PCT/1998/43 - World Intellectual Property Organization

43/1998
15092 PCT Gazette - Section I - Gazette du PCT 29 Oct/oct 1998
•
PUCE A CONTACTS A BILLES ET CAS-
SETTE AU FORMAT DES PUCES
(71) FLIP CHIP TECHNOLOGIES, L.L.C. [US/US];
3701 E. University Drive, Phoenix, AR 85034
(US).
(72) ELENIUS, Peter; 9885 E. Cochise, Scottsdale, AZ
85258 (US). MALMROSE, Roger; 1773 Orchard
Way, Pleasanton, CA 94566 (US).
(74) GLAZER, Marvin, A. et al. / etc.; Cahill, Sutton
& Thomas, P.L.C., Suite 155, 2141 E. Highland
Avenue, Phoenix, AZ 85016 (US).
(81) CA CN JP KR SG; EP (AT BE CH CY DE DK ES
FI FR GB GR IE IT LU MC NL PT SE).
(11) WO 98/48450 (13) A1
(21) PCT/EP98/02083
(22) 9 Apr/avr 1998 (09.04.1998)
(25) de (26) de
(31) 197 16 123.5 (32) 17 Apr/avr 1997
(17.04.1997)
(33) DE
(43) 29 Oct/oct 1998 (29.10.1998)
(51) 6 H01L 21/00
(54) • DEVICE FOR CONVEYING SUBSTRATES
THROUGH A SUBSTRATE PROCESSING
PLANT
• DISPOSITIF DE TRANSPORT DE SUB-
STRATS A TRAVERS UNE INSTALLATION
DE TRAITEMENT DE SUBSTRATS
(71) STEAG HAMATECH GMBH MACHINES
[DE/DE]; Ferdinand–von–Steinbeis–Ring 10,
D–75447 Sternenfels (DE).
(for all designated States except / pour tous les États
désignés sauf US)
(72, 75) WEBER, Klaus [DE/DE]; Friedenstrasse
58, D–75015 Bretten (DE). MAHNER, Bernd
[DE/DE]; Hindenburgstrasse 15, D–75417
Mühlacker (DE).
(81) CA CN IL JP KR SG US; EP (AT BE CH CY DE
DK ES FI FR GB GR IE IT LU MC NL PT SE).
Published / Publiée : (c)
(11) WO 98/48451 (13) A1
(21) PCT/JP98/01776
(22) 17 Apr/avr 1998 (17.04.1998)
(25) ja (26) ja
(31) 9/101954 (32) 18 Apr/avr 1997
(18.04.1997)
(31) 9/104978 (32) 22 Apr/avr 1997
(22.04.1997)
(31) 9/233109 (32) 28 Aug/août 1997
(28.08.1997)
(33) JP
(33) JP
(33) JP
(43) 29 Oct/oct 1998 (29.10.1998)
(51) 6 H01L 21/027, G03F 7/20
(54) • ALIGNER, EXPOSURE METHOD USING
THE ALIGNER, AND METHOD OF MANU-
FACTURE OF CIRCUIT DEVICE
• ALIGNEUR, PROCEDE D’EXPOSITION
METTANT EN OEUVRE LEDIT ALIGNEUR
ET PROCEDE DE FABRICATION D’UN
DISPOSITIF DE CIRCUIT
(71) NIKON CORPORATION [JP/JP]; 2–3, Marunouchi
3–chome, Chiyoda–ku, Tokyo 100–8331 (JP).
(for all designated States except / pour tous les États
désignés sauf US)
(72, 75) NISHI, Kenji [JP/JP]; Nikon Corporation,
2–3, Marunouchi 3–chome, Chiyoda–ku, Tokyo
100–8331 (JP). KIUCHI, Toru [JP/JP];
Nikon Corporation, 2–3, Marunouchi 3–chome,
Chiyoda–ku, Tokyo 100–8331 (JP).
