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3D Time-of-flight distance measurement with custom - Universität ...

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52 CHAPTER 3<br />

3.1 Silicon properties for solid-state photo-sensing<br />

Assuming that the energy <strong>of</strong> a photon penetrating the semiconductor is higher than<br />

the bandgap <strong>of</strong> the semiconductor material, it will be absorbed (“band to band”<br />

transition) and generate electron-hole pairs, a procedure known as<br />

photoconversion. Once generated, these free charge carriers generally move <strong>with</strong>in<br />

the semiconductor by thermal diffusion and self-induced drift before they recombine<br />

again after a certain lifetime τ [SZ1]. See also Figure 3.12. When they have<br />

recombined, they can no longer be detected and the optical information carried by<br />

the charge carriers is lost. In order to detect the carriers, the electron-hole pairs<br />

have to be separated by an electrical field, either in the space charge region <strong>of</strong> a<br />

(reverse biased) pn-junction, as is the case for photo diodes, or in the depletion<br />

zone <strong>of</strong> a photogate, as is the case in CCD imagers.<br />

3.1.1 Photodiodes in CMOS<br />

For conventional CMOS processes, (we assume p-substrate processes in the<br />

framework <strong>of</strong> this dissertation,) the designer has the freedom to realize different<br />

types <strong>of</strong> photodiodes <strong>with</strong> the available process mask sets, e.g. using the n+ active<br />

layer for an n+ in p-substrate diode (n+ diode) or the n-well layer for an n - in psubstrate<br />

diode (n-well diode). Figure 3.2 schematically shows these diodes in a<br />

cross sectional view. They are biased in reverse direction. Assuming that the<br />

doping concentration <strong>of</strong> one side <strong>of</strong> the pn junction is much larger than the<br />

concentration on the other side, nearly the complete space charge region <strong>of</strong> size<br />

wsc <strong>of</strong> the pn-junction extends to the lower doped region. The following is an<br />

approximation for an abrupt pn junction and complete depletion:<br />

2 ⋅ ε0<br />

⋅ ε<br />

w<br />

Si<br />

sc = ⋅ ( Vbi<br />

+ Vr<br />

)<br />

Equation 3.1<br />

q ⋅ Nlower<br />

(Vbi: built in potential ≈ 0.7..0.8 V; Vr: reverse bias voltage; Nlower: doping<br />

concentration <strong>of</strong> the lower doped region). The table in Figure 3.2 gives typical<br />

process characteristics <strong>of</strong> a 0.5µm standard CMOS process and calculates the<br />

corresponding width <strong>of</strong> the space charge region for a reverse bias <strong>of</strong> 5 V. The<br />

active region (active depth), in which optically generated charge carriers are

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