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24/06/2005 - Controller General of Patents, Designs, and Trade Marks

24/06/2005 - Controller General of Patents, Designs, and Trade Marks

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(12) PATENT APPLICATION PUBLICATION<br />

(19) INDIA (21)<br />

(22) Date <strong>of</strong> filing <strong>of</strong> Application: 04/05/<strong>2005</strong> (43)<br />

(54) Title <strong>of</strong> the invention:<br />

(51) International<br />

Classification:<br />

C101G 41/00, C01B 33/035 (71)<br />

(31) Priority Document No.: NIL<br />

(32) Priority Date:<br />

EARLY PUBLICATION<br />

Application No: 548/MUM/<strong>2005</strong> A<br />

Publication Date:<br />

<strong>24</strong>/<strong>06</strong>/<strong>2005</strong><br />

RHEOTAXIAL PROCESS FOR THE PREPARATION OF TYPE-II<br />

TEXTURED WS2 THIN FILMS HAVING POLYTYPE 3R<br />

STACKING OF RHOMBOHEDRAL CRYSTALLITES USING PBS<br />

INTERLAYER<br />

NIL<br />

(33) Name <strong>of</strong> priority country: NIL<br />

(86)<br />

International Application No. & Filing Date:<br />

NIL<br />

NIL<br />

(87) International Publication No.: NIL<br />

(61)<br />

(62)<br />

Patent <strong>of</strong> addition to Application No.: NIL<br />

Filed on: N.A.<br />

Divisional to<br />

Application No.: NIL<br />

Filed on: N.A.<br />

(72)<br />

Name <strong>of</strong> the Applicant:<br />

1. Dr. PATIL PRAMOD<br />

SHANKARARAO<br />

2. Mr. SADALE SHIVAJI BABASO<br />

Address <strong>of</strong> the Applicant:<br />

THIN FILM MATERIALS<br />

LABORATORY, DEPARTMENT OF<br />

PHYSICS, SHIVAJI UNIVERSITY,<br />

KOLHAPUR- 416 004,<br />

MAHARASHTRA, INDIA<br />

Name <strong>of</strong> the Inventors:<br />

1. Dr. PATIL PRAMOD<br />

SHANKARARAO<br />

2. Mr. SADALE SHIVAJI BABASO<br />

Filed U/S 5(2) before the<br />

<strong>Patents</strong> (Amendment)<br />

Ordinance, 2004: NO<br />

(57) Abstract : A process for the synthesis <strong>of</strong> highly textured WS2 thin films onto a quartz substrate that<br />

comprises three steps;<br />

i) deposition <strong>of</strong> lead layer <strong>of</strong> 50 nm thickness onto ultrasonically cleaned quartz substrate by thermal<br />

evaporation <strong>of</strong> lead powder,<br />

ii) the said lead layer s coated with tungsten oxide in presence <strong>of</strong> nitrogen ambient using an intermittent<br />

spray pyrolysis apparatus (ISPA) from pyrolytic decomposition <strong>of</strong> ammonium tungstate solution to form<br />

a bilayer precursor film (BPF).<br />

iii) Sulfurization <strong>of</strong> BPF in an evacuated quartz ampoule by accurately managing the thermal treatment<br />

wherein the said layers are treated at 900˚C for 8 hours <strong>and</strong> at 1150˚C. for 20 hours. Prior heat treatment<br />

form a pbS interlayer, which melts during latter stage <strong>of</strong> thermal treatment, allowing self assembled<br />

growth <strong>of</strong> highly textured WS2, cooling the said ampoule at the rate <strong>of</strong> 50˚C/hr. to room temperature<br />

completes the process.<br />

(FIG. ) : NIL<br />

Total pages : 20<br />

The Patent Office Journal <strong>24</strong>.<strong>06</strong>.<strong>2005</strong> 17733

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