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3D Time-of-flight distance measurement with custom - Universität ...

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66 CHAPTER 3<br />

The proportionality factor between the electrical field and the drift velocity is the<br />

carrier mobility µn (here electron mobility), given by:<br />

q ⋅ τ<br />

µ<br />

c<br />

n ≡<br />

m<br />

Equation 3.11<br />

eff<br />

τ c is the mean free time, or the average time between collisions <strong>of</strong> the carriers <strong>with</strong><br />

the lattice or impurity atoms. It strongly depends on the semiconductor material, the<br />

temperature and the doping concentration in the semiconductor (see also<br />

Figure 3.12).<br />

For very high electric fields this drift velocity approaches the thermal velocity, which<br />

cannot be exceeded in silicon and thus defines the maximum drift velocity vmax (or<br />

saturation velocity) in an electric field (10 7 cm/s for Si) (see Figure 3.13):<br />

3kT<br />

v max = v th =<br />

m<br />

Equation 3.12<br />

eff<br />

Figure 3.13 Drift <strong>of</strong> free charge carriers in an electric field: saturation velocity.<br />

[SZ2].<br />

The correct expression for the drift velocity, considering the saturation velocity is:<br />

µ n ⋅ E<br />

vn<br />

=<br />

µ n ⋅ E<br />

1+<br />

Equation 3.13<br />

vmax<br />

At this point it is worth mentioning two points:<br />

(1) Generally, the carrier drift velocity in metal is much lower than in<br />

semiconductors because <strong>of</strong> the lower mobility.

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