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i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...

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Figure 7-9: IV Characteristics of a written FLOTOX transistor<br />

During the erase operation, the voltage on the floating gate node follows the gate control<br />

voltage until electrons get injected because of Fowler-Nordheim tunneling [20]. At the onset of<br />

tunneling, the floating gate voltage begins to decrease. Once the erase operation is completed by<br />

setting the gate control voltage to zero volts, the floating gate potential reaches a negative value<br />

depending on the amount of charges trapped on the floating gate [20]. The floating gate behavior<br />

is similar during a write operation.<br />

7.2 EEPROM MEMORY ARCHITECTURE<br />

The EEPROM memory in addition to the FLOTOX transistor requires special circuits for its<br />

operation. Some components of the design are similar to the SRAM (Static Random Access<br />

Memory) array while most of them are different. The following components are a part of the<br />

EEPROM array:<br />

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