3D Time-of-flight distance measurement with custom - Universität ...
3D Time-of-flight distance measurement with custom - Universität ...
3D Time-of-flight distance measurement with custom - Universität ...
You also want an ePaper? Increase the reach of your titles
YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.
SOLID-STATE IMAGE SENSING 57<br />
3.1.2 MOS photogate<br />
The physical basis for a CCD device is the MOS photogate, also known as MOS<br />
capacitor or MOS-diode [SZ2]. This gate is biased in deep depletion mode, which<br />
means that a volume <strong>of</strong> depth xd in the semiconductor underneath the photogate is<br />
totally depleted. In this depletion zone no free charge carriers are available. (Here<br />
electrons correspond to minority carriers and holes to majority carriers, since a psubstrate<br />
process is used for this work.) If free minority carriers were available, the<br />
MOS gate would be in strong inversion, causing an inversion layer <strong>of</strong> electrons<br />
below the gate. For a MOS transistor this assumption is usually valid because free<br />
charge carriers come from the source and the drain. This is, however, not the case<br />
if we look at a photogate or CCD gate. In the latter case free charge carriers are<br />
only available if either generated optically (optical signal) or thermally (dark<br />
current). We therefore call this operation mode deep depletion (a sort <strong>of</strong> nonequilibrium<br />
mode <strong>of</strong> strong inversion).<br />
(a)<br />
(b)<br />
(c)<br />
(d)<br />
(I) (II) (III)<br />
Figure 3.7 MOS gate on p-type silicon (I) in deep depletion, (II) in weak<br />
inversion after integration <strong>of</strong> optically generated photoelectrons, (III)<br />
in strong inversion: saturation <strong>of</strong> photogate. (a) principle figure, (b)<br />
electrostatic potential and equivalent potential bucket, (c) electric<br />
field and (d) charge distribution diagram. [TEU].