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Introduction to Nanotechnology

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10.1. SELF-ASSEMBLY 259<br />

fac<strong>to</strong>r of 2 associated with R1 and R', accounts for the participation of two a<strong>to</strong>ms in<br />

each pair process. Analogous expressions can be written for the rate of change of the<br />

number of pairs dn,ldt, for the rate of change of the number of triplet clusters<br />

dn,ldt, and so forth. Some of the terms for the various rates Ri depend on the extent<br />

of the coverage of the surface, and the equation itself is applicable mainly during the<br />

nucleation stage.<br />

At the second or aggregation stage the percentage of isolated ada<strong>to</strong>ms becomes<br />

negligible, and a free-energy approach can provide some insight in<strong>to</strong> the island<br />

formation process. Consider the Gibbs free-energy density g,,,-,,, between the bare<br />

surface and the vacuum outside, the free-energy density gsurPlay between the surface<br />

and the layers of ada<strong>to</strong>ms, and the free-energy density glay-vac between these layers<br />

and the vacuum. These are related <strong>to</strong> the overall Gibbs free-energy density g through<br />

the expression<br />

where E is the fraction of the surface covered. As the islands form and grow the<br />

relative contributions arising from these terms gradually change, and the growth<br />

process evolves <strong>to</strong> maintain the lowest thermodynamic free energy. These free<br />

energies can be used <strong>to</strong> define a spreading pressure Ps = g,,,-,,, - (gs,,-lay +<br />

glayPvac) that involves the difference between the bare surface free energy g,,,-,,,<br />

and that of the layers (gsurPlay +glay-vac), and it is associated with the spreading<br />

of ada<strong>to</strong>ms over the surface. For the condition (gsur-lay<br />

+ glay-vac)<br />

< g,uT-vaC, the<br />

addition of ada<strong>to</strong>ms increases E, and thereby causes the free energy <strong>to</strong> decrease. Thus<br />

the ada<strong>to</strong>ms that adsorb will tend <strong>to</strong> remain directly on the bare surface leading <strong>to</strong> a<br />

horizontal growth of islands, and the eventual formation of a monolayer. The<br />

spreading pressure P, is positive and contributes <strong>to</strong> the dispersal of the ada<strong>to</strong>ms.<br />

This is referred <strong>to</strong> as the Franck-van der Menve growth mode.<br />

For the opposite condition (gsur-lay + gIaypvac) > g,uT--VaC, the growth of the<br />

fractional surface coverage E increases the free energy, so it is thermodynamically<br />

unfavorable for the adsorbed layer <strong>to</strong> be thin and flat. The newly added ada<strong>to</strong>ms tend<br />

<strong>to</strong> keep the free energy low by aggregating on the <strong>to</strong>p of existing islands, leading <strong>to</strong> a<br />

vertical rather than a horizontal growth of islands. This is called the Elmer-Weber<br />

mode of growth.<br />

We mentioned above that heteroepitaxy involves islands or a film with a nearly<br />

matched interface with the substrate. The fractionfof mismatch between the islands<br />

and the surface is given by the expression (see p. 18)<br />

bf - a,l<br />

f =-<br />

a,<br />

(10.3)<br />

where af is the lattice constant of the island or film and a, is the lattice constant of<br />

the substrate. For small mismatches, less than 2%, very little strain develops at the<br />

growth of a film consisting of many successive layers on <strong>to</strong>p of each other. If the<br />

mismatch exceeds 3%, then the first layer is appreciably strained, and the extent of

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