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3D Time-of-flight distance measurement with custom - Universität ...

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128 CHAPTER 5<br />

right photogate, where a fraction <strong>of</strong> charge will always travel directly into the<br />

dump diffusion and will never be detected.<br />

(2) Charge carriers are not only collected under the transparent photogates but<br />

also under the adjacent opaque photogates, because (a) the geometry and<br />

position <strong>of</strong> the optical shield is never 100% precise. And (b), even more<br />

important, depending on its wavelength the light penetrates deep into the<br />

semiconductor before it generates electron hole pairs (c.f. Figure 3.4). Then it<br />

diffuses in all directions, not only perpendicularly to the semiconductor surface.<br />

This leads to the blurring effect, which we have already mentioned above.<br />

Here ideal perpendicular diffusion has been assumed. Nevertheless 50% <strong>of</strong> the<br />

charge generated under the left photo gate cannot be separated and will be<br />

collected under the integration gate. Such a behavior would correspond to a<br />

demodulation contrast <strong>of</strong> (5/6-1/6) / (5/6+1/6) = 4/6 = 67%.<br />

This means that, for this simple model, we cannot expect the demodulation contrast<br />

to be better than 67%, even for these idealized DC-conditions. So far, however, we<br />

have neglected two important parameters: (1) the demodulation frequency (the<br />

demodulation contrast will decrease <strong>with</strong> increasing frequencies) and (2) the<br />

influence <strong>of</strong> the light’s wavelength.<br />

Influence <strong>of</strong> the wavelength<br />

As already mentioned, we expect the wavelength <strong>of</strong> the light source used to have<br />

an influence on the achievable demodulation contrast. This is due to the<br />

wavelength-dependent penetration depth <strong>of</strong> incoming light, introduced in<br />

Section 3.1.1. Since, generally, electrical fields <strong>with</strong>in a CMOS-processed<br />

semiconductor exist only near the semiconductor surface, substrate-regions more<br />

than about 2 µm - 5 µm away from the surface are nearly field-free. Charge carriers<br />

that are optically generated in these regions move by thermal diffusion in any<br />

random direction. Either they recombine <strong>with</strong>in the substrate or they are collected<br />

by an electrical field near the surface. However, they can travel up to 100 µm<br />

before being captured by an electrical field (Section 3.1.3). Since red-light<br />

photoelectrons are generated deeper in the semiconductor than blue-light<br />

photoelectrons, their tendency to travel before being detected (crosstalk) is much<br />

higher.

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