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24/06/2005 - Controller General of Patents, Designs, and Trade Marks

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(12) PATENT APPLICATION PUBLICATION<br />

(19)<br />

INDIA (21) Application No: 609/MUMNP/2004 A<br />

(22) Date <strong>of</strong> filing <strong>of</strong> Application : 28/10/2004<br />

(54) Title <strong>of</strong> the invention:<br />

(51) International Classification: C 23 C 18/16 (71)<br />

(31) Priority Document No. : 10<strong>24</strong>0350.3<br />

(32) Priority Date : 28/08/2002<br />

(33) Name <strong>of</strong> priority country : GERMANY<br />

(86) International Application : PCT/EP03/009030<br />

No. <strong>and</strong> Filing Date : 14/08/2003<br />

(87) International :<br />

Publication No. WO04/02<strong>06</strong>98 A1<br />

(61)<br />

(62)<br />

Patent <strong>of</strong> addition to<br />

Application No. : NIL<br />

Filed on N.A.<br />

Divisional to<br />

Application No. : NIL<br />

Filed on : N.A.<br />

(57) Abstract : In regenerating an electroless metal<br />

plating bath by electrodialysis, it has been found that the<br />

metal <strong>of</strong> the metal plating bath deposits in the electrolysis<br />

arrangement. To overcome this problem, an improvement<br />

to prior art regenerating devices is suggested, said<br />

improvement consisting in providing main cation<br />

exchangers for removing ions <strong>of</strong> this metal from a<br />

concentrate fluid. The main cation exchangers are coupled<br />

to the concentrate compartments <strong>of</strong> the electrolysis<br />

arrangement in such a manner that the concentrate fluid<br />

flowing through the concentrate compartments is allowed<br />

to pass through the main cation exchangers <strong>and</strong> to be<br />

recirculated back into the concentrate compartments.<br />

Total Pages : 38.<br />

(43) Publication Date: <strong>24</strong>/<strong>06</strong>/<strong>2005</strong><br />

DEVICE AND METHOD FOR REGENERATING AN<br />

ELECTROLESS METAL PLATING BATH.<br />

(72)<br />

Name <strong>of</strong> the Applicant:<br />

ATOTECH DEUTSCHLAND GMBH<br />

Address <strong>of</strong> the Applicant:<br />

ERASMUSSTRASSE 20,<br />

10553 BERLIN DEUTSCHLAND,<br />

GERMANY.<br />

Name <strong>of</strong> the Inventors:<br />

1. HEYDECKE JENS<br />

2. MURANUSHI MASANORI<br />

( Figure: 02 )<br />

The Patent Office Journal <strong>24</strong>.<strong>06</strong>.<strong>2005</strong> 17940

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