(74) SHAMOTO, Ichio et al. / etc.; Yuasa and Hara,
Section 206, New Ohtemachi Building, 2–1, Ohtemachi
2–chome, Chiyoda–ku, Tokyo 100–0004
(JP).
(81) AL AM AT AU AZ BA BB BG BR BY CA CH
CN CU CZ DE DK EE ES FI GB GE GH GM
GW HU ID IL IS JP KE KG KR KZ LC LK LR
LS LT LU LV MD MG MK MN MW MX NO NZ
PL PT RO RU SD SE SG SI SK SL TJ TM TR
TT UA UG US UZ VN YU ZW; AP (GH GM KE
LS MW SD SZ UG ZW); EA (AM AZ BY KG
KZ MD RU TJ TM); EP (AT BE CH CY DE DK
ES FI FR GB GR IE IT LU MC NL PT SE); OA
(BF BJ CF CG CI CM GA GN ML MR NE SN
TD TG).
(11) WO 98/48452 (13) A1
(21) PCT/JP98/01777
(22) 17 Apr/avr 1998 (17.04.1998)
(25) ja (26) ja
(31) 9/116255 (32) 18 Apr/avr 1997
(18.04.1997)
(31) 9/109748 (32) 25 Apr/avr 1997
(25.04.1997)
(31) 9/124527 (32) 14 May/mai 1997
(14.05.1997)
(43) 29 Oct/oct 1998 (29.10.1998)
(33) JP
(33) JP
(33) JP
(51) 6 H01L 21/027, G03F 7/20
(54) • METHOD AND DEVICE FOR EXPOSURE
CONTROL, METHOD AND DEVICE FOR
EXPOSURE, AND METHOD OF MANUFAC-
TURE OF DEVICE
• PROCEDE ET DISPOSITIF DE COMMANDE
DE L’EXPOSITION, PROCEDE ET DISPOSI-
TIF D’EXPOSITION, ET PROCEDE DE FA-
BRICATION DUDIT DISPOSITIF
(71) NIKON CORPORATION [JP/JP]; 2–3, Marunouchi
3–chome, Chiyoda–ku, Tokyo 100–8331 (JP).
(for all designated States except / pour tous les États
désignés sauf US)
(72, 75) TANAKA, Yasuaki [JP/JP]; Nikon Corporation,
2–3, Marunouchi 3–chome, Chiyoda–ku, Tokyo
100–8331 (JP). NOBORU, Michio [JP/JP];
Nikon Corporation, 2–3, Marunouchi 3–chome,
Chiyoda–ku, Tokyo 100–8331 (JP).
(74) SHAMOTO, Ichio et al. / etc.; Yuasa and Hara,
Section 206, New Ohtemachi Building, 2–1, Ohtemachi
2–chome, Chiyoda–ku, Tokyo 100–0004
(JP).
(81) AL AM AT AU AZ BA BB BG BR BY CA CH
CN CU CZ DE DK EE ES FI GB GE GH GM
GW HU ID IL IS JP KE KG KR KZ LC LK LR
LS LT LU LV MD MG MK MN MW MX NO NZ
PL PT RO RU SD SE SG SI SK SL TJ TM TR
TT UA UG US UZ VN YU ZW; AP (GH GM KE
LS MW SD SZ UG ZW); EA (AM AZ BY KG
KZ MD RU TJ TM); EP (AT BE CH CY DE DK
ES FI FR GB GR IE IT LU MC NL PT SE); OA
(BF BJ CF CG CI CM GA GN ML MR NE SN
TD TG).
