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Introduction to Nanotechnology

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3.3. MICROSCOPY 53<br />

Actual diverging<br />

electron beam<br />

Figure 3.16. Double-deflection system of a scanning electron microscope. When the upper<br />

scan coils /,-A deflect the beam through an angle 0, the lower scan coils h-l2 deflect it back<br />

through the angle 20, and the electrons sequentially strike the sample along the indicated line.<br />

The upper inset on the left shows the saw<strong>to</strong>oth voltage that controls the current through the /,<br />

scanning coils. The lower inset on the left shows the sequence 01 points on the sample lor<br />

various electron trajec<strong>to</strong>ries 1.2.3.4.5 downward along the microscope axis. Scan coils I,-/,<br />

and I,-/, provide the beam deflection for the sequence 01 points 1.1’. 1” shown in detail A. [From<br />

J. D. Verhoeven, chapter in Whan (1986). p, 493.1<br />

occurs in many television sets. The magnetic field produced by a coil is proportional<br />

<strong>to</strong> the voltage Vapplied <strong>to</strong> the coil. We see from the upper insct on the let? side of<br />

Fig. 3.16 that a saw<strong>to</strong>oth voltage is applied <strong>to</strong> the pairs of coils /,,I, and /2,/2. The<br />

magnetic field produced by the coils exerts a force that deflects the electron beam<br />

from left <strong>to</strong> right along the direction of the line drawn at the bot<strong>to</strong>m on the sample.

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