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i A PHYSICAL IMPLEMENTATION WITH CUSTOM LOW POWER ...

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3.1.1 Static Power Consumption<br />

Static power is the power dissipated when the gate or circuit is not switching. In other words, the<br />

power consumed when the device is static or inactive can be called static power. The primary<br />

source of static power comes from the leakage of current from the supply rail to ground through<br />

various paths within the circuit. Hence, it has become conventional to refer static power as<br />

leakage power.<br />

Sub-threshold leakage has been one of the main sources of leakage in nanometer CMOS<br />

technologies. Consider an NMOS transistor as an example. The sub-threshold leakage is due to<br />

the current flow from the drain to source of the transistor, even when the gate voltage is set<br />

below the threshold voltage of the transistor. This is because of the weak inversion layer that<br />

exists in the channel at voltages close to the threshold voltage of the transistor. Sub-threshold<br />

leakage has been shown to be the major leakage source in nanometer CMOS technologies. The<br />

other sources of leakage include gate tunneling leakage and junction tunneling leakage. Gate<br />

tunneling leakage is the current flow into or out of the gate terminal of a MOSFET. Gate<br />

tunneling leakage has become an issue with nanometer CMOS technologies because of the<br />

reduced gate oxide thickness. Junction leakage is the current flow from the drain or source<br />

diffusion region to the body (substrate) terminal of a MOSFET. This leakage current is because<br />

of the reverse biased junctions between the source/drain diffusion region and the substrate or the<br />

well [6].<br />

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