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i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...

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Source<br />

Vs=0V<br />

Oxide<br />

Floating Gate<br />

Gate Oxide<br />

Vg=0V<br />

Control Gate<br />

Channel Region<br />

Electric Field<br />

e<br />

Tunneling Electrons<br />

Drain<br />

Vd=+18V<br />

Figure 7-7: EEPROM Write Physical Operation<br />

Floating Gate<br />

Source<br />

Gate Oxide<br />

Vg<br />

Control Gate<br />

Oxide<br />

+ + + + + + + + + + + + + + + + + +<br />

Channel Region<br />

+ + + + + + +<br />

Tunnel Oxide<br />

Figure 7-8: Charge on floating gate after write operation<br />

Figure 7-9 shows the IV characteristics of the cell when the FLOTOX transistor is written<br />

[19]. The characteristic shows a decrease in the threshold voltage of the FLOTOX transistor<br />

when the cell is written.<br />

122

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