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i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...

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Source<br />

Gate Oxide<br />

Control Gate<br />

Oxide<br />

Floating Gate<br />

Channel Region<br />

Tunnel Oxide<br />

Drain<br />

Figure 7-1: Structure of the FLOTOX Transistor<br />

Control Gate<br />

Floating Gate<br />

Source Drain<br />

Figure 7-2: Symbol of a FLOTOX transistor<br />

Figure 7-2 shows the symbol of a FLOTOX transistor. The EEPROM FLOTOX<br />

transistor has a Control Gate (CG) terminal, a Floating gate terminal (FG), a Source (S), a Drain<br />

(D) and a Substrate (B) terminal. The FLOTOX transistor is fundamentally an n-channel double-<br />

poly transistor in which the middle layer is floating and is called the floating gate [19]. The<br />

FLOTOX EEPROM has a region where the oxide thickness is very low and is called the<br />

tunneling window. The oxide at the tunneling window region is called the tunnel oxide. Figure<br />

7-3 shows the IV characteristics of the FLOTOX transistor in its virgin state [19]. Virgin state of<br />

the FLOTOX transistor is the state when the transistor has neither been erased nor written.<br />

118

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