16, 175/04 // (C09D 175/16, 175:04)<br />

(C09D 175/04, 175:16)<br />

(54) • DISPERSIONS CONTAINING A POLYURE-<br />

THANE AND A RADIATION–HARDENABLE<br />

PREPOLYMER<br />

• DISPERSIONS CONTENANT UN POLYURE-<br />

THANE ET UN PREPOLYMERE DURCIS-<br />

SABLE PAR RAYONNEMENT<br />

(71) BASF AKTIENGESELLSCHAFT [DE/DE];<br />

D–67056 Ludwigshafen (DE).<br />

(for all designated States except / pour tous les États<br />

désignés sauf US)<br />

(72, 75) KOKEL, Nicolas [FR/DE]; Budapester Strasse<br />

45, D–67069 Ludwigshafen (DE). MENZEL,<br />

Klaus [DE/DE]; Christofstrasse 5, D–71696<br />

Möglingen (DE). REICH, Wolfgang [DE/DE];<br />

Rietburgstrasse 10a, D–67133 Maxdorf (DE).<br />

(74) BASF AKTIENGESELLSCHAFT; D–67056<br />

Ludwigshafen (DE).<br />

(81) CA JP KR US; EP (AT BE CH CY DE DK ES FI<br />

FR GB GR IE IT LU MC NL PT SE).<br />

(11) WO 98/47976 (13) A1<br />

(21) <strong>PCT</strong>/EP98/02209<br />

(22) 15 Apr/avr <strong>1998</strong> (15.04.<strong>1998</strong>)<br />

(25) de (26) de<br />

(31) 197 15 975.3 (32) 17 Apr/avr 1997 (33) DE<br />

(17.04.1997)<br />

(<strong>43</strong>) 29 Oct/oct <strong>1998</strong> (29.10.<strong>1998</strong>)<br />

(51) 6 C09G 1/02, H01L 21/321<br />

(54) • BUFFER SOLUTIONS FOR SUSPENSIONS<br />

USED IN CHEMICAL–MECHANICAL POLI-<br />

SHING<br />

• SOLUTIONS TAMPONS POUR SUSPEN-<br />

SIONS S’UTILISANT POUR LE POLISSAGE<br />

CHIMICO–MECANIQUE<br />

(71) MERCK PATENT GMBH [DE/DE]; Frankfurter<br />

Strasse 250, D–64293 Darmstadt (DE).<br />

(for all designated States except / pour tous les États<br />

désignés sauf US)<br />

(72, 75) DUSEMUND, Claus [DE/DE]; Hauptstrasse<br />

119, D–66583 Spiesen–Elversberg (DE).<br />

RHEIN, Rudolf [DE/DE]; Niemöller Strasse 7,<br />

D–64646 Heppenheim (DE). SCHWEIKERT,<br />

Manuela [DE/DE]; In der Grube 15, D–6<strong>43</strong>42<br />

Seeheim–Ober Beerbach (DE). HOSTALEK,<br />

Martin [DE/DE]; Auf der Hardt 54 a, D–64291<br />

Darmstadt (DE).<br />

(74) MERCK PATENT GMBH; D–64271 Darmstadt<br />

(DE).<br />

(81) JP SG US; EP (AT BE CH CY DE DK ES FI FR<br />

GB GR IE IT LU MC NL PT SE).<br />

(11) WO 98/47977 (13) A1<br />

(21) <strong>PCT</strong>/EP98/023<strong>43</strong><br />

(22) 21 Apr/avr <strong>1998</strong> (21.04.<strong>1998</strong>)<br />

(25) de (26) de<br />

(31) 197 16 712.8 (32) 21 Apr/avr 1997<br />

(21.04.1997)<br />

(33) DE<br />

(<strong>43</strong>) 29 Oct/oct <strong>1998</strong> (29.10.<strong>1998</strong>)<br />