(11) WO 98/48453 (13) A1
(21) PCT/US98/08107
(22) 22 Apr/avr 1998 (22.04.1998)
(25) en (26) en
(31) 60/043,975 (32) 23 Apr/avr 1997
(23.04.1997)
(33) US
(43) 29 Oct/oct 1998 (29.10.1998)
(51) 6 H01L 21/3105, C09G 1/02, C09K 3/14
(54) • PLANARIZATION COMPOSITIONS FOR
CMP OF INTERLAYER DIELECTRICS
• COMPOSITIONS DE PLANARISATION CHI-
MIOMECANIQUE DE DIELECTRIQUES IN-
TERCOUCHES
(71) ADVANCED CHEMICAL SYSTEMS INTER-
NATIONAL, INC. [US/US]; 510 Alder Drive,
Milpitas, CA 95035 (US).
(72) BREWER, Richard; 1450 Almaden Valley Drive,
San Jose, CA 95120 (US). GREBINSKI, Thomas,
J.; 1920 Tallwood Lane, Boise, ID 83706
(US). CURRIE, James, E.; Route 1, Hammond
Hill Road, Box 47C, Dover Plains, NY 12522
(US). JONES, Michael; 484–3 Madera Avenue,
Sunnyvale, CA 94086 (US). MULLEE, William;
10592 S.W. 63rd Drive, Portland, OR 97219 (US).
NGUYEN, Ann; 3846 Glengrove Way, San Jose,
CA 97219 (US).
(74) FLIESLER, Martin, C. et al. / etc.; Fliesler,
Dubb, Meyer and Lovejoy LLP, Suite 400,
Four Embarcadero Center, San Francisco, CA
94111–4156 (US).
(81) AL AM AT AU AZ BA BB BG BR BY CA CH
CN CU CZ DE DK EE ES FI GB GE GH GM
GW HU ID IL IS JP KE KG KP KR KZ LC LK
LR LS LT LU LV MD MG MK MN MW MX NO
NZ PL PT RO RU SD SE SG SI SK SL TJ TM
TR TT UA UG UZ VN YU ZW; AP (GH GM KE
LS MW SD SZ UG ZW); EA (AM AZ BY KG
KZ MD RU TJ TM); EP (AT BE CH CY DE DK
ES FI FR GB GR IE IT LU MC NL PT SE); OA
(BF BJ CF CG CI CM GA GN ML MR NE SN
TD TG).
(11) WO 98/48454 (13) A1
(21) PCT/US98/04044
(22) 3 Mar/mar 1998 (03.03.1998)
(25) en (26) en
(31) 08/847,374 (32) 22 Apr/avr 1997 (33) US
(22.04.1997)
(43) 29 Oct/oct 1998 (29.10.1998)
(51) 6 H01L 21/48, 23/538, H05K 3/10, 3/46
(54) • METHOD OF FORMING REDUNDANT
SIGNAL TRACES AND CORRESPONDING
ELECTRONIC COMPONENTS
• PROCEDE DE FORMATION DE TRACES
DU SIGNAL REDONDANTES ET DE
COMPOSANTS ELECTRONIQUES COR-
RESPONDANTS
(71) W.L. GORE & ASSOCIATES, INC. [US/US];
551 Paper Mill Road, P.O. Box 9206, Newark, DE
19714 (US).
(72) FISCHER, Paul, J.; 419 Southwood Court, Eau
Claire, WI 54701 (US). GORRELL, Robin, E.;
7163 Kern Drive, Eau Claire, WI 54701 (US).
(74) CAMPBELL, John, S. et al. / etc.; W.L. Gore &
Associates, Inc., 551 Paper Mill Road, P.O. Box
9206, Newark, DE 19714–9206 (US).
(81) AL AM AT AU AZ BA BB BG BR BY CA CH
CN CU CZ DE DK EE ES FI GB GE GH HU IL
IS JP KE KG KP KR KZ LC LK LR LS LT LU
LV MD MG MK MN MW MX NO NZ PL PT RO
RU SD SE SG SI SK SL TJ TM TR TT UA UG
UZ VN YU ZW; EP (AT BE CH DE DK ES FI
FR GB GR IE IT LU MC NL PT SE).
(11) WO 98/48455 (13) A1
(21) PCT/JP98/01805