Bulletin 2011/35 - European Patent Office
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(G02F) II.1(1)<br />

(73) Samsung Electronics Co., Ltd., 416 Maetandong,<br />

Yeongtong-gu Suwon-city, Gyeonggido<br />

442-742, KR<br />

(72) Yoon, Joo-Sun, Seoul, KR<br />

(74) Dr. Weitzel & Partner, <strong>Patent</strong>anwälte Friedenstrasse<br />

10, 89522 Heidenheim, DE<br />

G02F 1/1333 → (51) C08G 63/199<br />

G02F 1/13<strong>35</strong> → (51) G02F 1/1333<br />

G02F 1/13<strong>35</strong>7 → (51) G02F 1/13<br />

(51) G02F 1/1343 (11) 2 140 304 B1<br />

G02F 1/29 G02B 27/22<br />

(25) En (26) En<br />

(21) 08737826.1 (22) 14.04.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

(43) 06.01.2010<br />

(86) IB 2008/051401 14.04.2008<br />

(87) WO 2008/126049 2008/43 23.10.2008<br />

(30) 17.04.2007 EP 07106290<br />

01.06.2007 EP 07109465<br />

(54) • STRAHLFORMUNGSVORRICHTUNG<br />

• BEAM-SHAPING DEVICE<br />

• DISPOSITIF DE MISE EN FORME DE<br />

FAISCEAU<br />

(73) Koninklijke Philips Electronics N.V., Groenewoudseweg<br />

1, 5621 BA Eindhoven, NL<br />

(72) HIKMET, Rifat, A., M., NL-5656 AE Eindhoven,<br />

NL<br />

VAN BOMMEL, Ties, NL-5656 AE Eindhoven,<br />

NL<br />

KRAAN, Thomas, C., NL-5656 AE Eindhoven,<br />

NL<br />

KUSTERS, Leon, H., C., NL-5656 AE Eindhoven,<br />

NL<br />

DE ZWART, Siebe, T., NL-5656 AE Eindhoven,<br />

NL<br />

WILLEMSEN, Oscar, H., NL-5656 AE Eindhoven,<br />

NL<br />

KRIJN, Marcellinus, P., C., M., NL-5656 AE<br />

Eindhoven, NL<br />

(74) Kroeze, Johannes Antonius, Philips Intellectual<br />

Property & Standards P.O. Box 220,<br />

5600 AE Eindhoven, NL<br />

(51) G02F 1/15 (11) 1 697 790 B1<br />

C09K 9/02<br />

(25) Ko (26) En<br />

(21) 04808523.7 (22) 22.12.2004<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HU IE IS IT LI LT LU MC NL PL PT RO SE<br />

SI SK TR<br />

(43) 06.09.2006<br />

(86) KR 2004/003392 22.12.2004<br />

(87) WO 2005/062110 2005/27 07.07.2005<br />

(30) 22.12.2003 KR 2003094546<br />

(54) • ELEKTROCHROMES MATERIAL<br />

• ELECTROCHROMIC MATERIAL<br />

• MATIERE ELECTROCHROMIQUE<br />

(73) LG Chem, Ltd., LG Twin Tower, 20, Yoidodong,<br />

Yongdungpo-gu, Seoul 150-721, KR<br />

(72) KWON, Won-Jong, Daejeon 305-761, KR<br />

JANG, Ki-Seok, Daegu 704-836, KR<br />

KIM, Sang-Ho, Daejeon 305-761, KR<br />

CHOI, Shin-Jung, Busan 612-080, KR<br />

PARK, Jin-Young, Gwangju 503-311, KR<br />

LIM, Young-Hee, Daejeon 300-717, KR<br />

(74) HOFFMANN EITLE, <strong>Patent</strong>- und Rechtsanwälte<br />

Arabellastraße 4, 81925 München, DE<br />

G02F 1/29 → (51) G02F 1/1343<br />

G03B 27/62 → (51) G03G 15/00<br />

Europäisches <strong>Patent</strong>blatt<br />

<strong>European</strong> <strong>Patent</strong> <strong>Bulletin</strong><br />