(51) 6 C09J 7/04 // B60J 11/00<br />

(54) • MASKING MATERIAL FOR LACQUERED<br />

SURFACES<br />

• MATERIAU MASQUE POUR SURFACES LA-<br />

QUEES<br />

(71) SCAPA GROUP PLC [GB/GB]; Oakfield House,<br />

93 Preston New Road, Blackburn, Lancashire BB2<br />

6AY (GB). JABAND GMBH SELBSTKLE-<br />

BEPRODUKTE [DE/DE]; Stockacherstrasse 9,<br />

D–812<strong>43</strong> München (DE).<br />

(for all designated States except / pour tous les États<br />

désignés sauf US)<br />

(72, 75) SALTHOUSE, Peter, W. [GB/GB]; 54 Glebelands<br />

Road, Knutsford, Cheshire WA16 9DZ (GB).<br />

GRADER, Günter [DE/DE]; Friedenstrasse 22,<br />

D–82166 Gräfelding (DE).<br />

(74) MAY, Hans, Ulrich; Franz–Joseph–Strasse 38,<br />

D–80801 München (DE).<br />

(81) AL AM AT AT (Utility model / modèle d’utilité)<br />

AU (Petty patent) AZ BA BB BG BR BY CA CH<br />

CN CU CZ CZ (Utility model / modèle d’utilité)<br />

DE DE (Utility model / modèle d’utilité) DK DK<br />

(Utility model / modèle d’utilité) EE EE (Utility<br />

model / modèle d’utilité) ES FI FI (Utility model /<br />

modèle d’utilité) GB GE GH GM GW HU ID IL<br />

IS JP KE KG KP KR KZ LC LK LR LS LT LU<br />

LV MD MG MK MN MW MX NO NZ PL PT RO<br />

RU SD SE SG SI SK SK (Utility model / modèle<br />

d’utilité) SL TJ TM TR TT UA UG US UZ VN<br />

YU ZW; AP (GH GM KE LS MW SD SZ UG<br />

ZW); EA (AM AZ BY KG KZ MD RU TJ TM);<br />

EP (AT BE CH CY DE DK ES FI FR GB GR IE<br />

IT LU MC NL PT SE); OA (BF BJ CF CG CI CM<br />

GA GN ML MR NE SN TD TG).<br />

(11) WO 98/47978 (13) A1<br />

(21) <strong>PCT</strong>/KR98/00098<br />

(22) 24 Apr/avr <strong>1998</strong> (24.04.<strong>1998</strong>)<br />

(25) en (26) en<br />

(31) 1997/15467 (32) 24 Apr/avr 1997<br />

(24.04.1997)<br />

(33) KR<br />

(<strong>43</strong>) 29 Oct/oct <strong>1998</strong> (29.10.<strong>1998</strong>)<br />

(51) 6 C09K 3/18<br />

(54) • DEICING AND SNOW–REMOVING COMPO-<br />

SITION, METHOD FOR PRODUCING THE<br />

SAME, AND USE THEREOF<br />

• COMPOSITION POUR LE DEGIVRAGE ET<br />

L’ENLEVEMENT DE LA NEIGE, SON PRO-<br />

CEDE DE PRODUCTION ET SON UTILISA-<br />

TION<br />

(71, 72) KIM, Ki–Bum [KR/KR]; Pyounghwa Apt.<br />

1105, 42/2, 46 Bunji–2 Ho, Kayang–dong,<br />

Dong–gu, Taejeon–kwangyokshi 300–090 (KR).<br />

(72, 75) LEE, Kyoung–Jong [KR/KR]; Samsunghanul<br />

Apt. 111/1804, Sinsung–dong, Yusung–gu, Taejeon–kwangyokshi<br />

305–345 (KR).<br />

(74) MOON, Chang–Hoa; Moon & Sun Patent Law<br />

Firm, 3rd Cambridge Building, 825–18, Yoksam<br />

1–dong, Gangnam–ku, Seoul 135–081 (KR).<br />

(81) CA CN DE JP RU US.<br />

Published / Publiée : (c)

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