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i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...

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7.0 EEPROM CIRCUIT DESIGN<br />

EEPROM (Electrically Erasable/Programmable Read Only Memory) is a non-volatile memory<br />

device which has the capability to be read like an ordinary ROM as well as to be erased<br />

/programmed electrically to a new data value that needs to be stored. The fundamental<br />

component in the EEPROM cell is the FLOTOX (Floating Gate Tunnel Oxide) transistor. The<br />

following sections describe the implementation of the EEPROM design in a 0.35um process.<br />

7.1 EEPROM CELL<br />

The FLOTOX transistor is a device, which can be used to store a “bit” value. The EEPROM cell<br />

operates by changing the threshold voltage of the FLOTOX transistor [19]. When the transistor’s<br />

threshold voltage is increased, the transistor does not conduct for normal applied voltages and is<br />

said to be erased. When the transistor’s threshold voltage is reduced, the transistor begins to<br />

conduct even for a zero gate to source voltage and is said to be written. The structure of the<br />

FLOTOX shown in Figure 7-1 shows the gate oxide and tunnel oxide regions of the transistor.<br />

117

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