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(12) PATENT APPLICATION PUBLICATION
(19) INDIA (21) Application No.: 00134/KOLNP/2005 A
(22) Date of filing of Application: 03/02/2005 (43) Publication Date: 09/06/2006
(54) Title of the invention: ACTIVATION ENERGY RAY SENSITIVE RESIN COMPOSITION, ACTIVATION ENERGY RAY
SENSITIVE RESIN FILM AND METHOD FOR FORMING PATTERN USING THE FILM
(51) International classification : G03F 7/038
(31) Priority Document No : 2002-196577
(32) Priority Date : 04/07/2002
(33) Name of priority country : JAPAN
(86) International Application No and : PCT/JP03/008539
Filing Date
: & 04/07/2003
(87) International Publication No : WO 04/013700
(61) Patent of addition to Application No : NA
Filed on : NA
(62) Divisional to Application No : NA
Filed on : NA
(71) Name of Applicant:
KUNIHIRO ICHIMURA.,
AND
MURAKAMI CO. LTD.,
Address of the Applicant:
2-13-7, KIRIGAOKA, MIDORI-KU,
YOKOHAMA-SHI, KANAGAWA, 226-
0016, JAPAN.
AND
5-3-10, YOKOKAWA, SUMIDA-KU,
TOKYO 130 0003, JAPAN.
(72) Name of the Inventor:
1. KUNIHIRO ICHIMURA
2. TOMOYUKI MORITA
3. JUNICHI KAWANOBE
4. DAISAKU ADACHI
5. KAZUO INOUE
Filed U/S 5(2) before The Patents (Amendment)
Act, 2005: NO
(57) Abstract:
An activation energy ray-sensitive composition permitting development with neutral water. Provided is an activation energy raysensitive
composition characterized by comprising a dispersion which comprises an aqueous solution of a water-soluble resin, and an acid
former dispersed in the aqueous solution in the form of fine powder, the acid former being insoluble or sparingly soluble in water and
generating an acid by the action of activation energy rays, and an acid-reactive insolubilizing agent dissolved or dispersed in the
dispersion and insolubilizing the water-soluble resin by the action of the acid.
(FIG). nil
The Patent Office Journal 09/06/2006 10977