<strong>Bulletin</strong> européen des brevets<br />

(51) G03F 1/00 (11) 1 832 925 B1<br />

G03F 1/14<br />

(25) En (26) En<br />

(21) 07251007.6 (22) 12.03.2007<br />

(84) DE FR GB IT<br />

(43) 12.09.2007<br />

(30) 10.03.2006 JP 2006065800<br />

(54) • Fotomaskenrohling und Fotomaske<br />

• Photomask blank and photomask<br />

• Ébauche de masque photographique et<br />

masque photographique<br />

(73) Shin-Etsu Chemical Co., Ltd., 6-1, Otemachi<br />

2-chome Chiyoda-ku, Tokyo, JP<br />

Toppan Printing Co., Ltd., 5-1, Taito 1chome,<br />

Taito-ku Tokyo, JP<br />

(72) Yoshikawa, Hiroki, Niigata-ken, JP<br />

Inazuki, Yukio, Niigata-ken, JP<br />

Okazaki, Satoshi, Niigata-ken, JP<br />

Haraguchi, Takashi, Tokyo, JP<br />

Saga, Tadashi, Tokyo, JP<br />

Kojima, Yosuke, Tokyo, JP<br />

Chiba, Kazuaki, Tokyo, JP<br />

Fukushima, Yuichi, Tokyo, JP<br />

(74) Stoner, Gerard Patrick, Mewburn Ellis LLP<br />

33 Gutter Lane, London EC2V 8AS, GB<br />

(60) 11000691.3 / 2 312 392<br />

G03F 1/14 → (51) G03F 1/00<br />

(51) G03F 7/16 (11) 1 950 611 B1<br />

(25) Fr (26) Fr<br />

(21) 08<strong>35</strong>4001.3 (22) 16.01.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

(43) 30.07.2008<br />

(30) 23.01.2007 FR 0700450<br />

(54) • Verfahren zur Aufbringung einer Polymerschicht<br />

auf eine Fläche einer Unterlage, die<br />

mindestens eine vertiefte Zone umfasst<br />

• Method for depositing a polymer layer on a<br />

support surface comprising at least one<br />

hollow area<br />

• Procédé de dépôt d'une couche polymère<br />

sur une face d'un support, comportant au<br />

moins une zone en creux<br />

(73) Commissariat à l'Énergie Atomique et aux<br />

Énergies Alternatives, Bâtiment "Le Ponant D"<br />

25, rue Leblanc, 75015 Paris, FR<br />

(72) Puget, Christiane, 38120 Saint-Egrève, FR<br />

Henry, David, 38610 Gières, FR<br />

(74) Hecké, Gérard, et al, Cabinet Hecké 10 rue<br />

d'Arménie - Europole BP 1537, 38025<br />

Grenoble Cedex 1, FR<br />

(51) G03F 7/20 (11) 1 677 156 B1<br />

(25) En (26) En<br />

(21) 05257813.5 (22) 19.12.2005<br />

(84) DE FR GB IT NL<br />

(43) 05.07.2006<br />

(30) 30.12.2004 US 25603<br />

(54) • Lithographischer Apparat und Belichtungsparameter-Korrekturverfahren<br />

• Lithographic apparatus and exposure<br />

parameter correcting method<br />

• Appareil lithographique et méthode de<br />

correction d'un paramètre d'exposition<br />

(73) ASML Netherlands BV, De Run 6501, 5504<br />

DR Veldhoven, NL<br />

(84) DE FR GB IT NL<br />

(72) Baselmans, Johannes Jacobus Matheus,<br />

5688 GG Oirschot, NL<br />

Donders, Sjoerd Nicolaas Lambertus, 5211<br />

HN's-Hertogenbosch, NL<br />

Hoogendam, Christiaan Alexander, 5509 NC<br />

Veldhoven, NL<br />

Mertens, Jeroen Johannes Sophia Maria,<br />

5525 BC Duizel, NL<br />

506<br />

<strong>Patent</strong>e<br />

<strong>Patent</strong>s<br />

Brevets (<strong>35</strong>/<strong>2011</strong>) 31.08.<strong>2011</strong><br />

