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3D Time-of-flight distance measurement with custom - Universität ...

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SOLID-STATE IMAGE SENSING 63<br />

transport if many free charge carriers are located close to each other. We will see<br />

later that for typical optical conditions in our TOF application, we deal <strong>with</strong> the<br />

transportation <strong>of</strong> single electrons. Therefore, self-induced drift is neglected.<br />

Self induced drift Thermal diffusion<br />

E<br />

Electric field<br />

Figure 3.11 Transport mechanisms for free electrons in a semiconductor.<br />

Thermal diffusion<br />

For temperatures larger than T=0°K, free charge carriers have thermal energy,<br />

which results in a permanent movement in random directions. The thermal velocity<br />

vth, i.e. the amount <strong>of</strong> the microscopic movement velocity, is given by:<br />

3kT<br />

v th =<br />

m<br />

Equation 3.6<br />

eff<br />

At room temperature (300K) we get vth≈10 7 cm/s for Si and GaAs. The charge<br />

carriers move fairly quickly but steadily change their directions due to collisions <strong>with</strong><br />

the fixed lattice or impurity atoms or other free charge carriers. The sum <strong>of</strong> these<br />

microscopic movements results in a macroscopic movement, again in random<br />

directions. This movement process, known as thermal diffusion, only ends when the<br />

free carriers recombine after a certain lifetime τn and τp respectively. Statistically<br />

speaking, after this time they have traveled a certain <strong>distance</strong>, the so-called<br />

diffusion length Ln:<br />

Ln<br />

= Dn<br />

⋅ τn<br />

Equation 3.7<br />

This diffusion length depends on the doping concentration <strong>of</strong> the semiconductor.<br />

This is expressed in the diffusivity Dn, which contains the doping dependent carrier<br />

mobility (electron mobility µn):

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