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(12) PATENT APPLICATION PUBLICATION
(19) INDIA (21) APPLICATION No: 882/CHE/2004A
(22) Date of filing of Application:01/09/2004 (43) Publication Date: 09/06/2006
(54) Title of the invention:
A COMPOSITION OF ANIONIC
PHOTOCATALYST AND
POLYMERIZABLE MATERIAL.
(51)International classification:C 08 F 2/50 ,
G 03 F 7/04
(31) Priority Document No.96200466.9
(32) Priority Date:22/02/1996
(33) Name of priority country:EUROPE.
(87) WIPO No. :
(61) Patent of addition to
Application No. :
Filed on:
(62) Divisional to
Applcation No.:298/MAS/1997
Filed on:14/02/1997
(71) Name of Applicant
CIBA SPECIALTY CHEMICALS
HOLDING INC.
Address of Applicant:
Klybeckstrasse 141, CH-4057 Basel ,,
SWITZERLAND.
(72) Name of the Inventor(s):
DIRK ARMAND WIN STANSSENS.
JOHAN FRANZ GRADUS ANTONIUS
JANSEN.
(57)Abstract
The present invention relates to a composition comprising: poylmerizable material and an anionic photocatalyst,
characterized in that the anionic photocatalyst is a photo labile compound able to liberate a strong base having a pKa
> 12 and has the structural formula:
Z-A
wherein Z is a photolabile group, A is a strong base and Z is covalently bound to A.
The Patent Office Journal 09/06/2006 10841