Mulkens, Johannes Catharinus Hubertus,<br />

5581 AB Waalre, NL<br />

Streefkerk, Bob, 5038 PE Tilburg, NL<br />

(74) Corcoran, Gregory Martin Mason, et al,<br />

ASML Netherlands B.V. Corporate Intellectual<br />

Property P.O. Box 324, 5500 AH<br />

Veldhoven, NL<br />

(60) 10180805.3 / 2 264 530<br />

G03F 7/32 → (51) B41C 1/10<br />

G03F 7/42 → (51) H01L 21/306<br />

G03G 9/08 → (51) G03G 9/093<br />

G03G 9/087 → (51) G03G 9/093<br />

(51) G03G 9/093 (11) 2 198 345 B1<br />

G03G 9/08 G03G 9/087<br />

(25) En (26) En<br />

(21) 08837595.1 (22) 23.09.2008<br />

(84) AT BE BG CH CY CZ DE DK EE ES FI FR GB<br />

GR HR HU IE IS IT LI LT LU LV MC MT NL<br />

NO PL PT RO SE SI SK TR<br />

(43) 23.06.2010<br />

(86) US 2008/011017 23.09.2008<br />

(87) WO 2009/048508 2009/16 16.04.2009<br />

(30) 11.10.2007 US 870651<br />

(54) • PORÖSE PARTIKEL MIT NICHT PORÖSER<br />

SCHALE<br />

• POROUS PARTICLES WITH NON-POROUS<br />

SHELL<br />

• PARTICULES POREUSES POURVUES<br />

D'UNE ENVELOPPE NON POREUSE<br />

(73) Eastman Kodak Company, 343 State Street,<br />

Rochester, NY 14650-2201, US<br />

(72) MASSA, Dennis Jon, Rochester New York<br />

14650, US<br />

NAIR, Mridula, Rochester New York 14650,<br />

US<br />

JONES, Tamara Kay, Rochester New York<br />

14650, US<br />

HAMILTON, Dale E., Rochester New York<br />

14650, US<br />

(74) Weber, Etienne Nicolas, Kodak Etablissement<br />

de Chalon Campus Industriel - Département<br />

Brevets Route de Demigny - Z.I. Nord - B.P.<br />

21, 71102 Chalon-sur-Saône Cedex, FR<br />

(51) G03G 9/097 (11) 1 0<strong>35</strong> 450 B1<br />

(25) En (26) En<br />

(21) 00104494.0 (22) 09.03.2000<br />

(84) DE FR GB<br />

(43) 13.09.2000<br />

(30) 12.03.1999 JP 6717899<br />

27.12.1999 JP 36931199<br />

(54) • Externes Additiv für Entwicklertoner zur<br />

Entwicklung elektrostatisch geladener<br />

Latentbilder<br />

• External additive for electrostatically<br />

charged latent image developing toner<br />

• Additif externe pour un révélateur pour<br />

développement d'images électrostatiques<br />

(73) Shin-Etsu Chemical Co., Ltd., 6-1, Otemachi<br />

2-chome, Chiyoda-ku, Tokyo, JP<br />

(72) Kudo, Muneo, Matsuida-machi, Usui-gun,<br />

Gunma-ken, JP<br />

Tanaka, Masaki, Chiyoda-ku, Tokyo, JP<br />

Sakatsume, Yoshiteru, Chiyoda-ku, Tokyo,<br />

JP<br />

Ichinohe, Shoji, Matsuida-machi, Usui-gun,<br />

Gunma-ken, JP<br />

Asai, Mitsuo, Matsuida-machi, Usui-gun,<br />

Gunma-ken, JP<br />

(74) Tönhardt, Marion, et al, Forrester & Boehmert<br />

Pettenkoferstrasse 20-22, 80336<br />

München, DE

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