i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...
i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...
i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...
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Transmission Gate Based Delay Element<br />
A transmission gate (TG) based delay element has a NMOS and a PMOS connected in<br />
parallel. The gates of the PMOS and NMOS are connected to GND and VDD respectively. The<br />
delay in a TG based delay element is from the on-resistance of the parallel combination of the<br />
PMOS and NMOS through which a load capacitance CL is charged and discharged. The on-<br />
resistance of the delay element can be varied by adjusting the transistor sizes appropriately. The<br />
reason for using both PMOS and NMOS in the structure is that a PMOS passes a logic high<br />
value without degradation and a NMOS passes a logic low value without degradation.<br />
The power consumed by the transmission gate delay element is from the charging and<br />
discharging of the load capacitance. Hence the power consumed by the delay element is minimal.<br />
However, because of the slow rise and fall times, the signal integrity of the delay element is<br />
considerably degraded. In this context, signal integrity is said to be good when the rise and fall<br />
times measured from 10% to 90% of the output is considerably small [15]. The delay element<br />
cannot be used to generate large delay values because of the slow rise times. The slow rise and<br />
fall times will cause a huge short circuit current consumption on the logic gate that is being<br />
driven. The TG based delay element has shown to vary considerably with supply voltage<br />
variations [11]. The TG can be used for delays in the range from 200-300ps [11]. Figure 6-1<br />
shows the schematic of a transmission gate based delay element.<br />
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