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Introduction to Nanotechnology

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Re (rhenium) nanoparticle magnetic<br />

moment, 89<br />

reactivity<br />

nanoparticle, 83<br />

nanoparticle, measurement of, 83, 84<br />

read mode, 182, 346<br />

reciprocal space, 22, 234<br />

sketch, 23<br />

reflection high energy electron diffraction<br />

(MEED), 45<br />

rehybridize, 124<br />

remnant magnetization, 169, 170<br />

particle size dependence, 172<br />

replication, 3 19<br />

repulsion<br />

hard-sphere, 158<br />

soft, 158<br />

residue, 314<br />

resist, 228, 263<br />

resis<strong>to</strong>r network, 232<br />

responsivity, 250, 251<br />

RF plasma nanoparticle synthesis, 97, 98<br />

Rh (rhodium), 265, 266, 279<br />

ribonucleic acid, see RNA<br />

ribosome, 315, 324<br />

rigid beam vibration, 7<br />

RNA (ribonucleic acid), 257, 3 14, 320, 323<br />

messenger, 323<br />

rotaxane, 351-353<br />

Ru (ruthenium), 279<br />

bonded <strong>to</strong> nanotube, 129<br />

catalyst, 129<br />

rubber, 284<br />

Rydberg<br />

level x-ray emission, 66<br />

series, 196, 244<br />

series, exci<strong>to</strong>n, 32<br />

series, figure, 33<br />

saponite, 274, 276<br />

saturation magnetization, 170<br />

particle size dependence, 174<br />

Sb (antimony), size, 42<br />

SC, simple cubic, 36<br />

scanning electron microscope, 150, 292<br />

image, 177, 178<br />

scanning microscopy, 5 1<br />

scanning transmission electron microscope,<br />

52, 53<br />

schematic, 53<br />

scanning tunneling microscope (STM), 24, 52,54, 118, 119, 336338,341<br />

INDEX 385<br />

constant height and constant current<br />

modes, 55<br />

scattering<br />

conduction electrons, 4<br />

intraband, 232<br />

length, 4<br />

light, 286<br />

scattering length, 73<br />

Schrodinger equation, 77<br />

scooter mechanism, 1 17<br />

screening, Debye, 159<br />

Se (selenium)<br />

crystal, 154<br />

optical spectrum, 156<br />

secondary structure, 3 15, 3 18<br />

Seebeck effect, 244<br />

self assembled monolayer (SAM), 80, 260<br />

self assembly, 4, 257, 261-263, 294-297,<br />

300, 330<br />

octanethiol, 349<br />

polyamine dendnmer, 300<br />

supramolecular, 302<br />

semiconduc<strong>to</strong>r, 20<br />

indirect gap, 25, 27, 30<br />

intrinsic, 21<br />

n-type, 21, 152<br />

p-ty~e, 21, 152<br />

semiconduc<strong>to</strong>r property tabulations<br />

(Appendix B), 361<br />

sensor, chemical, 128<br />

serine, 325<br />

shielding, electromagnetic, 293<br />

short range order, 9<br />

shot noise, 246<br />

Si (silicon), 15, 25, 260<br />

bandgap, 31<br />

carrier density, 26, 29<br />

computer chip, 345<br />

donor, 30<br />

etched, 150<br />

n-type, 152<br />

nanoparticle, 90<br />

nanoparticle pho<strong>to</strong>dissociation, 92<br />

P-type, 152<br />

porous, 15 1<br />

Raman spectrum, 205-207<br />

wafer, 151<br />

wafer, etched, 152<br />

29<br />

Si, nuclear magnetic resonance, 269, 270<br />

SiCN<br />

FTIR, 60<br />

nanopowder FTIR, 59<br />

silane, 300<br />

silanol, 269, 270

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