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3D Time-of-flight distance measurement with custom - Universität ...

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56 CHAPTER 3<br />

Quantum efficiency in %<br />

100<br />

90<br />

80<br />

70<br />

60<br />

50<br />

40<br />

30<br />

20<br />

10<br />

0<br />

350 550 750 950<br />

Wavelenght in nm<br />

n+ diode<br />

n-well diode<br />

Figure 3.5 Measured quantum efficiency curves <strong>of</strong> n+ and n-well photo diodes<br />

realized in a 0.5µm CMOS process.<br />

A way to increase the quantum efficiency, especially towards UV, is shown in<br />

Figure 3.6. This improved performance is achieved by realizing small stripes <strong>of</strong><br />

photodiodes (finger structures) rather than one large area diode. In this way a<br />

space charge region and hence an electrical field is also present up to the<br />

semiconductor surface, where most <strong>of</strong> the blue light is absorbed.<br />

V SS<br />

V DD<br />

1.2µm 0.8µm<br />

n+ finger diode<br />

p - (substrate) n - (n-well) p + n +<br />

V SS V DD<br />

Quantum efficiency in %<br />

70<br />

60<br />

50<br />

40<br />

30<br />

20<br />

10<br />

0<br />

n+ diode<br />

n+ finger diode<br />

350 450 550 650 750 850 950 1050<br />

Wavelength in nm<br />

Figure 3.6 Quantum efficiency <strong>of</strong> n+ photo diode and n+ finger photo diode.<br />

Note the improved blue and UV response for the finger structure<br />

(15 % rather than 5 % quantum efficiency at 350 nm).

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